Compound, compound fabrication method, and graphene nanoribbon fabrication method
US-10636539-B2 · Apr 28, 2020 · US
Graphene nanoribbon precursors and monomers suitable for preparation thereof
US2016333141A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016333141-A1 |
| Application number | US-201615219747-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jul 26, 2016 |
| Priority date | Oct 26, 2011 |
| Publication date | Nov 17, 2016 |
| Grant date | — |
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Abstract
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Provided are graphene nanoribbon precursors comprising repeated units of the general formula (I) in which R 1 , R 2 are each H, halogen, —OH, —NH 2 , —CN, —NO 2 or a hydrocarbyl radical which has 1 to 40 carbon atoms and may be linear or branched, saturated or unsaturated and mono- or poly-substituted by halogen (F, Cl, Br, I), —OH, —NH 2 , —CN, and/or —NO 2 , where one or more CH 2 groups may also be replaced by —O—, —S—, —C(O)O—, —O—C(O)—, —C(O)—, —NH— or —NR—, in which R is an optionally substituted C 1 C 40 -hydrocarbyl radical, or an optionally substituted aryl, alkylaryl or alkoxyaryl radical.
First claim
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1 . A graphene nanoribbon obtained by cyclodehydrogenation, in solution or on a metal surfgace, of a precursor comprising repeat units of the general formula (I) in which R 1 , R 2 are each H, halogen, —OH, —NH 2 , —CN, —NO 2 or a hydrocarbyl radical which has 1 to 40 carbon atoms and may be linear or branched, saturated or unsaturated and mono- or poly-substituted by halogen (F, Cl, Br, I), —OH, —NH 2 , —CN, and/or —NO 2 , where one or more CH 2 groups may also be replaced by —O—, —S—, —C(O)O—, —O—C(O)—, —C(O)—, —NH— or —NR—, in which R is an optionally substituted C 1 C 40 -hydrocarbyl radical, or an optionally substituted aryl, alkylaryl or alkoxyaryl radical.
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- What does patent US2016333141A1 cover?
- Provided are graphene nanoribbon precursors comprising repeated units of the general formula (I) in which R 1 , R 2 are each H, halogen, —OH, —NH 2 , —CN, —NO 2 or a hydrocarbyl radical which has 1 to 40 carbon atoms and may be linear or branched, saturated or unsaturated and mono- or poly-substituted by halogen (F, Cl, Br, I), —OH, —NH 2 , —CN, and/or —NO 2 , where one or more CH 2 groups m…
- Who is the assignee on this patent?
- Basf Se, Max-Planck-Gesellschaft Zur Foerderung Der Wss E V
- What technology area does this patent fall under?
- Primary CPC classification C07C17/30. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Thu Nov 17 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).