Semiconductor device

US2016334573A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016334573-A1
Application numberUS-201615152117-A
CountryUS
Kind codeA1
Filing dateMay 11, 2016
Priority dateMay 15, 2015
Publication dateNov 17, 2016
Grant date

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A low reflectance film with a second reflectance (50% or lower) lower than a first reflectance is formed between an optical directional coupler and a first-layer wiring with the first reflectance. Thus, even when the first-layer wiring is formed above the optical directional coupler, the influence of the light reflected by the first-layer wiring on the optical signal propagating through the first optical waveguide and the second optical waveguide of the optical directional coupler can be reduced. Accordingly, the first-layer wiring can be arranged above the optical directional coupler, and the restriction on the layout of the first-layer wiring is relaxed.

First claim

Opening claim text (preview).

What is claimed is: 1 . A semiconductor device comprising: a semiconductor substrate; a first insulating film formed on the semiconductor substrate; an optical waveguide made of a semiconductor layer formed on the first insulating film; a second insulating film formed on the first insulating film so as to cover the optical waveguide; and a wiring with a first reflectance formed on the second insulating film, wherein a low reflectance film with a second reflectance lower than the first reflectance is formed between the optical waveguide and the wiring. 2 . The semiconductor device according to claim 1 , wherein the second reflectance of the low reflectance film is 50% or lower. 3 . The semiconductor device according to claim 1 , wherein an end of the low reflectance film is located on an outer side relative to an end of the wiring when seen in a plan view. 4 . The semiconductor device according to claim 1 , wherein an end of the low reflectance film is located on an outer side relative to an end of the wiring by 1 μm or more when seen in a plan view. 5 . The semiconductor device according to claim 1 , wherein an optical signal travels in a first direction in the optical waveguide, in a cross section including a second direction and a third direction orthogonal to the first direction, on the same side as one end of the low reflectance film, the one end of the low reflectance film is located on an outer side relative to a first line connecting one end of a lower surface of the wiring and one end of an upper surface of the optical waveguide, and on the same side as the other end of the low reflectance film, the other end of the low reflectance film is located on an outer side relative to a second line connecting the other end of the lower surface of the wiring and the other end of the upper surface of the optical waveguide. 6 . The semiconductor device according to claim 1 , wherein the second insulating film is constituted of a lower-layer insulating film and an upper-layer insulating film, and the low reflectance film is located between the lower-layer insulating film and the upper-layer insulating film. 7 . The semiconductor device according to claim 1 , wherein the low reflectance film is located between the second insulating film and the wiring and is in contact with a lower surface of the wiring. 8 . The semiconductor device according to claim 7 , wherein the low reflectance film is formed on a side surface of the wiring. 9 . The semiconductor device according to claim 1 , wherein the low reflectance film is fixed to a reference potential. 10 . The semiconductor device according to claim 1 , wherein the low reflectance film is made of tungsten, tantalum, titanium or titanium nitride. 11 . The semiconductor device according to claim 1 , wherein the wiring is made of aluminum or copper.

Assignees

Inventors

Classifications

  • Bond pads, in general · CPC title

  • the principal metal being copper · CPC title

  • the principal metal being aluminium · CPC title

  • G02F1/025Primary

    in an optical waveguide structure (G02F1/017, {G02F1/2257} take precedence) · CPC title

  • Silicon · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US2016334573A1 cover?
A low reflectance film with a second reflectance (50% or lower) lower than a first reflectance is formed between an optical directional coupler and a first-layer wiring with the first reflectance. Thus, even when the first-layer wiring is formed above the optical directional coupler, the influence of the light reflected by the first-layer wiring on the optical signal propagating through the fir…
Who is the assignee on this patent?
Renesas Electronics Corp
What technology area does this patent fall under?
Primary CPC classification G02F1/025. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Nov 17 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).