Optical filter

Patent metadata

Field	Value
Publication number	US-2016291223-A1
Application number	US-201615186574-A
Country	US
Kind code	A1
Filing date	Jun 20, 2016
Priority date	Dec 20, 2013
Publication date	Oct 6, 2016
Grant date	—

Abstract

An optical filter, a process for producing an optical filter, and the use of the optical filter are provided. The optical filter includes a substrate and a filter layer on at least one side of the substrate. The filter layer has a matrix and at least one organic dye dissolved in the matrix. The filter layer has optical homogeneity.

First claim

What is claimed is:

1 . An optical filter comprising:
a substrate; and a filter layer on at least one side of the substrate, the filter layer comprising a matrix and at least one organic dye dissolved in the matrix, wherein the filter layer has optical homogeneity.

2 . The optical filter as claimed in claim 1 , wherein the filter layer has a wavelength deviation at T 50 II of not more than 5%.

3 . The optical filter as claimed in claim 1 , wherein the filter layer has a wavelength deviation at T 50 II of not more than 3%.

4 . The optical filter as claimed in claim 1 , wherein the substrate and filter layer are configured so that the optical filter is an IR-cut filter.

5 . The optical filter as claimed in claim 1 , wherein the substrate comprises a glass having a transmission of at least 90% in a spectral range from 400 nm to 800 nm.

6 . The optical filter as claimed in claim 1 , wherein the filter layer has a thickness of not more than 100 μm.

7 . The optical filter as claimed in claim 1 , wherein the substrate and filter layer are configured so that the optical filter has a thickness of not more than 1 mm.

8 . The optical filter as claimed in claim 1 , wherein the substrate and filter layer are configured so that the optical filter has a haze value of less than 10%.

9 . The optical filter as claimed in claim 1 , wherein the substrate and filter layer are configured so that the optical filter has a haze value of less than 1%.

10 . The optical filter as claimed in claim 1 , wherein the substrate and filter layer are configured so that the optical filter has a mean transmission of not more than 40% in a stop band from 650 nm to 700 nm.

11 . The optical filter as claimed in claim 1 , further comprising at least one further layer, the at least one further layer lowering a transmission in an IR range, the at least one further layer being selected from the group consisting of a multilayer, a further filter layer, and combinations thereof.

12 . The optical filter as claimed in claim 1 , further comprising an antireflection coating of one or more layers.

13 . The optical filter as claimed in claim 12 , wherein the antireflection coating is at a location selected from the group consisting of on the filter layer, on a side of the substrate opposite the filter layer, and on both the filter layer and on the side of the substrate opposite the filter layer.

14 . The optical filter as claimed in claim 1 , further comprising an intermediate layer on the substrate between the substrate and the filter layer, the intermediate layer providing a bond strength between the filter layer and the substrate.

15 . The optical filter as claimed in claim 1 , wherein the substrate is a wafer.

16 . The optical filter as claimed in claim 1 , wherein the optical filter is configured for use in a beam path of an optically sensitive semiconductor detector.

17 . The optical filter as claimed in claim 16 , wherein the optically sensitive semiconductor detector is a CMOS sensor.

18 . The optical filter as claimed in claim 1 , wherein the optical filter is configured for use in a device selected from the group consisting of a digital camera, a video camera, and a spectroscope.

19 . The optical filter as claimed in claim 1 , wherein the optical filter is configured for use in a wafer-level packaged device.

20 . A process for producing the optical filter of claim 1 , comprising the following steps:
dissolving the at least one organic dye in the matrix to produce a varnish; applying the varnish to the substrate; and setting the varnish to form the filter layer using a process selected from the group consisting of drying, thermal curing, UV curing, and combinations thereof.

Assignees

• Schott Ag

Inventors

• Rudigier-Voigt Eveline
• Rebsamen Sven
• Schuhmacher Joerg
• Back Franziska

Classifications

• G02B1/11

  Anti-reflection coatings · CPC title

• G02B5/223 Primary

  containing organic substances, e.g. dyes, inks or pigments · CPC title

• B05D1/005

  Spin coating · CPC title

• G02B5/208 Primary

  for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation · CPC title