Radically curable compound, method for producing radically curable compound, radically curable composition, cured product of the same, and resist-material composition

US2016376218A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016376218-A1
Application numberUS-201615259787-A
CountryUS
Kind codeA1
Filing dateSep 8, 2016
Priority dateJul 25, 2012
Publication dateDec 29, 2016
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Provided is a positive photoresist composition excellent in terms of heat resistance. A radically curable compound is represented by a general formula (1) below (where R 1 , R 2 , and R 3 each independently represent an alkyl group having 1 to 8 carbon atoms; m and n each independently represent an integer of 1 to 4; p represents an integer of 0 to 4; X, Y, and Z each independently represent an acryloyloxy group, a methacryloyloxy group, or a hydroxy group, and at least one of X, Y, and Z represents an acryloyloxy group or a methacryloyloxy group; and t represents 1 or 2).

First claim

Opening claim text (preview).

1 - 4 . (canceled) 5 . A method for producing a radically curable compound, comprising causing polycondensation between an alkyl-substituted phenol (a1) and an aromatic aldehyde (a2) having a hydroxy group on a benzene ring to prepare a polycondensate (A) represented by a general formula (3) below (where R 1 , R 2 , and R 3 each independently represent an alkyl group having 1 to 8 carbon atoms; m and n each independently represent an integer of 1 to 4; p represents an integer of 0 to 4; and s represents 1 or 2); and subsequently causing a reaction between the polycondensate and a (meth)acrylic acid halide (B). 6 . The method for producing a radically curable compound according to claim 5 , wherein the alkyl-substituted phenol (a1) is 2,5-xylenol or 2,6-xylenol. 7 . The method for producing a radically curable compound according to claim 5 , wherein the aromatic aldehyde (a2) having a hydroxy group on a benzene ring is a 4-hydroxybenzaldehyde. 8 . The method for producing a radically curable compound according to claim 5 , comprising a step 1 of causing polycondensation between the alkyl-substituted phenol (a1) and the aromatic aldehyde (a2) having a hydroxy group on a benzene ring in the presence of an acid catalyst to prepare a crude product containing the polycondensate (A) in a reaction solution; a step 2 of collecting from the reaction solution the polycondensate (A) prepared in the step 1; and a step 3 of causing the reaction between the polycondensate (A) isolated in the step 2 and the (meth)acrylic acid halide (B) in the presence of a base. 9 . A radically curable compound obtained by the production method according to claim 5 . 10 - 12 . (canceled) 13 . A radically curable compound obtained by the production method according to claim 6 . 14 . A radically curable compound obtained by the production method according to claim 7 . 15 . A radically curable compound obtained by the production method according to claim 8 . 16 . A radically curable composition comprising the radically curable compound according to claim 9 . 17 . A radically curable composition comprising the radically curable compound according to claim 13 . 18 . A radically curable composition comprising the radically curable compound according to claim 14 . 19 . A radically curable composition comprising the radically curable compound according to claim 15 .

Assignees

Inventors

Classifications

  • C07C67/14Primary

    from carboxylic acid halides · CPC title

  • C07C69/54Primary

    Acrylic acid esters; Methacrylic acid esters · CPC title

  • Esters having no free carboxylic acid groups · CPC title

  • using aldehydes or ketones · CPC title

  • by transformation of a functional group, e.g. oxo, carboxyl · CPC title

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What does patent US2016376218A1 cover?
Provided is a positive photoresist composition excellent in terms of heat resistance. A radically curable compound is represented by a general formula (1) below (where R 1 , R 2 , and R 3 each independently represent an alkyl group having 1 to 8 carbon atoms; m and n each independently represent an integer of 1 to 4; p represents an integer of 0 to 4; X, Y, and Z each independently represent a…
Who is the assignee on this patent?
Dainippon Ink & Chemicals
What technology area does this patent fall under?
Primary CPC classification C07C67/14. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Dec 29 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).