Methods for texturing a chamber component and chamber components having a textured surface

US2016349621A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016349621-A1
Application numberUS-201414889322-A
CountryUS
Kind codeA1
Filing dateDec 15, 2014
Priority dateDec 15, 2014
Publication dateDec 1, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for a textured surface on a chamber component is provided and includes providing a chamber component, applying a layer of a photoresist to a surface of the chamber component, exposing a portion of the photoresist to optical energy using a mask to cure a portion of the photoresist, removing uncured photoresist from the surface, and electrochemically etching the chamber component to form a textured surface on the chamber component.

First claim

Opening claim text (preview).

1 . A method for a textured surface on a chamber component, the method comprising: providing a chamber component; applying a layer of a photoresist to a surface of the chamber component; exposing a portion of the photoresist to optical energy using a mask to cure a portion of the photoresist; removing uncured photoresist from the surface; and electrochemically etching the chamber component to form a textured surface on the chamber component. 2 . The method of claim 1 , wherein the chamber component comprises an anode during the etching. 3 . The method of claim 1 , wherein the chamber component comprises a shield assembly, a target plate, a support ring, a deposition ring, a support body, an alignment ring, or a substrate support. 4 . The method of claim 1 , wherein the chamber component comprises aluminum, stainless steel, or titanium. 5 . The method of claim 1 , wherein the textured surface comprises a plurality of circular structures. 6 . The method of claim 5 , wherein at least a portion of the circular structures intersect. 7 . The method of claim 5 , wherein the circular structures include a recess formed therein. 8 . The method of claim 1 , wherein the textured surface comprises a plurality of raised features surrounding and/or circumscribed by a plurality grooves. 9 . The method of claim 8 , wherein at least a portion of the grooves intersect. 10 . A chamber component for a processing chamber, the component comprising: a textured surface comprising a plurality of textured features formed by an electrochemical etching process, each of the textured features comprising: a plurality of raised features surrounding and/or circumscribed by a plurality grooves, and at least a portion of the grooves intersect. 11 . The component of claim 10 , wherein the textured surface is formed on a shield assembly, a target plate, a support ring, a deposition ring, a support body, an alignment ring, or a substrate support. 12 . The component of claim 10 , wherein the textured surface is formed on an aluminum material, a stainless steel material, or a titanium material. 13 . The component of claim 10 , wherein the textured surface comprises a plurality of circular structures. 14 . The component of claim 10 , wherein the grooves include a curved surface. 15 . The component of claim 14 , wherein the curved surface intersects with the raised feature at a sharp point. 16 . The component of claim 10 , wherein the grooves are formed at a depth of about 0.1 millimeters to about 2 millimeters. 17 . A chamber component for a processing chamber, the component comprising: a metallic material formed as a chamber component; a textured surface comprising a plurality of textured features formed by an electrochemical etching process on the metallic material, each of the textured features comprising: a plurality of raised features surrounding and/or circumscribed by a plurality grooves, each of the grooves including a curved surface intersecting with the raised feature at a sharp point. 18 . The component of claim 17 , wherein the chamber component comprises one of a shield assembly, a target plate, a support ring, a deposition ring, a support body, an alignment ring, or a substrate support. 19 . The component of claim 17 , wherein the metallic material comprises an aluminum material, a stainless steel material, or a titanium material. 20 . The component of claim 17 , wherein the textured surface comprises a plurality of circular structures.

Assignees

Inventors

Classifications

  • G03F7/40Primary

    Treatment after imagewise removal, e.g. baking · CPC title

  • of iron or steel · CPC title

  • Coatings or surface treatment on the inside of the reaction chamber or on parts thereof · CPC title

  • locally · CPC title

  • C23C14/564Primary

    Means for minimising impurities in the coating chamber such as dust, moisture, residual gases · CPC title

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What does patent US2016349621A1 cover?
A method for a textured surface on a chamber component is provided and includes providing a chamber component, applying a layer of a photoresist to a surface of the chamber component, exposing a portion of the photoresist to optical energy using a mask to cure a portion of the photoresist, removing uncured photoresist from the surface, and electrochemically etching the chamber component to form…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification G03F7/40. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Dec 01 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).