Display substrate, display panel, and display apparatus
US-2024411399-A1 · Dec 12, 2024 · US
US2016274394A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016274394-A1 |
| Application number | US-201615072645-A |
| Country | US |
| Kind code | A1 |
| Filing date | Mar 17, 2016 |
| Priority date | Mar 19, 2015 |
| Publication date | Sep 22, 2016 |
| Grant date | — |
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Official abstract text for this publication.
A liquid crystal display device with an increased pixel aperture ratio is provided. A liquid crystal display device that displays an image with high contrast and high luminance is provided. The liquid crystal display device includes a first pixel electrode; a second pixel electrode; a transistor; a capacitor; a first insulating film; a second insulating film; and a third insulating film. The transistor includes a gate electrode; a gate insulating film; a first oxide semiconductor film; and a source electrode and a drain electrode. One of a pair of electrodes of the capacitor includes a second oxide semiconductor film. The first insulating film is provided over the first oxide semiconductor film. The second insulating film is provided over the second oxide semiconductor film such that the second oxide semiconductor film is sandwiched between the first insulating film and the second insulating film. The third insulating film overlaps with an end of the first pixel electrode. The second pixel electrode is provided over the third insulating film.
Opening claim text (preview).
What is claimed is: 1 . A semiconductor device comprising: a first pixel electrode electrically connected to a first transistor; a second pixel electrode; the first transistor comprising: a gate electrode; a gate insulating film adjacent to the gate electrode; and a first oxide semiconductor film which is adjacent to the gate insulating film and overlaps with the gate electrode; a first insulating film over the first oxide semiconductor film; a second oxide semiconductor film over the first insulating film; a second insulating film over the second oxide semiconductor film; and a third insulating film between the first pixel electrode and the second pixel electrode, wherein a capacitor is formed between the first pixel electrode and the second oxide semiconductor film, wherein the third insulating film overlaps with an end of the first pixel electrode, and wherein the second pixel electrode is over the third insulating film. 2 . The semiconductor device according to claim 1 , wherein the first insulating film comprises oxygen, and wherein the second insulating film comprises hydrogen. 3 . The semiconductor device according to claim 1 , wherein the first pixel electrode is electrically connected to one of a source electrode and a drain electrode of the first transistor in an opening in the first insulating film and the second insulating film. 4 . The semiconductor device according to claim 1 , wherein resistivity of the second oxide semiconductor film is lower than resistivity of the first oxide semiconductor film. 5 . The semiconductor device according to claim 1 , wherein the second pixel electrode is electrically connected to a second transistor in a pixel adjacent to a pixel including the first transistor. 6 . The semiconductor device according to claim 1 , further comprising: a first coloring film over the first pixel electrode; and a second coloring film over the second pixel electrode. 7 . The semiconductor device according to claim 1 , wherein the semiconductor device is a liquid crystal display device. 8 . A semiconductor device comprising: a first pixel electrode electrically connected to a first transistor; a second pixel electrode; a conductive film which is electrically connected to and overlaps with the first pixel electrode; the first transistor comprising: a gate electrode; a gate insulating film adjacent to the gate electrode; and a first oxide semiconductor film which is adjacent to the gate insulating film and overlaps with the gate electrode; a first insulating film over the first oxide semiconductor film; a second oxide semiconductor film over the first insulating film; a second insulating film over the second oxide semiconductor film; and a third insulating film between the first pixel electrode and the second pixel electrode, wherein a capacitor is formed between the first pixel electrode and the second oxide semiconductor film, wherein the third insulating film overlaps with an end of the first pixel electrode, and wherein the conductive film is over the third insulating film. 9 . The semiconductor device according to claim 8 , wherein the first insulating film comprises oxygen, and wherein the second insulating film comprises hydrogen. 10 . The semiconductor device according to claim 8 , wherein the first pixel electrode is electrically connected to one of a source electrode and a drain electrode of the first transistor in an opening in the first insulating film and the second insulating film. 11 . The semiconductor device according to claim 8 , wherein resistivity of the second oxide semiconductor film is lower than resistivity of the first oxide semiconductor film. 12 . The semiconductor device according to claim 8 , wherein the second pixel electrode is electrically connected to a second transistor in a pixel adjacent to a pixel including the first transistor. 13 . The semiconductor device according to claim 8 , further comprising: a first coloring film over the first pixel electrode; and a second coloring film over the second pixel electrode. 14 . The semiconductor device according to claim 8 , wherein the semiconductor device is a liquid crystal display device. 15 . A semiconductor device comprising: a first pixel electrode electrically connected to a first transistor; a second pixel electrode; the first transistor comprising: a gate electrode; a gate insulating film adjacent to the gate electrode; and a first oxide semiconductor film which is adjacent to the gate insulating film and overlaps with the gate electrode; a first insulating film over the first oxide semiconductor film; a second oxide semiconductor film over the first insulating film; a second insulating film over the second oxide semiconductor film; and a third insulating film between the first pixel electrode and the second pixel electrode, wherein a capacitor is formed between the first pixel electrode and a first part of the second oxide semiconductor film, wherein a second part of the second oxide semiconductor film is a back gate electrode of the first transistor, wherein the third insulating film overlaps with an end of the first pixel electrode, and wherein the second pixel electrode is over the third insulating film. 16 . The semiconductor device according to claim 15 , wherein the first insulating film comprises oxygen, and wherein the second insulating film comprises hydrogen. 17 . The semiconductor device according to claim 15 , wherein the first pixel electrode is electrically connected to one of a source electrode and a drain electrode of the first transistor in an opening in the first insulating film and the second insulating film. 18 . The semiconductor device according to claim 15 , wherein resistivity of the second oxide semiconductor film is lower than resistivity of the first oxide semiconductor film. 19 . The semiconductor device according to claim 15 , wherein the second pixel electrode is electrically connected to a second transistor in a pixel adjacent to a pixel including the first transistor. 20 . The semiconductor device according to claim 15 , further comprising: a first coloring film over the first pixel electrode; and a second coloring film over the second pixel electrode. 21 . The semiconductor device according to claim 15 , wherein the semiconductor device is a liquid crystal display device.
Arrangements for improving the aperture ratio · CPC title
Colour filters · CPC title
Insulating layers (G02F1/1335, G02F1/1337, G02F1/135, G02F1/136 take precedence) · CPC title
Storage capacitors associated with the pixel electrode · CPC title
characterised by their geometrical arrangement · CPC title
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