Tungsten sintered compact sputtering target and method for producing same
US-2015357170-A1 · Dec 10, 2015 · US
Design and assembly of graded-oxide tantalum porous films from size-selected nanoparticles and dental and biomedical implant application thereof
US2016331872A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016331872-A1 |
| Application number | US-201515111293-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jan 15, 2015 |
| Priority date | Jan 16, 2014 |
| Publication date | Nov 17, 2016 |
| Grant date | — |
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Abstract
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A porous film made of size-selected tantalum nanoparticles is formed on a substrate, the porous film having a graded oxidation profile perpendicular to a surface of the substrate.
First claim
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1 . A porous film made of size-selected tantalum nanoparticles, formed on a substrate, the porous film having a graded oxidation profile perpendicular to a surface of the substrate. 2 . The porous film made of size-selected tantalum nanoparticles according to claim 1 , wherein oxidation of the tantalum nanoparticles is higher on a top surface of the film and is progressively lower towards a bottom surface of the film that is on the substrate. 3 . The porous film made of size-selected tantalum nanoparticles according to claim 1 , further comprising a mono-disperse layer of silver (Ag) deposited on the porous film, thereby providing enhanced antimicrobial properties. 4 . The porous film made of size-selected tantalum nanoparticles according to claim 2 , further comprising a mono-disperse layer of silver (Ag) deposited on the porous film, thereby providing enhanced antimicrobial properties. 5 . A dental implant comprising: an implant base; and a porous film made of size-selected tantalum nanoparticles, formed on the implant base, the porous film having a graded oxidation profile perpendicular to a surface of the implant base. 6 . The dental implant according to claim 5 , wherein oxidation of the tantalum nanoparticles in the porous film is higher on a top surface of the film and is progressively lower towards a bottom surface of the film that is on the implant base. 7 . The dental implant according to claim 5 , further comprising a monodisperse layer of silver (Ag) deposited on the porous film, thereby providing enhanced antimicrobial properties. 8 . The dental implant according to claim 6 , further comprising a monodisperse layer of silver (Ag) deposited on the porous film, thereby providing enhanced antimicrobial properties. 9 . The dental implant according to claim 5 , wherein the implant base is made of a Ti alloy. 10 . A biomedical implant comprising: an implant base; and a porous film made of size-selected tantalum nanoparticles, formed on the implant base, the porous film having a graded oxidation profile perpendicular to a surface of the implant base.
Assignees
Inventors
Classifications
- C23C14/165Primary
by cathodic sputtering · CPC title
Magnetron sputtering · CPC title
for dental implants or prostheses · CPC title
being a conversion layer, e.g. oxide layer · CPC title
Porous materials, e.g. foams or sponges · CPC title
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- What does patent US2016331872A1 cover?
- A porous film made of size-selected tantalum nanoparticles is formed on a substrate, the porous film having a graded oxidation profile perpendicular to a surface of the substrate.
- Who is the assignee on this patent?
- Okinawa Inst Science & Tech School Corp, Okinawa Inst Science & Tech School Corp
- What technology area does this patent fall under?
- Primary CPC classification C23C14/165. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Thu Nov 17 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).