Common mode filter for improving magnetic permeability and high frequency characteristics

US2016307687A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016307687-A1
Application numberUS-201615099921-A
CountryUS
Kind codeA1
Filing dateApr 15, 2016
Priority dateApr 16, 2015
Publication dateOct 20, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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A common mode filter includes a magnetic substrate in which ferrite particles having anisotropy and a planar structure are disposed to have a planar orientation.

First claim

Opening claim text (preview).

What is claimed is: 1 . A common mode filter comprising: a magnetic substrate in which ferrite particles having anisotropy and a planar structure have planar magnetic anisotropy. 2 . The common mode filter of claim 1 , wherein the ferrite particles include hexaferrite particles having a plate shape, and the planar magnetic anisotropy is formed depending on an arrangement of the hexaferrite particles having the plate shape. 3 . The common mode filter of claim 1 , wherein at least one of magnetic permeability and a resonance frequency is adjusted by adjusting at least one of a size, a length, and the planar structure of the ferrite particles. 4 . The common mode filter of claim 1 , wherein the planar magnetic anisotropy possessed by the ferrite particles is disposed in at least one of a vertical direction and a horizontal direction of the magnetic substrate. 5 . The common mode filter of claim 2 , wherein the hexaferrite particles have a size of 50 μm or less. 6 . A common mode filter comprising: a coil part including an insulating layer and a conductor pattern formed in the insulating layer; and a magnetic substrate coupled to one or both surfaces of the coil part, wherein the magnetic substrate is provided with ferrite particles having anisotropy and a planar structure. 7 . The common mode filter of claim 6 , wherein the ferrite particles have planar magnetic anisotropy. 8 . The common mode filter of claim 6 , wherein an upper portion of the magnetic substrate is coupled to an upper surface of the coil part, and the ferrite particles disposed in the upper portion of the magnetic substrate are disposed horizontally in an upper portion of the upper portion of the magnetic substrate. 9 . The common mode filter of claim 8 , further including ferrite particles disposed vertically in a lower portion of the upper portion of the magnetic substrate. 10 . The common mode filter of claim 6 , wherein a lower portion of the magnetic substrate is coupled to a lower surface of the coil part, and the ferrite particles disposed in the lower portion of the magnetic substrate are disposed horizontally in a lower portion of the lower portion of the magnetic substrate. 11 . The common mode filter of claim 10 , further including ferrite particles disposed vertically in an upper portion of the lower portion of the magnetic substrate. 12 . A common mode filter comprising: a magnetic substrate in which a permanent magnet having anisotropy and a planar structure has planar magnetic anisotropy. 13 . The common mode filter of claim 12 , wherein the planar magnetic anisotropy possessed by the permanent magnet is disposed in at least one of a vertical direction and a horizontal direction of the magnetic substrate.

Assignees

Inventors

Classifications

  • H01F27/255Primary

    made from particles (H01F27/26 takes precedence) · CPC title

  • Printed windings · CPC title

  • Common mode choke coil · CPC title

  • with stacked layers · CPC title

  • Hexaferrites with decreased hardness or anisotropy, i.e. with increased permeability in the microwave (GHz) range, e.g. having a hexagonal crystallographic structure · CPC title

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Frequently asked questions

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What does patent US2016307687A1 cover?
A common mode filter includes a magnetic substrate in which ferrite particles having anisotropy and a planar structure are disposed to have a planar orientation.
Who is the assignee on this patent?
Samsung Electro Mech
What technology area does this patent fall under?
Primary CPC classification H01F27/255. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Oct 20 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).