Large-area carbon nanomesh from polymer and method of preparing the same

US2016297681A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016297681-A1
Application numberUS-201615183282-A
CountryUS
Kind codeA1
Filing dateJun 15, 2016
Priority dateFeb 12, 2013
Publication dateOct 13, 2016
Grant date

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

The present disclosure relates to a polymer-based large-area carbon nanomesh and a method for preparing the same. More particularly, the present disclosure provides a method for preparing a carbon nanomesh such as graphene nanomesh, including: preparing a polymer nanofilm by coating a solution of a block copolymer or a polymer mixture thereof on a substrate; stabilizing the polymer nanofilm by annealing such that the polymer nanofilm is phase-separated, a hole-forming polymer is removed and, at the same time, a nanomesh-forming polymer is cyclized and forms a stabilized polymer nanomesh; and carbonizing the stabilized polymer nanomesh by annealing at high temperature to prepare a carbon nanomesh. Using the phase separation and cyclization, a large-area carbon nanomesh with superior activity can be prepared simply with high reproducibility in large scale.

First claim

Opening claim text (preview).

What is claimed is: 1 . A polymer nanomesh consisting essentially of a planar structure, wherein the planar structure of the polymer nanomesh comprises a cyclized nanomesh-forming polymer and two-dimensional holes arranged on the planer structure. 2 . The polymer nanomesh according to claim 1 , wherein the nanomesh-forming polymer is cyclized to form the polymer nanomesh, and two-dimensional holes are formed by removal of a hole-forming polymer. 3 . The polymer nanomesh according to claim 2 , wherein a morphology of the polymer nanomesh depends on a morphology of a phase-separation of the hole-forming polymer and the nanomesh-forming polymer. 4 . A carbon nanomesh consisting essentially of a planar structure, wherein the planar structure of the carbon nanomesh comprises a cyclic structure of carbon atoms and two dimensional holes arranged on the planer structure, and wherein the cyclic structure of carbon atoms comes from a carbonization of a cyclized nanomesh-forming polymer. 5 . The carbon nanomesh according to claim 4 , wherein the two dimensional holes have a hole size of 1 nm˜1 μm. 6 . The carbon nanomesh according to claim 4 , wherein the carbon nanomesh has a geometry of inter-hole distance of 1 nm to 1 μm. 7 . The carbon nanomesh according to claim 4 , wherein the carbon nanomesh has a thickness of 0.4 nm or more. 8 . The carbon nanomesh according to claim 4 , wherein as a size of the holes increase, an inter-hole distance decreases. 9 . The carbon nanomesh according to claim 4 , wherein the carbon nanomesh has a band gap of 1 meV˜1 eV. 10 . The carbon nanomesh according to claim 4 , wherein a band gap of the carbon nanomesh is controlled by geometry of an inter-hole distance of the carbon nanomesh. 11 . The carbon nanomesh according to claim 4 , wherein the carbon nanomesh further comprises a metal film. 12 . The carbon nanomesh according to claim 4 , wherein the carbon nanomesh is a graphene nanomesh. 13 . A method for preparing a graphene nanomesh, comprising: preparing a polymer nanofilm by coating a solution of a block copolymer of a pore-forming polymer and a nanomesh-forming polymer or by coating a solution of a polymer mixture of a pore-forming polymer and a nanomesh-forming polymer, on a substrate, stabilizing the polymer nanofilm such that the pore-forming polymer is removed and the nanomesh-forming polymer is cyclized and forms a stabilized polymer nanomesh with pores; and carbonizing the stabilized polymer nanomesh with pores to prepare a graphene nanomesh. 14 . The method for preparing a graphene nanomesh according to claim 13 , which further comprises, before or after said stabilizing, depositing a metal nanofilm on the polymer nanofilm. 15 . The method for preparing a graphene nanomesh according to claim 13 , which further comprises, in said carbonizing, graphitizing the graphene nanomesh at 1800-3000° C. under an atmosphere of inert gas, hydrogen gas, vacuum or a combination thereof. 16 . The method for preparing a graphene nanomesh according to claim 13 , wherein said carbonizing is performed in the presence of a doping gas and the doping gas comprises a group 3-7 element. 17 . The method for preparing a graphene nanomesh according to claim 13 , wherein, in said carbonizing, volatile carbon molecules are injected and the volatile carbon molecules are acetylene, ethylene or methane.

Assignees

Inventors

Classifications

  • H01B1/04Primary

    mainly consisting of carbon-silicon compounds, carbon or silicon · CPC title

  • Chemistry & Metallurgy · mapped topic

  • Electrically-conducting paints {(conductive materials H01B1/00)} · CPC title

  • Carbon · CPC title

  • by elimination of a solid phase from a macromolecular composition or article, e.g. leaching out · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US2016297681A1 cover?
The present disclosure relates to a polymer-based large-area carbon nanomesh and a method for preparing the same. More particularly, the present disclosure provides a method for preparing a carbon nanomesh such as graphene nanomesh, including: preparing a polymer nanofilm by coating a solution of a block copolymer or a polymer mixture thereof on a substrate; stabilizing the polymer nanofilm by …
Who is the assignee on this patent?
Korea Inst Sci & Tech
What technology area does this patent fall under?
Primary CPC classification H01B1/04. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Oct 13 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).