Plasmon-excited electron beam array for complementary patterning

Patent metadata

Field	Value
Publication number	US-2016358743-A1
Application number	US-201615176147-A
Country	US
Kind code	A1
Filing date	Jun 7, 2016
Priority date	Jun 7, 2015
Publication date	Dec 8, 2016
Grant date	—

Abstract

A system for generating an electron beam array, comprising a light source, a first substrate having a plurality of plasmonic lenses mounted thereon, the plasmonic lenses configured to received light from the light source and produce an electron emission, and a plurality of electrostatic microlenses configured to focus the electron emissions into a beam for focusing on a wafer substrate. A light source modulator and digital micro mirror may be included which captures light from the light source and projects light beamlets on the plasmonic lenses.

First claim

1 . A system for generating an electron beam array, comprising:
a light source configured to provide a plurality of light beams; a first substrate having a plurality of plasmonic lenses mounted thereon, the plasmonic lenses configured to the light beams from the light source and produce a plurality of corresponding electron emissions onto a wafer substrate.

2 . The system of claim 1 , further comprising a plurality of electrostatic microlenses configured to focus the electron emissions into corresponding electron beams for focusing on a wafer substrate.

3 . The system of claim 1 , further comprising a light source modulator operatively connected to the light source.

4 . The system of claim 1 , further comprising a digital micro mirror which captures light from the light source and projects the light beamlets on the plasmonic lenses.

5 . The system of claim 1 , further comprising a positioning platform, the positioning platform connected between the first substrate and the wafer substrate, the positioning device configured to move the wafer substrate in relation to the first substrate.

6 . The system of claim 5 , wherein the positioning platform is a spinning positioning system.

7 . The system of claim 5 , wherein the positioning platform is a linear translation positioning system.

8 . The system of claim 1 , wherein the electrostatic lenses are positioned between the plasmonic lenses and the wafer substrate.

9 . The system of claim 5 , wherein the wafer substrate is coated with a resist material, and wherein the positioning system is configured to create a pattern in the resist due to interaction between the electron emissions and the resist material.

10 . The system of claim 5 , wherein the positioning system is configured to maintain a gap of less than 100 nanometers between a bottom surface of the first substrate and a top surface of the wafer substrate.

11 . The system of claim 10 , wherein the positioning system is configured to maintain a gap of less than 50 nanometers between a bottom surface of the first substrate and a top surface of the wafer substrate.

12 . The system of claim 8 , wherein the positioning system is configured to maintain a gap of between 1 micrometer and 10 micrometers between a bottom surface of the first substrate and a top surface of the wafer substrate.

13 . The system of claim 1 , wherein the plasmonic lenses comprise an outer ring reflector surrounding a center nanostructure.

14 . The system of claim 1 , wherein the plasmonic lenses comprise mismatch semicircular gratings.

15 . The system of claim 1 , wherein the plasmonic lenses are formed in an array on the first substrate.

16 . The system of claim 1 , wherein the distance between centers of the plasmonic lenses is between 1 and 20 micrometers.

Assignees

• Purdue Research Foundation

Inventors

• Pan Liang
• Xu Xianfan

Classifications

• H01J37/10 Primary

  Lenses · CPC title

• H01J2237/0492

  Lens systems · CPC title

• H01J37/3174

  Particle-beam lithography, e.g. electron beam lithography · CPC title

• H01J2237/202

  Movement · CPC title

• H01J37/06

  Electron sources; Electron guns · CPC title