Holding device, method of determining attraction abnormality in holding device, lithography apparatus, and method of manufacturing article
US-2024393682-A1 · Nov 28, 2024 · US
US2016297136A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016297136-A1 |
| Application number | US-201615086594-A |
| Country | US |
| Kind code | A1 |
| Filing date | Mar 31, 2016 |
| Priority date | Apr 9, 2015 |
| Publication date | Oct 13, 2016 |
| Grant date | — |
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The present invention provides an imprint apparatus which forms a pattern in an imprint material on a substrate using a mold, the apparatus comprising a deformation unit configured to deform at least one of the mold and the substrate, and a control unit configured to control a process of starting contact between the mold and the imprint material in a state in which the at least one is deformed, and then gradually increasing a contact area between the mold and the imprint material by gradually decreasing a deformation amount of the at least one, wherein the control unit controls relative positions of the mold and the substrate based on the deformation amount, so as to maintain a relative positional relationship between the mold and the substrate at a region where the mold and the imprint material are contact with each other.
Opening claim text (preview).
What is claimed is: 1 . An imprint apparatus which forms a pattern in an imprint material on a substrate using a mold, the apparatus comprising: a deformation unit configured to deform at least one of the mold and the substrate into a convex shape protruding toward the other; and a control unit configured to control a process of starting contact between the mold and the imprint material in a state in which the at least one is deformed by the deformation unit, and then gradually increasing a contact area between the mold and the imprint material by gradually decreasing a deformation amount of the at least one by the deformation unit, wherein the control unit controls relative positions of the mold and the substrate based on the deformation amount of the at least, so as to maintain, while increasing the contact area, a relative positional relationship between the mold and the substrate at a region where the mold and the imprint material are contact with each other. 2 . The apparatus according to claim 1 , wherein the control unit controls relative tilts between the mold and the substrate based on the deformation amount of the at least one, so as to start contact between the mold and the imprint material from a portion other than a barycenter of a pattern region formed on the mold. 3 . The apparatus according to claim 2 , wherein the control unit controls the relative tilts between the mold and the substrate based on the deformation amount of the at least one, so as to gradually reduce the relative tilts while increasing the contact area. 4 . The apparatus according to claim 2 , wherein the control unit controls the relative positions based on information indicating a relative shift amount between the mold and the substrate caused by changing the deformation amount of the at least one and the relative tilts between the mold and the substrate. 5 . The apparatus according to claim 1 , wherein the control unit controls the relative positions so as to maintain, while increasing the contact area, a positional relationship between a portion of the substrate and a portion of the mold which are first contacted with each other. 6 . The apparatus according to claim 1 , wherein the deformation unit includes a first deformation unit configured to deform the mold into a convex shape with a central portion protruding toward the substrate, and the control unit controls the relative positions based on a deformation amount of the mold by the first deformation unit. 7 . The apparatus according to claim 6 , wherein the control unit controls the relative tilts between the mold and the substrate based on the deformation amount of the at least one, so as to start contact between the mold and the imprint material from a portion other than a portion where the mold protrudes the most. 8 . The apparatus according to claim 1 , wherein the deformation unit includes a second deformation unit configured to deform the substrate into a convex shape partially protruding toward the mold, and the control unit controls the relative positions based on a deformation amount of the substrate by the second deformation unit. 9 . The apparatus according to claim 1 , wherein the substrate includes a deficient shot region which is arranged in a peripheral portion of the substrate and to which only a part of a pattern of the mold is transferred, and the control unit controls the process so as to bring the mold and the imprint material supplied on the deficient shot region into contact with each other. 10 . The apparatus according to claim 9 , wherein the control unit controls the process so as to start contact between the mold and the imprint material from a barycenter of the deficient shot region. 11 . A method of manufacturing an article, the method comprising: forming a pattern on a substrate using an imprint apparatus; and processing the substrate, on which the pattern has been formed, to manufacture the article, wherein the imprint apparatus which forms a pattern in an imprint material supplied on the substrate, and includes: a deformation unit configured to deform at least one of the mold and the substrate into a convex shape protruding toward the other; and a control unit configured to control a process of starting contact between the mold and the imprint material in a state in which the at least one is deformed by the deformation unit, and then gradually increasing a contact area between the mold and the imprint material by gradually decreasing a deformation amount of the at least one by the deformation unit, wherein the control unit controls relative positions of the mold and the substrate based on the deformation amount of the at least, so as to maintain, while increasing the contact area, a relative positional relationship between the mold and the substrate at a region where the mold and the imprint material are contact with each other.
Apparatus for additive manufacturing; Details thereof or accessories therefor · CPC title
Processes of additive manufacturing · CPC title
Moulding surfaces provided with means for marking or patterning (for injection moulding B29C45/372) · CPC title
for controlling or regulating additive manufacturing processes · CPC title
Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title
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