Holding apparatus, projection apparatus, measurement apparatus, and holding method

US2016290792A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016290792-A1
Application numberUS-201615083033-A
CountryUS
Kind codeA1
Filing dateMar 28, 2016
Priority dateMar 31, 2015
Publication dateOct 6, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A holding apparatus includes, a supporting member having positioning portions for positioning a pattern light generation unit, configured to support the pattern light generation unit, and a fixing member configured to be in contact with an outer circumference of the pattern light generation unit to hold the pattern light generation unit, the fixing member being fixed to the supporting member. The fixing member includes abutting portions configured to be in contact with parts of the outer circumference of the pattern light generation unit, and elastic members configured to press portions of the pattern light generation unit contacting the abutting portions onto the abutting portions.

First claim

Opening claim text (preview).

What is claimed: 1 . A holding apparatus for holding a pattern light generation unit, the holding apparatus comprising: a supporting member having a positioning portion for positioning the pattern light generation unit and to support the pattern light generation unit; and a fixing member configured to contact a portion of an outer circumference of the pattern light generation unit to hold the pattern light generation unit, the fixing member being fixed to the supporting member, wherein the fixing member comprises: an abutting portion configured to contact a portion of the outer circumference of the pattern light generation unit; and a biasing member configured to bias the pattern light generation unit towards the abutting portion. 2 . The holding apparatus according to claim 1 , wherein the positioning portion includes a removable fitting member configured to be removably inserted into hole portions of the pattern light generation unit. 3 . The holding apparatus according to claim 2 , wherein the fitting members fit into the hole portions for positioning the pattern light generation unit onto the supporting member, and wherein the fitting members are configured to be extracted from the hole portions thereby allowing the pattern light generation unit to be held by the abutting portion and the biasing member. 4 . The holding apparatus according to claim 2 , wherein the fitting member is a pin. 5 . The holding apparatus according to claim 1 , wherein the biasing member provides a biasing force to the outer circumference of the pattern light generation unit at a side which is opposite to the side which the abutting portion contacts the outer circumference of the pattern light generation unit. 6 . The holding apparatus according to claim 1 , wherein the biasing member is a plate spring or a compression spring. 7 . A projection apparatus comprising: a pattern light generation unit; a holding apparatus according to claim 1 , configured to hold the pattern light generation unit; and an optical system configured to project pattern light generated by the pattern light generation unit. 8 . A measurement apparatus comprising: the projection apparatus according to claim 7 ; and an optical system configured to capture an image of a target on which the pattern light is projected. 9 . A holding method for holding a pattern light generation unit, the holding method comprising: positioning and supporting the pattern light generation unit on a supporting member using positioning portions; and fixing a fixing member to the supporting member, the fixing member comprising an abutting portion and a biasing member; and inserting the pattern light generation unit into the fixing member; wherein the biasing member biases the pattern light generation unit towards the abutting portion thereby holding the pattern light generation unit in position. 10 . The holding method according to claim 9 , wherein the positioning portions are removable fitting members removably inserted into hole portions on the pattern light generation unit, wherein, in the positioning and supporting step, the fitting members are fitted into the hole portions of the pattern light generation unit to position the pattern light generation unit onto the supporting member, and wherein in the case that the light pattern generation unit is held in position by the abutting portion and the biasing member the fitting members are extracted from the hole portions.

Assignees

Inventors

Classifications

  • provided with illuminating means · CPC title

  • Electricity · mapped topic

  • with several lines being projected in more than one direction, e.g. grids, patterns · CPC title

  • G01B5/0004Primary

    Supports (G01B5/025 takes precedence) · CPC title

  • Convergence or focusing systems (electronic adjustment of convergence H04N9/3185; convergence or focusing arrangements for cathode ray tubes H04N9/28; means for automatic focusing of projectors not peculiar to the presence of an electronic spatial light modulator G03B21/53) · CPC title

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What does patent US2016290792A1 cover?
A holding apparatus includes, a supporting member having positioning portions for positioning a pattern light generation unit, configured to support the pattern light generation unit, and a fixing member configured to be in contact with an outer circumference of the pattern light generation unit to hold the pattern light generation unit, the fixing member being fixed to the supporting member. T…
Who is the assignee on this patent?
Canon Kk
What technology area does this patent fall under?
Primary CPC classification G01B11/2513. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Oct 06 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).