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Method and apparatus for forming coating layer with nano multi-layer
US2017009331A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2017009331-A1 |
| Application number | US-201615174230-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jun 6, 2016 |
| Priority date | Nov 30, 2011 |
| Publication date | Jan 12, 2017 |
| Grant date | — |
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Abstract
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Disclosed is a method and apparatus for forming a coating layer using a physical vapor deposition apparatus equipped with a sputtering apparatus and an arc ion plating apparatus, comprising: a first coating step of forming a Mo coating layer on a base material using a the sputtering apparatus and a Mo target and Ar gas; a nitrating step of forming a nitride film forming condition using an arc ion plating apparatus and Ar gas and N 2 gas; a second coating step of forming a nano composite coating layer of Cr—Mo—N using the Mo target and Ar gas of the sputtering apparatus and the Ar gas, N 2 gas and a Cr source of the arc ion plating apparatus at the same time; and a multi-coating step of forming a multi-layer having alternating Cr—Mo—N nano composite coating layers and Mo coating layers by revolving the base material around a central pivot.
First claim
Opening claim text (preview).
1 - 7 . (canceled) 8 . A coating layer with a nano multilayer comprising: a multi-layer having alternating layers of a Cr—Mo—N nano composite coating layer and a Mo coating layer, wherein a main growth face of the Cr—Mo—N meets a predetermined corrosion resistance and electrical conductivity, and the main growth face of the Cr—Mo—N corresponds to a growing surface having the highest distribution as a same type crystal among all crystals constituting the Cr—Mo—N.
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Classifications
using substrate bias · CPC title
for rotation of the substrates · CPC title
Electric arc evaporation · CPC title
- C23C14/025Primary
Metallic sublayers · CPC title
Nitrides (C23C14/0617 takes precedence) · CPC title
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- What does patent US2017009331A1 cover?
- Disclosed is a method and apparatus for forming a coating layer using a physical vapor deposition apparatus equipped with a sputtering apparatus and an arc ion plating apparatus, comprising: a first coating step of forming a Mo coating layer on a base material using a the sputtering apparatus and a Mo target and Ar gas; a nitrating step of forming a nitride film forming condition using an arc i…
- Who is the assignee on this patent?
- Hyundai Motor Co Ltd, Hyundai Steel Co
- What technology area does this patent fall under?
- Primary CPC classification C23C14/025. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Thu Jan 12 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).