Conductive substrate, conductive substrate laminate, method for producing conductive substrate, and method for producing conductive substrate laminate

US2016342242A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016342242-A1
Application numberUS-201515114591-A
CountryUS
Kind codeA1
Filing dateJan 29, 2015
Priority dateJan 31, 2014
Publication dateNov 24, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A conductive substrate includes a transparent base material; a metal layer formed on at least one of surfaces of the transparent base material; and a blackened layer formed on the metal layer by a wet method.

First claim

Opening claim text (preview).

1 . A conductive substrate, comprising: a transparent base material; a metal layer formed on at least one of surfaces of the transparent base material; and a blackened layer formed on the metal layer by a wet method; and an adhesion layer formed between the transparent base material and the metal layer by dry plating, and being an Ni—Cu alloy layer including oxygen. 2 . The conductive substrate as claimed in claim 1 , wherein the metal layer and the blackened layer have patterns formed. 3 . A conductive substrate laminate, comprising: a plurality of the conductive substrates as claimed in claim 1 that are stacked. 4 . A method for producing a conductive substrate, the method comprising: a metal layer forming process for forming a metal layer on at least one of surfaces of a transparent base material; a blackened layer forming process for forming a blackened layer on the metal layer by a wet method; and an adhesion layer forming process for forming an adhesion layer on at least one of the surfaces of the transparent base material, by dry plating, the adhesion layer being an Ni—Cu alloy layer including oxygen and formed between the transparent base material and the metal layer. 5 . The method for producing the conductive substrate as claimed in claim 4 , the method further comprising: a patterning process for forming patterns on the metal layer and the blackened layer. 6 . A method for producing a conductive substrate laminate, the method comprising: a stacking process for stacking a plurality of the conductive substrates that have been obtained by the method for producing the conductive substrate as claimed in claim 4 . 7 . A conductive substrate laminate, comprising: a plurality of the conductive substrates as claimed in claim 2 that are stacked. 8 . A method for producing a conductive substrate laminate, the method comprising: a stacking process for stacking a plurality of the conductive substrates that have been obtained by the method for producing the conductive substrate as claimed in claim 5 .

Assignees

Inventors

Classifications

  • H05K1/0274Primary

    Optical details, e.g. printed circuits comprising integral optical means (H05K1/0269 takes precedence; coupling light guides with opto-electronic components G02B6/42) · CPC title

  • without Mo and W · CPC title

  • of copper · CPC title

  • Coatings including alternating layers following a pattern, a periodic or defined repetition · CPC title

  • Apparatus for manufacturing conducting or semi-conducting layers, e.g. deposition of metal · CPC title

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What does patent US2016342242A1 cover?
A conductive substrate includes a transparent base material; a metal layer formed on at least one of surfaces of the transparent base material; and a blackened layer formed on the metal layer by a wet method.
Who is the assignee on this patent?
Sumitomo Metal Mining Co
What technology area does this patent fall under?
Primary CPC classification H05K1/0274. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Nov 24 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).