In-situ optical monitoring of fabrication of integrated computational elements

Patent metadata

Field	Value
Publication number	US-2016298955-A1
Application number	US-201314412308-A
Country	US
Kind code	A1
Filing date	Dec 24, 2013
Priority date	Dec 24, 2013
Publication date	Oct 13, 2016
Grant date	—

Abstract

Techniques include receiving a design of an integrated computational element (ICE), the ICE design including specification of a substrate and a plurality of layers, their respective target thicknesses and complex refractive indices, complex refractive indices of adjacent layers being different from each other, and a notional ICE fabricated in accordance with the ICE design being related to a characteristic of a sample over an operational wavelength range; forming at least some of the layers of the ICE in accordance with the ICE design; optically monitoring, during the forming, optical properties of the formed layers using quasi-monochromatic probe-light having a probe wavelength that is outside of the operational wavelength range of the ICE; and adjusting the forming, at least in part, based on the optically monitored optical properties of the formed layers of the ICE.

First claim

1 . A method comprising:
receiving, by a fabrication system, a design of an integrated computational element (ICE), the ICE design comprising specification of a substrate and a plurality of layers, their respective target thicknesses and complex refractive indices, wherein complex refractive indices of adjacent layers are different from each other, and wherein a notional ICE fabricated in accordance with the ICE design is related to a characteristic of a sample over an operational wavelength range; forming, by the fabrication system, at least some of the layers of the ICE in accordance with the ICE design; optically monitoring, during said forming, by a measurement system associated with the fabrication system, optical properties of the formed layers using quasi-monochromatic probe-light having a probe wavelength that is outside of the operational wavelength range of the ICE; and adjusting, by the fabrication system, said forming, at least in part, based on the optically monitored optical properties of the formed layers of the ICE.

2 . The method of claim 1 , wherein the centered probe wavelength is shorter than wavelengths of the operational wavelength range of the ICE.

3 . The method of claim 2 , wherein said optically monitoring the optical properties of formed layers is performed using the quasi-monochromatic probe-light having the probe wavelength that is outside of the operational wavelength range of the ICE and at least one additional quasi-monochromatic probe-light having another different probe wavelength.

4 . The method of claim 3 , wherein the other probe wavelength is shorter than wavelengths of the operational wavelength range of the ICE.

5 . The method of claim 3 , wherein the other probe wavelength is longer than wavelengths of the operational wavelength range of the ICE.

6 . The method of claim 3 , wherein the other probe wavelength is within the operational wavelength range of the ICE.

7 . The method of claim 1 , wherein the probe wavelength is longer than wavelengths of the operational wavelength range of the ICE.

8 . The method of claim 7 , wherein said optically monitoring the optical properties of formed layers is performed using the quasi-monochromatic probe-light having the probe wavelength that is outside of the operational wavelength range of the ICE and at least one additional quasi-monochromatic probe-light having another different probe wavelength.

9 . The method of claim 8 , wherein the other probe wavelength is longer than wavelengths of the operational wavelength range of the ICE.

10 . The method of claim 8 , wherein the other probe wavelength is within the operational wavelength range of the ICE.

11 . The method of claim 1 , wherein
the operational wavelength range of the ICE spans near-IR and IR spectral regions, and the probe wavelength is in the UV-visible spectral region.

12 . The method of claim 1 , wherein
the operational wavelength range of the ICE spans visible and near-IR spectral regions, and the probe wavelength is in the IR spectral region.

13 . The method of claim 1 , wherein
the operational wavelength range of the ICE spans the UV spectral region, and the probe wavelength is in the visible spectral region.

14 . The method of claim 1 , wherein said adjusting comprises updating a deposition rate used to form the layers remaining to be formed based on the optically monitored optical properties of the formed layers of the ICE.

15 . The method of claim 1 , wherein said adjusting comprises modifying complex refractive indices of the layers remaining to be formed based on the optically monitored optical properties of the formed layers of the ICE.

16 . The method of claim 1 , wherein said adjusting comprises modifying target thicknesses of the layers remaining to be formed based on the optically monitored optical properties of the formed layers of the ICE.

17 . The method of claim 1 , wherein said adjusting comprises changing a total number of layers specified by the ICE design to a new total number of layers.

18 . A system comprising:
a deposition chamber; one or more deposition sources associated with the deposition chamber to provide materials from which layers of one or more integrated computational elements (ICEs) are formed, wherein an ICE design associated with the ICEs specifies an operational wavelength range of the ICEs; one or more supports disposed inside the deposition chamber, at least partially, within a field of view of the one or more deposition sources to support the layers of the ICEs while the layers are formed; an optical monitor associated with the deposition chamber to monitor one or more characteristics of the layers while the layers are formed, wherein the optical monitor comprises one or more light sources to emit quasi-monochromatic probe-light having a probe wavelength that is outside of the operational wavelength range of the ICEs; and a computer system in communication with at least some of the one or more deposition sources, the one or more supports and the optical monitor, wherein the computer system comprises one or more hardware processors and non-transitory computer-readable medium encoding instructions that, when executed by the one or more hardware processors, cause the system to form the layers of the ICEs by performing operations comprising:
receiving an ICE design comprising specification of a substrate and a plurality of layers, their respective target thicknesses and complex refractive indices, wherein complex refractive indices of adjacent layers are different from each other, and wherein a notional ICE fabricated in accordance with the ICE design is related to a characteristic of a sample over an operational wavelength range;
forming at least some of the layers of the ICEs in accordance with the ICE design;
optically monitoring, by the optical monitor during said forming, optical properties of the formed layers using quasi-monochromatic probe-light having a probe wavelength that is outside of the operational wavelength range; and
adjusting said forming, at least in part, based on the optically monitored optical properties of the formed layers of the ICE.

19 . The system of claim 18 , wherein the one or more light source of the optical monitor to emit the quasi-monochromatic probe-light having the probe wavelength that is outside of the operational wavelength range of the ICEs and at least one additional quasi-monochromatic probe-light having another different probe wavelength.

20 . The system of claim 19 , wherein the other probe wavelength is outside of the operational wavelength range of the ICEs.

21 . The system of claim 19 , wherein the other probe wavelength is within the operational wavelength range of the ICEs.

Assignees

• Halliburton Energy Services Inc
• Halliburton Energy Services Inc

Inventors

• Perkins David L
• Freese Robert Paul
• Jones Christopher Michael
• Gardner Richard Neal

Classifications

• G01N2201/12

  Circuits of general importance; Signal processing · CPC title

• E21B49/08

  Obtaining fluid samples or testing fluids, in boreholes or wells · CPC title

• G01N21/41

  Refractivity; Phase-affecting properties, e.g. optical path length (G01N21/21 takes precedence) · CPC title

• G01N2201/06113

  Coherent sources; lasers · CPC title

• G01B11/0683 Primary

  measurement during deposition or removal of the layer · CPC title