Ion manipulation device to prevent loss of ions
US-2015076343-A1 · Mar 19, 2015 · US
US2016379815A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016379815-A1 |
| Application number | US-201514752368-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jun 26, 2015 |
| Priority date | Jun 26, 2015 |
| Publication date | Dec 29, 2016 |
| Grant date | — |
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Devices, methods, and systems for trapping multiple ions are described herein. One device includes two or more ovens wherein each oven includes a heating element and a cavity for emitting atoms of a particular atomic species from an atomic source substance, a substrate having a number of apertures that allow atoms emitted from the atomic source substance to exit the oven and enter an ion trapping area and wherein each oven is positioned at a different ion loading area within the ion trapping area, and a plurality of electrodes that can be charged and wherein the charge can be used to selectively control the movement of a particular ion from a particular loading area to a particular ion trap location.
Opening claim text (preview).
What is claimed: 1 . An ion trapping device for trapping multiple ions, comprising: two or more ovens wherein each oven includes a heating element and a cavity for emitting atoms of a particular atomic species from an atomic source substance; a substrate having a number of apertures that allow atoms emitted from the atomic source substance to exit the oven and enter an ion trapping area and wherein each oven is positioned at a different ion loading area within the ion trapping area; and a plurality of electrodes that can be charged and wherein the charge can be used to selectively control the movement of a particular ion from a particular loading area to a particular ion trap location. 2 . The device of claim 1 , wherein each oven includes an independent controller for controlling the temperature of the oven. 3 . The device of claim 1 , wherein the cavity includes a substrate for application of an atomic source substance. 4 . The device of claim 3 , wherein the cavity further includes a guide material configured to direct the emitting atoms of a particular atomic species to the substrate having a number of apertures. 5 . The device of claim 2 , wherein a first oven of the two or more ovens is controlled to reach a higher vaporization temperature than a second oven of the two or more ovens. 6 . The device of claim 1 , wherein a first oven of the two or more ovens may be used for vaporizing atomic species with cooling properties and a second oven of the two or more ovens may be used for vaporizing atomic species to perform logic functions. 7 . The device of claim 1 , wherein the loading areas are physically separate from each other to allow ions of a particular type to be selected for a particular trap location. 8 . A system for trapping multiple ions, comprising: a first oven that heats a quantity of a first atomic source substance such that the first source substance emits atoms of a first atomic species from the quantity of first source substance that exit the oven and enter an ion trapping area at a first loading area; a second oven that heats a quantity of a second atomic source substance such that the second source substance emits atoms of a second atomic species from the quantity of source substance that exit the oven and enter an ion trapping area at a second loading area; a first plurality of electrodes that are selectively charged to move an ion of the first atomic species from the first loading area to a first ion trap location; and a second plurality of electrodes that are selectively charged to move an ion of the second atomic species from the second loading area to the first ion trap location or a second ion trap location. 9 . The system of claim 8 , wherein the first loading area is located on a first side of a set of trap locations and the second loading area is located on a second side of the set of trap locations. 10 . The system of claim 8 , wherein the first and second loading areas are positioned such that the particular ion trap location can be filled by either the first or the second atomic species. 11 . The system of claim 8 , wherein an ion of either the first or second atomic species can be moved from the first loading area or the second loading area and positioned in the particular trap location through use of at least one of its respective plurality of electrodes. 12 . The system of claim 8 , wherein the first loading area is oriented opposite to the second loading area with respect to the first ion trap location. 13 . The system of claim 8 , wherein the first loading area and the second loading area are positioned in two similarly situated branches of the system. 14 . The system of claim 8 , wherein the first ion trap location and the second trap location are positioned in a body of the system. 15 . The system of claim 8 , wherein the first loading area is oriented opposite to a second loading area. 16 . The system of claim 8 , wherein two particular atomic species are heated proximate to physically separate loading apertures. 17 . A method for trapping multiple ions, comprising: providing two or more ion-generating loading areas, each loading area including an oven having a heating element and a emitting cavity for emission of an atomic source substance; providing an aperture at each ion-generating loading area that allows atoms from the atomic source substance to exit the oven and ionized; and generating a charge at a plurality of electrodes such that the charge can be used to control the movement of a particular ion from a particular loading area of the two or more loading areas to a particular ion trap location within an ion trapping area. 18 . The method of claim 17 , wherein the method includes receiving, in the emitting cavity located superior to the heating element, an atomic source substance. 19 . The method of claim 17 , wherein the method includes providing each loading area with an oven having a different temperature set point. 20 . The method of claim 17 , wherein the method includes providing the two or more ion-generating loading areas wherein each area includes an oven located inferior to one or more cavities.
Ion guides (linear ion traps performing mass selection H01J49/4225, mass filters H01J49/421) · CPC title
with means for monitoring the sample temperature · CPC title
Arrangements for using several ion sources · CPC title
Multipole ion guides, e.g. quadrupoles, hexapoles · CPC title
Step by step routines describing the use of the apparatus (H01J49/0081 takes precedence) · CPC title
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