Nanostructured graphene with atomically-smooth edges

US2016368773A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016368773-A1
Application numberUS-201615184036-A
CountryUS
Kind codeA1
Filing dateJun 16, 2016
Priority dateOct 27, 2011
Publication dateDec 22, 2016
Grant date

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Abstract

Official abstract text for this publication.

Methods of producing layers of patterned graphene with smooth edges are provided. The methods comprise the steps of fabricating a layer of crystalline graphene on a surface, wherein the layer of crystalline graphene has a crystallographically disordered edge, and decreasing the crystallographic disorder of the edge of the layer of crystalline graphene by heating the layer of crystalline graphene on the surface at an elevated temperature in a catalytic environment comprising carbon-containing molecules.

First claim

Opening claim text (preview).

What is claimed is: 1 . Patterned graphene comprising a layer of graphene having plurality of features defined therein, wherein the features have internal or external edges that are aligned with the crystallographic direction of the graphene lattice and further wherein the plurality of features comprises at least 1,000 features. 2 . The patterned graphene of claim 1 , comprising a graphene antidot lattice, wherein the plurality of features are a plurality of holes defined in the layer of graphene, wherein the holes are hexagonal in shape and aligned with the hexagonal crystal symmetry of the graphene lattice, the graphene antidot lattice having an area of at least 1 μm 2 and a hole density of at least 1×10 11 holes/cm 2 . 3 . The patterned graphene of claim 2 , wherein the holes have diameters of 50 nm or less. 4 . The patterned graphene of claim 2 , wherein the holes have diameters of 10 nm or less. 5 . The patterned graphene of claim 1 , comprising a graphene nanoribbon array, wherein the plurality of features are a plurality of graphene nanoribbons aligned in a parallel arrangement along their longitudinal axes, wherein the edges of the nanoribbons have a root mean square roughness no greater than 5 nm and are aligned with the crystallographic direction of the graphene, the graphene nanoribbon array comprising at least 1000 nanoribbons. 6 . The patterned graphene of claim 5 , wherein the graphene nanoribbons have a pitch of 500 nm or less and the graphene nanoribbon array covers an area of at least 1 μm 2 . 7 . The patterned graphene of claim 5 , wherein the edges of the graphene nanoribbons have a zigzag configuration. 8 . The patterned graphene of claim 1 , comprising a graphene nanoribbon array, wherein the plurality of features are a plurality of graphene nanoribbons aligned in a parallel arrangement along their longitudinal axes, wherein the edges of the nanoribbons have a root mean square roughness no greater than 3 nm and are aligned with the crystallographic direction of the graphene, the graphene nanoribbon array comprising at least 1000 nanoribbons. 9 . The patterned graphene of claim 1 , comprising a graphene nanoribbon array, wherein the plurality of features are a plurality of graphene nanoribbons aligned in a parallel arrangement along their longitudinal axes, wherein the edges of the nanoribbons have a root mean square roughness no greater than 1 nm and are aligned with the crystallographic direction of the graphene, the graphene nanoribbon array comprising at least 1000 nanoribbons. 10 . The patterned graphene of claim 1 , wherein the internal or external edges a zigzag configuration. 11 . The patterned graphene of claim 1 having an area of at least 1 mm 2 .

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Classifications

  • Chemistry & Metallurgy · mapped topic

  • Size or surface area · CPC title

  • Chemistry & Metallurgy · mapped topic

  • Manufacture or treatment of nanostructures · CPC title

  • Fullerenes, i.e. graphene-based structures, such as nanohorns, nanococoons, nanoscrolls or fullerene-like structures, e.g. WS2 or MoS2 chalcogenide nanotubes, planar C3N4, etc. · CPC title

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What does patent US2016368773A1 cover?
Methods of producing layers of patterned graphene with smooth edges are provided. The methods comprise the steps of fabricating a layer of crystalline graphene on a surface, wherein the layer of crystalline graphene has a crystallographically disordered edge, and decreasing the crystallographic disorder of the edge of the layer of crystalline graphene by heating the layer of crystalline graphen…
Who is the assignee on this patent?
Wisconsin Alumni Res Found
What technology area does this patent fall under?
Primary CPC classification C01B31/0484. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Dec 22 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).