Surface micromachined microphone with broadband signal detection

US2016337761A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016337761-A1
Application numberUS-201515111080-A
CountryUS
Kind codeA1
Filing dateJan 12, 2015
Priority dateJan 13, 2014
Publication dateNov 17, 2016
Grant date

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Abstract

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A surface micromachined microphone with a 230 kHz bandwidth. The structure uses a 2.25 μm thick, 305 μm radius polysilicon diaphragm suspended above an 11 μm gap to form a variable parallel-plate capacitance. The backcavity of the microphone consists of the 11 μm thick air volume immediately behind the moving diaphragm, and also an extended larger cavity with a radius of 504 μm. The dynamic frequency response of the sensor in response to electrostatic signals is presented using laser Doppler vibrometry, and indicates a system compliance of 0.4 nm/Pa in the flat-band of the response. The sensor is configured for acoustic signal detection using a charge amplifier configuration, and signal to noise ratio measurements and simulations are presented herein. A resolution of 0.80 mPa/√Hz (32 dB SPL in a 1 Hz bin) is achieved in the flat-band portion of the response extending from 10 kHz to 230 kHz.

First claim

Opening claim text (preview).

1 . An acoustic sensor, comprising: a diaphragm attached to a substrate via a plurality of columns forming a cavity; and a plurality of structures shorter in length than said plurality of columns attached to said substrate, wherein said plurality of structures is electrically conductive forming a lower electrode. 2 . The acoustic sensor as recited in claim 1 , wherein said cavity contains a barometric vent to an outside world. 3 . An acoustic sensor, comprising: a diaphragm attached to a substrate via a first set of sidewalls forming a first cavity; a lower electrode attached to said substrate that is capacitively coupled to said diaphragm; an upper electrode attached to said substrate via a second set of sidewalls, wherein said upper electrode has vents such that air pressure from sound waves deflect said diaphragm; and a second cavity formed between said upper electrode and said diaphragm forming a second capacitively coupled structure. 4 . The acoustic sensor as recited in claim 3 , wherein a first bias voltage is applied between said diaphragm and said lower electrode and a second bias voltage is applied between said diaphragm and said upper electrode. 5 . The acoustic sensor as recited in claim 4 , wherein said first and second bias voltages are balanced such that said diaphragm is physically centered between said upper and lower electrodes. 6 . The acoustic sensor as recited in claim 3 , wherein said first set of sidewalls contains at least one opening forming a barometric vent. 7 . An acoustic sensor, comprising: a diaphragm attached to a substrate via a first set of sidewalls; a lower electrode attached to said substrate via a second set of sidewalls, wherein said lower electrode is formed below said diaphragm, wherein said lower electrode has vents to a cavity formed between said lower electrode and said substrate; and a second cavity formed between said lower electrode and said diaphragm. 8 . The acoustic sensor as recited in claim 7 , wherein said first set of sidewalls contains at least one opening forming a vent. 9 . An acoustic sensor, comprising: a planar diaphragm with an active area; a cavity disposed at least partially above a substrate, wherein said cavity has a wall formed by said diaphragm, wherein said cavity has a planar area that is greater than said active area of said diaphragm; and one or more bottom electrodes. 10 . The acoustic sensor as recited in claim 9 , wherein said diaphragm comprises an approximately 2 μm thick polysilicon layer, wherein said cavity comprises an approximately 11 μm tall cylindrical air volume with an approximately 504 μm radius enclosed by said approximately 2 μm thick polysilicon diaphragm layer. 11 . The acoustic sensor as recited in claim 10 , wherein said polysilicon diaphragm layer has a clamped boundary condition at said approximately 504 μm radius perimeter. 12 . The acoustic sensor as recited in claim 10 , wherein said diaphragm is attached to a plurality of post structures from a radius of approximately 315 μm to said approximately 504 μm radius to prevent a portion of said diaphragm from moving during operation. 13 . The acoustic sensor as recited in claim 12 , wherein in a center region of said diaphragm from a radius of approximately 0 μm to said approximately 315 μm, there exists no post structures thereby allowing said diaphragm to move freely towards and away from said one or more bottom electrodes. 14 . The acoustic sensor as recited in claim 11 , wherein said clamped boundary condition is affixed to a sidewall that is attached to said substrate. 15 . The acoustic sensor as recited in claim 9 , wherein said diaphragm is attached to a plurality of post structures preventing a portion of said diaphragm from moving during operation. 16 . The acoustic sensor as recited in claim 9 , wherein said diaphragm comprises a conductively doped material acting as an electrode. 17 . The acoustic sensor as recited in claim 9 , wherein said diaphragm comprises a layer of conductive material deposited on it to form an electrode. 18 . The acoustic sensor as recited in claim 9 further comprising: a release hole existing at a portion of said diaphragm. 19 . The acoustic sensor as recited in claim 18 further comprising: a layer of polysilicon underneath said diaphragm configured to restrict airflow through said release hole or configured to collect a sealant when it is applied to a top surface of said sensor. 20 . The acoustic sensor as recited in claim 19 further comprising: a sealing layer on said top surface of said sensor.

Assignees

Inventors

Classifications

  • H04R17/02Primary

    Microphones · CPC title

  • G01S3/801Primary

    Details {(G01S3/82, G01S3/84, G01S3/86 take precedence)} · CPC title

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What does patent US2016337761A1 cover?
A surface micromachined microphone with a 230 kHz bandwidth. The structure uses a 2.25 μm thick, 305 μm radius polysilicon diaphragm suspended above an 11 μm gap to form a variable parallel-plate capacitance. The backcavity of the microphone consists of the 11 μm thick air volume immediately behind the moving diaphragm, and also an extended larger cavity with a radius of 504 μm. The dynamic fre…
Who is the assignee on this patent?
Univ Texas
What technology area does this patent fall under?
Primary CPC classification H04R17/02. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Nov 17 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).