MEMS microphone with springs and interior support
US-9078069-B2 · Jul 7, 2015 · US
US2016337761A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016337761-A1 |
| Application number | US-201515111080-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jan 12, 2015 |
| Priority date | Jan 13, 2014 |
| Publication date | Nov 17, 2016 |
| Grant date | — |
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A surface micromachined microphone with a 230 kHz bandwidth. The structure uses a 2.25 μm thick, 305 μm radius polysilicon diaphragm suspended above an 11 μm gap to form a variable parallel-plate capacitance. The backcavity of the microphone consists of the 11 μm thick air volume immediately behind the moving diaphragm, and also an extended larger cavity with a radius of 504 μm. The dynamic frequency response of the sensor in response to electrostatic signals is presented using laser Doppler vibrometry, and indicates a system compliance of 0.4 nm/Pa in the flat-band of the response. The sensor is configured for acoustic signal detection using a charge amplifier configuration, and signal to noise ratio measurements and simulations are presented herein. A resolution of 0.80 mPa/√Hz (32 dB SPL in a 1 Hz bin) is achieved in the flat-band portion of the response extending from 10 kHz to 230 kHz.
Opening claim text (preview).
1 . An acoustic sensor, comprising: a diaphragm attached to a substrate via a plurality of columns forming a cavity; and a plurality of structures shorter in length than said plurality of columns attached to said substrate, wherein said plurality of structures is electrically conductive forming a lower electrode. 2 . The acoustic sensor as recited in claim 1 , wherein said cavity contains a barometric vent to an outside world. 3 . An acoustic sensor, comprising: a diaphragm attached to a substrate via a first set of sidewalls forming a first cavity; a lower electrode attached to said substrate that is capacitively coupled to said diaphragm; an upper electrode attached to said substrate via a second set of sidewalls, wherein said upper electrode has vents such that air pressure from sound waves deflect said diaphragm; and a second cavity formed between said upper electrode and said diaphragm forming a second capacitively coupled structure. 4 . The acoustic sensor as recited in claim 3 , wherein a first bias voltage is applied between said diaphragm and said lower electrode and a second bias voltage is applied between said diaphragm and said upper electrode. 5 . The acoustic sensor as recited in claim 4 , wherein said first and second bias voltages are balanced such that said diaphragm is physically centered between said upper and lower electrodes. 6 . The acoustic sensor as recited in claim 3 , wherein said first set of sidewalls contains at least one opening forming a barometric vent. 7 . An acoustic sensor, comprising: a diaphragm attached to a substrate via a first set of sidewalls; a lower electrode attached to said substrate via a second set of sidewalls, wherein said lower electrode is formed below said diaphragm, wherein said lower electrode has vents to a cavity formed between said lower electrode and said substrate; and a second cavity formed between said lower electrode and said diaphragm. 8 . The acoustic sensor as recited in claim 7 , wherein said first set of sidewalls contains at least one opening forming a vent. 9 . An acoustic sensor, comprising: a planar diaphragm with an active area; a cavity disposed at least partially above a substrate, wherein said cavity has a wall formed by said diaphragm, wherein said cavity has a planar area that is greater than said active area of said diaphragm; and one or more bottom electrodes. 10 . The acoustic sensor as recited in claim 9 , wherein said diaphragm comprises an approximately 2 μm thick polysilicon layer, wherein said cavity comprises an approximately 11 μm tall cylindrical air volume with an approximately 504 μm radius enclosed by said approximately 2 μm thick polysilicon diaphragm layer. 11 . The acoustic sensor as recited in claim 10 , wherein said polysilicon diaphragm layer has a clamped boundary condition at said approximately 504 μm radius perimeter. 12 . The acoustic sensor as recited in claim 10 , wherein said diaphragm is attached to a plurality of post structures from a radius of approximately 315 μm to said approximately 504 μm radius to prevent a portion of said diaphragm from moving during operation. 13 . The acoustic sensor as recited in claim 12 , wherein in a center region of said diaphragm from a radius of approximately 0 μm to said approximately 315 μm, there exists no post structures thereby allowing said diaphragm to move freely towards and away from said one or more bottom electrodes. 14 . The acoustic sensor as recited in claim 11 , wherein said clamped boundary condition is affixed to a sidewall that is attached to said substrate. 15 . The acoustic sensor as recited in claim 9 , wherein said diaphragm is attached to a plurality of post structures preventing a portion of said diaphragm from moving during operation. 16 . The acoustic sensor as recited in claim 9 , wherein said diaphragm comprises a conductively doped material acting as an electrode. 17 . The acoustic sensor as recited in claim 9 , wherein said diaphragm comprises a layer of conductive material deposited on it to form an electrode. 18 . The acoustic sensor as recited in claim 9 further comprising: a release hole existing at a portion of said diaphragm. 19 . The acoustic sensor as recited in claim 18 further comprising: a layer of polysilicon underneath said diaphragm configured to restrict airflow through said release hole or configured to collect a sealant when it is applied to a top surface of said sensor. 20 . The acoustic sensor as recited in claim 19 further comprising: a sealing layer on said top surface of said sensor.
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