Light irradiation type heat treatment apparatus and method for manufacturing heat treatment apparatus

Patent metadata

Field	Value
Publication number	US-2016284573-A1
Application number	US-201615070147-A
Country	US
Kind code	A1
Filing date	Mar 15, 2016
Priority date	Mar 25, 2015
Publication date	Sep 29, 2016
Grant date	—

Abstract

A sealing structure is achieved by sandwiching an O ring between an upper chamber window and a chamber side portion and pressing a clamping ring against a top of a peripheral portion of the upper chamber window. Grooving is performed on a lower surface and an upper surface of the peripheral portion of the upper chamber window, to thereby form a plurality of grooves thereon. Flash light traveling into the peripheral portion of the upper chamber window during irradiation with flash light is reflected by the plurality of grooves and is prevented from traveling toward the O ring. This significantly reduces an amount of flash light reaching the O ring, and thus degradation of the O ring due to the irradiation with the flash light can be prevented.

First claim

What is claimed is:

1 . A heat treatment apparatus that irradiates a substrate with flash light to heat the substrate, comprising:
a chamber housing a substrate; a retaining portion retaining the substrate in the chamber; a flash lamp provided outside the chamber and on one side of the chamber; a quartz window covering an opening of the one side of the chamber; an O ring sandwiched between a side wall of the chamber and a contact surface of a peripheral portion of the quartz window; and a window holding-down member pressing a counter surface opposed to the contact surface of the peripheral portion of the quartz window against the side wall of the chamber, wherein a light-exposure blocking portion blocking light that is emitted from the flash lamp and travels into the peripheral portion of the quartz window from reaching the O ring is formed in the peripheral portion of the quartz window.

2 . The heat treatment apparatus according to claim 1 , wherein the light-exposure blocking portion comprises a plurality of grooves formed on a surface of the peripheral portion of the quartz window.

3 . The heat treatment apparatus according to claim 2 , wherein the plurality of grooves are formed in a region of the counter surface and the contact surface of the peripheral portion of the quartz window except for an area contacting the O ring.

4 . The heat treatment apparatus according to claim 2 , wherein the plurality of grooves have mirror surfaces formed thereon.

5 . The heat treatment apparatus according to claim 1 , wherein the light-exposure blocking portion comprises a mirror surface formed on a surface of the peripheral portion of the quartz window.

6 . The heat treatment apparatus according to claim 5 , wherein the mirror surface is formed on the contact surface of the peripheral portion of the quartz window.

7 . The heat treatment apparatus according to claim 6 , wherein the mirror surface is further formed on the counter surface and an end face of the peripheral portion of the quartz window.

8 . The heat treatment apparatus according to claim 1 , wherein the light-exposure blocking portion comprises a rough surface formed on a surface of the peripheral portion of the quartz window.

9 . The heat treatment apparatus according to claim 8 , the rough surface is formed on the counter surface of the peripheral portion of the quartz window.

10 . The heat treatment apparatus according to claim 8 , wherein the rough surface is formed in a region of the contact surface of the peripheral portion of the quartz window except for an area contacting the O ring.

11 . The heat treatment apparatus according to claim 8 , wherein the rough surface is formed in a region of the counter surface and the contact surface of the peripheral portion of the quartz window except for an area contacting the O ring.

12 . The heat treatment apparatus according to claim 1 , wherein the light-exposure blocking portion comprises opaque quartz provided in the peripheral portion of the quartz window.

13 . The heat treatment apparatus according to claim 12 , wherein the opaque quartz is provided in an area, which contacts the O ring, of the contact surface of the peripheral portion of the quartz window.

14 . The heat treatment apparatus according to claim 12 , wherein an area, which contacts the O ring, of the contact surface of the peripheral portion of the quartz window comprises transparent opaque.

15 . A method for manufacturing a heat treatment apparatus that irradiates a substrate with flash light emitted from a flash lamp to heat the substrate, the flash lamp being provided outside a chamber housing the substrate and being provided on one side of the chamber, the method comprising:
covering an opening of the one side of the chamber with a quartz window while an O ring is sandwiched between a side wall of the chamber and a peripheral portion of the quartz window; and performing grooving on a surface of the peripheral portion of the quartz window to form a plurality of grooves thereon.

16 . A method for manufacturing a heat treatment apparatus that irradiates a substrate with flash light emitted from a flash lamp to heat the substrate, the flash lamp being provided outside a chamber housing the substrate and being provided on one side of the chamber, the method comprising:
covering an opening of the one side of the chamber with a quartz window while an O ring is sandwiched between a side wall of the chamber and a peripheral portion of the quartz window; and forming a metal film on a surface of the peripheral portion of the quartz window to form a mirror surface thereon.

17 . A method for manufacturing a heat treatment apparatus that irradiates a substrate with flash light emitted from a flash lamp to heat the substrate, the flash lamp being provided outside a chamber housing the substrate and being provided on one side of the chamber, the method comprising:
covering an opening of the one side of the chamber with a quartz window while an O ring is sandwiched between a side wall of the chamber and a peripheral portion of the quartz window; and performing blasting on a surface of the peripheral portion of the quartz window to form a rough surface thereon.

18 . A method for manufacturing a heat treatment apparatus that irradiates a substrate with flash light emitted from a flash lamp to heat the substrate, the flash lamp being provided outside a chamber housing the substrate and being provided on one side of the chamber, the method comprising:
covering an opening of the one side of the chamber with a quartz window while an O ring is sandwiched between a side wall of the chamber and a peripheral portion of the quartz window; and welding opaque quartz to the peripheral portion of the quartz window.

19 . The method for manufacturing a heat treatment apparatus according to claim 18 , wherein after a groove portion is formed in an area, which contacts the O ring, of a contact surface of the peripheral portion of the quartz window, the opaque quartz is welded such that the groove portion is filled with the opaque quartz.

20 . The method for manufacturing a heat treatment apparatus according to claim 18 , wherein transparent opaque is provided in an area, which contacts the O ring, of a contact surface of the peripheral portion of the quartz window.

Assignees

• Screen Holdings Co Ltd

Inventors

• Nishide Nobuhiko
• Miyake Hiroshi

Classifications

• H10P72/0436 Primary

  mainly by radiation · CPC title

• H05B1/0233

  for semiconductors manufacturing · CPC title

• H01L21/67115 Primary

  Electricity · mapped topic