Composition for nanoimprint and nanoimprint pattern forming method

Patent metadata

Field	Value
Publication number	US-2016306276-A1
Application number	US-201615097772-A
Country	US
Kind code	A1
Filing date	Apr 13, 2016
Priority date	Apr 15, 2015
Publication date	Oct 20, 2016
Grant date	—

Abstract

A composition for nanoimprinting including a siloxane polymer which includes a polymerizable group polymerized by irradiation with light; a polymerization initiator; and a fluorine-containing polymeric compound in which the fluorine-containing polymeric compound has a constituent unit represented by the following formula (f1-1) in which R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Rf 102 and Rf 103 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Rf 102 and Rf 103 may be the same as or different from each other, nf 1 represents an integer of 1 to 5, and Rf 101 represents an organic group including a fluorine atom.

First claim

What is claimed is:

1 . A composition for nanoimprinting comprising:
a siloxane polymer (A) which includes a polymerizable group polymerized by irradiation with light; a polymerization initiator (C); and a fluorine-containing polymeric compound (F), wherein the fluorine-containing polymeric compound (F) comprises a constituent unit represented by the following formula (f1-1):

wherein R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Rf 102 and Rf 103 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Rf 102 and Rf 103 may be the same as or different from each other; nf 1 represents an integer of 1 to 5, and Rf 101 represents an organic group including a fluorine atom.

2 . The composition for nanoimprint according to claim 1 , wherein the fluorine-containing polymeric compound (F) further comprises a constituent unit containing an alicyclic hydrocarbon group.

3 . The composition for nanoimprint according to claim 1 , wherein the siloxane polymer (A) is a polymeric compound represented by the following formula (A1),

wherein R 1 represents a group containing an ethylenic unsaturated double bond; R 0 represents an alkylene group having 1 to 9 carbon atoms, m R 0 's may be different from each other; R 2 represents an alkyl group, an aryl group, or a hydrogen atom, n R 2 's may be different from each other; and m:n is in a range of 50:50 to 100:0.

4 . The composition for nanoimprint according to claim 1 , further comprising:
an alkoxysilane compound (B), wherein the alkoxysilane compound (B) is a compound represented by any of the following formulae (B1) to (B3),
[R 3  s SiO—R 4 ] t   (B1)

wherein R 3 and R 4 each independently represent an alkyl group; s+t is 4, t represents an integer of 1 to 4, and s represents an integer of 0 to 3;

wherein R 5 to R 7 each independently represent an alkyl group or an alkoxy group, at least one of R 5 to R 7 represents an alkoxy group; and X represents a single bond or an alkylene group having 1 to 5 carbon atoms; and

wherein R 8 and R 9 each independently represent an alkyl group or an alkoxy group, and at least one of R 8 and R 9 represents an alkoxy group.

5 . A nanoimprint pattern forming method comprising:
coating a substrate with the composition for nanoimprint according to claim 1 to form a resin layer of the composition for nanoimprint; pressing a mold, on which an uneven structure having a predetermined pattern is formed, to the resin layer of the composition for nanoimprint and deforming the resin layer of the composition for nanoimprint to the predetermined pattern; and exposing the resin layer of the composition for nanoimprint to light in a state where the mold is pressed.

6 . A nanoimprint pattern forming method comprising:
forming an organic layer on an inorganic substrate; coating the organic layer with the composition for nanoimprint according to claim 1 to form a resin layer of the composition for nanoimprint; pressing a mold, on which an uneven structure having a predetermined pattern is formed, to the resin layer of the composition for nanoimprint and deforming the resin layer of the composition for nanoimprint to the predetermined pattern; and exposing the resin layer of the composition for nanoimprint to light in a state where the mold is pressed.

7 . The nanoimprint pattern forming method according to claim 5 , further comprising etching the resin layer of the composition for nanoimprint, which is deformed to the predetermined pattern, as a mask.

Assignees

• Tokyo Ohka Kogyo Co Ltd

Inventors

• Konno Kenri

Classifications

• G03F7/0046

  with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title

• G03F7/0757

  Macromolecular compounds containing Si-O, Si-C or Si-N bonds (G03F7/0752 takes precedence) · CPC title

• C08L83/06

  containing silicon bound to oxygen-containing groups (C08L83/12 takes precedence) · CPC title

• G03F7/0388

  with ethylenic or acetylenic bands in the side chains of the photopolymer · CPC title

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title