Array substrate and its manufacturing method and display device

Patent metadata

Field	Value
Publication number	US-2016306241-A1
Application number	US-201514784750-A
Country	US
Kind code	A1
Filing date	May 4, 2015
Priority date	Jan 4, 2015
Publication date	Oct 20, 2016
Grant date	—

Abstract

An array substrate and its manufacturing method, and a display device are disclosed, and the array substrate includes a black matrix ( 200 ) disposed on a base substrate ( 100 ) and has a plurality of pixel units arranged in an array, the orthographic projection of the pattern of the black matrix ( 200 ) on the base substrate at least partially covers the gap between adjacent pixel units, and the surface of at least a portion of the black matrix ( 200 ) has a first concave-convex structure (A) capable of reflecting the light irradiated to the surface of the black matrix ( 200 ) in diffuse reflection. Because the first concave-convex structure (A) of the surface of the black matrix ( 200 ) has a diffuse reflection effect, the external light will be subjected to diffuse reflection when irradiated to the surface of the black matrix ( 200 ), thereby reducing the light intensity of the reflected light, enhancing the visibility of the area of each of the pixel units of the array substrate, and improving the display effect of picture.

First claim

1 . An array substrate, comprising: a base substrate and a black matrix disposed on the base substrate,
wherein the array substrate comprises a plurality of pixel units arranged in an array, the orthographic projection of the pattern of the black matrix on the base substrate at least partially covers a gap between the adjacent pixel units, and a surface of at least a portion of the black matrix comprises a first concave-convex structure capable of reflecting the light irradiated to the surface of the black matrix in diffuse reflection.

2 . The array substrate according to claim 1 , further comprising: an insulation layer disposed below and in direct contact with the black matrix, wherein a surface of the insulation layer comprises a second concave-convex structure matching the first concave-convex structure of the surface of the black matrix.

3 . The array substrate according to claim 1 , wherein a material of the black matrix is a metal material.

4 . The array substrate according to claim 1 , further comprising: a slit-shaped first electrode disposed in an area of each of the pixel units on the base substrate, wherein the first electrode is made of a same material and disposed in the same layer as the black matrix.

5 . The array substrate according to claim 1 , further comprising: a second electrode disposed in an area of each of the pixel units on the base substrate, wherein the second electrode is insulated from the first electrode via the insulation layer.

6 . The array substrate according to claim 5 , wherein the second electrode is a planar electrode or a slit electrode.

7 . The array substrate according to claim 5 , wherein orthographic projections of the first electrode and the second electrode on the base substrate at least partially overlap.

8 . The array substrate according to claim 5 , wherein the first electrode is a common electrode and the second electrode is a pixel electrode; or
the first electrode is a pixel electrode and the second electrode is a common electrode.

9 . The array substrate according to claim 2 , wherein the insulation layer is a color filter layer comprising filters of at least three different colors.

10 . The array substrate according to claim 2 , wherein the first concave-convex structure has a width of 3 to 6 microns; and/or
the first concave-convex structure has a depth of 0.5 to 1.5 microns; and/or the first concave-convex structure has an interval of 3 to 6 microns.

11 . A display device comprising the array substrate according to claim 1 .

12 . A method of manufacturing an array substrate, comprising:
forming a plurality of pixel units arranged in an array on a base substrate and forming a pattern of a black matrix which at least partially covers a gap between adjacent pixel units; wherein a surface of at least a portion of the pattern of the black matrix comprises a first concave-convex structure capable of reflecting the light irradiated to the surface of the black matrix in diffuse reflection.

13 . The method of claim 12 , wherein forming the pattern of the black matrix on the base substrate comprises:
forming on the base substrate a pattern of an insulation layer which comprises a second concave-convex structure; forming a metal layer on the insulation layer; and patterning the metal layer by a patterning process to form the pattern of the black matrix with at least a portion of the surface thereof comprising a first concave-convex structure at the gap between the adjacent pixel units and to form a pattern of a first electrode in an area of each of the pixel units.

14 . The method according to claim 13 , comprising:
forming on the base substrate a pattern of a second electrode in the area of each of the pixel units prior to forming on the base substrate the pattern of the insulation layer comprising the second concave-convex structure; wherein forming on the base substrate the pattern of an insulation layer comprising the second concave-convex structure comprises: forming a color filter layer comprising filters of at least three different colors on the pattern of the second electrode, the filter layer comprising the second concave-convex structure.

15 . The array substrate according to claim 2 , wherein a material of the black matrix is a metal material.

16 . The array substrate according to claim 2 , further comprising: a slit-shaped first electrode disposed in an area of each of the pixel units on the base substrate, wherein the first electrode is made of a same material and disposed in the same layer as the black matrix.

17 . The array substrate according to claim 2 , further comprising: a second electrode disposed in an area of each of the pixel units on the base substrate, wherein the second electrode is insulated from the first electrode via the insulation layer.

18 . The array substrate according to claim 17 , wherein the second electrode is a planar electrode or a slit electrode.

19 . The array substrate according to claim 3 , wherein the insulation layer is a color filter layer comprising filters of at least three different colors.

20 . The array substrate according to claim 3 , wherein the first concave-convex structure has a width of 3 to 6 microns; and/or
the first concave-convex structure has a depth of 0.5 to 1.5 microns; and/or the first concave-convex structure has an interval of 3 to 6 microns.

Assignees

• Boe Technology Group Co Ltd

Inventors

• Choi Seungjin

Classifications

• H10K59/8792

  comprising light absorbing layers, e.g. black layers · CPC title

• H10D86/411

  characterised by materials, geometry or structure of the substrates · CPC title

• H10D86/0212

  comprising manufacture, treatment or coating of substrates · CPC title

• H10D86/60

  wherein the TFTs are in active matrices · CPC title

• G02F1/13439

  characterised by their electrical, optical, physical properties; materials therefor; method of making · CPC title