Color filter substrate, manufacturing method thereof, and display device

Patent metadata

Field	Value
Publication number	US-2016356930-A1
Application number	US-201515022066-A
Country	US
Kind code	A1
Filing date	Nov 17, 2015
Priority date	Dec 30, 2014
Publication date	Dec 8, 2016
Grant date	—

Abstract

The embodiments of the invention provide a color filter substrate and a manufacturing method thereof, and a display device, belonging to the field of display technology. Manufacturing the display device by using the above color filter substrate can simplify the manufacturing process and reduce the cost. The manufacturing method of the color filter substrate comprises: performing a single patterning process to form patterns of a plurality of first black matrixes and second black matrixes which are horizontally and longitudinally intersected, and patterns of a plurality of first touch electrodes positioned on surfaces of the second black matrixes away from a base substrate, wherein the patterns of the first black matrixes and the second black matrixes are intersected to define a plurality of color filter regions arranged in a form of matrix; and forming patterns of color filter layers within the color filter regions.

First claim

1 - 16 . (canceled)

17 . A manufacturing method of a color filter substrate, comprising steps of:
forming a light blocking layer and a conducting layer successively on a base substrate; performing a single patterning process on the light blocking layer and the conducting layer to form patterns of a plurality of first black matrixes and a plurality of second black matrixes which are intersected and formed by the light blocking layer, and patterns of a plurality of first touch electrodes positioned on surfaces of the second black matrixes away from the base substrate and formed by the conducting layer, wherein the patterns of the first black matrixes and the second black matrixes are intersected to define a plurality of color filter regions arranged in a form of matrix; and forming patterns of color filter layers within the color filter regions.

18 . The manufacturing method of the color filter substrate according to claim 17 , wherein the step of performing a single patterning process on the light blocking layer and the conducting layer to form patterns of a plurality of first black matrixes and a plurality of second black matrixes which are intersected and formed by the light blocking layer, and patterns of a plurality of first touch electrodes positioned on surfaces of the second black matrixes away from the base substrate and formed by the conducting layer comprises:
applying photoresist on a surface of the conducting layer; forming first photoresist completely retained regions, first photoresist partially retained regions and first photoresist completely removed regions by performing a single exposure and development process, wherein the first photoresist completely retained regions correspond to the patterns of the second black matrixes and the first touch electrodes to be formed; the first photoresist partially retained regions correspond to the patterns of the first black matrixes to be formed; and the first photoresist completely removed regions correspond to the color filter regions to be formed; etching parts of the conducting layer and the light blocking layer corresponding to the first photoresist completely removed regions to form the color filter regions; removing the photoresist in the first photoresist partially retained regions, and etching parts of the conducting layer corresponding to the first photoresist partially retained regions to form the patterns of the first black matrixes; and stripping off the photoresist in the first photoresist completely retained regions to form the patterns of the first touch electrodes and the second black matrixes.

19 . The manufacturing method of the color filter substrate according to claim 17 , wherein the step of performing a single patterning process on the light blocking layer and the conducting layer to form patterns of a plurality of first black matrixes and a plurality of second black matrixes which are intersected and formed by the light blocking layer, and patterns of a plurality of first touch electrodes positioned on surfaces of the second black matrixes away from the base substrate and formed by the conducting layer comprises: applying photoresist on a surface of the conducting layer; forming second photoresist completely retained regions, second photoresist partially retained regions and second photoresist completely removed regions by performing a single exposure and development process, wherein the second photoresist completely retained regions correspond to the patterns of the second black matrixes and the first touch electrodes to be formed and partial regions of the patterns of the first black matrixes positioned between the patterns of two adjacent second matrixes; the second photoresist partially retained regions correspond to another partial regions of the patterns of the first black matrixes between patterns of two adjacent second black matrix to be formed; and the second photoresist completely removed regions correspond to the color filter regions to be formed;
etching parts of the conducting layer and the light blocking layer corresponding to the second photoresist completely removed regions to form the color filter regions; removing photoresist in the second photoresist partially retained regions, and etching parts of the conducting layer corresponding to the second photoresist partially retained regions to form clearance regions corresponding to another partial regions of the patterns of the first black matrixes; and stripping off the photoresist in the second photoresist completely retained regions to form patterns of the first touch electrodes, the second black matrixes and virtual layers corresponding to the partial regions of the patterns of the first black matrixes, wherein the partial regions of the patterns of the first black matrixes does not contact the patterns of the second black matrixes.

20 . The manufacturing method of the color filter substrate according to claim 17 , wherein after the step of forming the color filter layers within the color filter regions, the method further comprises:
forming an insulating layer on surfaces formed with the patterns of the color filter layers; forming patterns of a plurality of second touch electrodes arranged at intervals and in parallel on a surface of the insulating layer away from the base substrate, the patterns of the second touch electrodes being perpendicular to the patterns of the first touch electrodes.

21 . The manufacturing method of the color filter substrate according to claim 17 , wherein the first touch electrodes are touch sensing electrodes for receiving sensing signals; and the second touch electrodes are touch driving electrodes for loading touch driving signals.

22 . The manufacturing method of the color filter substrate according to claim 20 , wherein the first touch electrodes are touch sensing electrodes for receiving sensing signals; and the second touch electrodes are touch driving electrodes for loading touch driving signals.

23 . The manufacturing method of the color filter substrate according to claim 21 , wherein material constituting the conducting layer comprises a conductive polymeric material; and the material constituting the second touch electrodes comprises a transparent conductive material.

24 . The manufacturing method of the color filter substrate according to claim 22 , wherein material constituting the conducting layer comprises a conductive polymeric material; and the material constituting the second touch electrodes comprises a transparent conductive material.

25 . The manufacturing method of the color filter substrate according to claim 23 , wherein the conductive polymeric material comprises at least one of poly(ethylenedioxy thiophene), poly(p-styrene sulfonate), polyaniline, polypyrrole and polythiophene.

26 . The manufacturing method of the color filter substrate according to claim 24 , wherein the conductive polymeric material comprises at least one of poly(ethylenedioxy thiophene), poly(p-styrene sulfonate), polyaniline, polypyrrole and polythiophene.

27 . The manufacturing method of the color filter substrate according to claim 17 , wherein after the step of forming the patterns of the color filter layers within the color filter regions, the method further comprises forming a protective layer on the color filter layers.

28 . A color filter substrate, comprising:
a base substrate; a plurality of first black matrixes and a plurality of second black matrixes which are intersected and positioned on a surface of the base substrate, and a plurality of first touch electrodes positioned on surfaces of the second black matrixes away from the base substrate, wherein the patterns

Assignees

• Boe Technology Group Co Ltd

Inventors

• Li Mingchao
• Zhang Fangzhen
• Zhang Peilin

Classifications

• G02F1/133516

  Methods for their manufacture, e.g. printing, electro-deposition or photolithography · CPC title

• G02F1/133512 Primary

  Light shielding layers, e.g. black matrix (G02F1/136209 takes precedence) · CPC title

• G02F1/13338

  Input devices, e.g. touch panels · CPC title

• G06F3/044

  by capacitive means · CPC title

• G02B5/201 Primary

  in the form of arrays · CPC title