Optoelectronic component and method for producing same
US-12176444-B2 · Dec 24, 2024 · US
US2016308103A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016308103-A1 |
| Application number | US-201615192936-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jun 24, 2016 |
| Priority date | Jul 8, 2013 |
| Publication date | Oct 20, 2016 |
| Grant date | — |
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A method and structure for stabilizing an array of micro devices is disclosed. A stabilization layer includes an array of stabilization cavities and array of stabilization posts. Each stabilization cavity includes sidewalls surrounding a stabilization post. The array of micro devices is on the array of stabilization posts. Each micro device in the array of micro devices includes a bottom surface that is wider than a corresponding stabilization post directly underneath the bottom surface.
Opening claim text (preview).
What is claimed is: 1 . A structure comprising: a stabilization layer comprising an array of stabilization cavities and an array of stabilization posts, wherein each stabilization cavity includes a stabilization post and sidewalls that surround and are taller than the stabilization post; and an array of chips on the array of stabilization posts; wherein each chip in the array of chips includes a bottom surface that is wider than a corresponding stabilization post directly underneath the bottom surface, and each chip includes circuitry to control one or more LED devices. 2 . The structure of claim 1 , wherein the circuitry of each chip is to control more than one LED device. 3 . The structure of claim 2 , wherein each chip includes an active silicon layer and a build up layer underneath the active silicon layer. 4 . The structure of claim 1 , further comprising a sacrificial layer between the stabilization layer and the array of chips, wherein the array of stabilization posts extend through a thickness of the sacrificial layer, and wherein the sacrificial layer spans along a side surface of each of the chips in the array of chips, the side surface running between a top surface and the bottom surface of each chip in the array. 5 . The structure of claim 4 , wherein the sacrificial layer comprises an oxide or nitride. 6 . The structure of claim 1 , further comprising an array of bottom conductive contacts on the bottom surfaces of the array of chips. 7 . The structure of claim 6 , wherein each stabilization post includes a top surface contact area that is less than a bottom surface contact area of a corresponding bottom conductive contact. 8 . The structure of claim 6 , wherein each bottom conductive contact comprises a layer stack. 9 . The structure of claim 8 , wherein the layer stack comprises: an electrode layer; a mirror layer on the electrode layer; a barrier layer on the mirror layer; a diffusion barrier layer on the barrier layer; and a bonding layer on the diffusion barrier layer; 10 . The structure of claim 8 , wherein the layer stack comprises: an electrode layer comprising nickel; a mirror layer comprising silver on the electrode layer; a barrier layer comprising titanium on the mirror layer; a diffusion barrier layer comprising platinum on the barrier layer; and a bonding layer comprising a noble metal on the diffusion barrier layer; 11 . The structure of claim 8 , wherein the layer stack comprises a bonding layer, and the bonding layer comprises a noble metal. 12 . The structure of claim 11 , wherein the stabilization layer is formed of a thermoset material. 13 . The structure of claim 12 , wherein the thermoset material comprises benzocyclobutene (BCB), and the noble metal is gold. 14 . The structure of claim 8 , wherein the layer stack further comprises: an electrode layer on the bottom surface of the chip; and a diffusion barrier layer on and around sidewalls the electrode layer; wherein the bonding layer is on the diffusion barrier layer. 15 . The structure of claim 14 , wherein the stabilization layer is formed of a thermoset material, and the bonding layer comprises a noble metal. 16 . The structure of claim 1 , wherein the stabilization posts in the array of stabilization posts are separated by a pitch of 1 μm to 100 μm. 17 . The structure of claim 1 , wherein each chip includes a top surface that is above a corresponding staging cavity sidewalls top surface. 18 . The structure of claim 1 , wherein each chip has a maximum dimension of 1 μm to 100 μm.
the auxiliary member being a temporary substrate, e.g. a removable substrate · CPC title
Package configurations · CPC title
Apparatus therefor · CPC title
batch processes · CPC title
Two-dimensional arrangements, e.g. asymmetric LED layout · CPC title
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