Substantially solid acidizing composition for treatment of subterranean formations

Patent metadata

Field	Value
Publication number	US-2016272879-A1
Application number	US-201415034711-A
Country	US
Kind code	A1
Filing date	Feb 20, 2014
Priority date	Feb 20, 2014
Publication date	Sep 22, 2016
Grant date	—

Abstract

Various embodiments disclosed relate to compositions for treatment of a subterranean formation, and methods and systems including the same. In various embodiments, the present invention provides a method of treating a subterranean formation that can include obtaining or providing a substantially solid composition. The substantially solid composition can include a hydrogen fluoride precursor salt and an amide hydrochloride salt. The method includes combining the substantially solid composition with a carrier fluid to form a mixture. The method includes placing the mixture in a subterranean formation downhole.

First claim

1 - 58 . (canceled)

59 . A method of treating a subterranean formation; the method comprising:
obtaining or providing a substantially solid composition comprising
a hydrogen fluoride precursor salt; and
an amide hydrochloride salt;
combining the substantially solid composition with a carrier fluid, to form a mixture; and placing the mixture in a subterranean formation downhole.

60 . The method of claim 59 , wherein the subterranean formation comprises at least one of a sandstone formation and a shale formation.

61 . The method of claim 59 , wherein the carrier fluid is about 50 wt % to about 90 wt % of the mixture.

62 . The method of claim 59 , wherein the carrier fluid comprises at least one of an aqueous fluid; an oxygenated organic fluid, and a hydrocarbon oil.

63 . The method of claim 59 , wherein the substantially solid composition is substantially a particulate solid in the mixture when placed in the subterranean formation.

64 . The method of claim 59 , wherein an aqueous component of the mixture has a pH of about 0 to about 5.

65 . The method of claim 59 , wherein the mixture or an aqueous solution that contacts the mixture has an HF concentration of about 0.01% w/v to about 50% w/v.

66 . The method of claim 59 , wherein the mixture has a content of at least one of NaBr, CaCl 2 , CaBr 2 , ZnBr 2 , KCl, and NaCl of about 0.1% w/v to about 20% w/v.

67 . The method of claim 59 , wherein the hydrogen fluoride precursor salt is about 0.1 wt % to about 50 wt % of the substantially solid composition.

68 . The method of claim 59 , wherein the hydrogen fluoride precursor salt comprises at least one of a hydrogen fluoride salt or a bifluoride salt.

69 . The method of claim 59 , wherein the hydrogen fluoride precursor salt is at least one chosen from a fluoride or bifluoride salt of a substituted or unsubstituted (C 1 -C 50 )hydrocarbyl having at least one amine or amide functional group thereon, an inorganic fluoride or bifluoride salt, a tetra((C 1 -C 10 )hydrocarbyl)ammonium fluoride, ammonium fluoride, potassium bifluotide, sodium bifluotide, ammonium bifluoride, an alkali or ammonium tetrafluoroborate salt, an alkali or ammonium hexafluorophosphate salt, and polyvinylpyridinium fluoride, wherein each hydrocarbyl is independently selected.

70 . The method of claim 59 , wherein the amide hydrochloride salt is about 20 wt % to about 99 wt % of the substantially solid composition.

71 . The method of claim 59 , wherein the amide hydrochloride salt is at least one chosen from a hydrochloride salt of a substituted or unsubstituted (C 1 -C 50 )hydrocarbyl having at least One amide functional group thereon, a di(C 1 -C 10 )hydrocarbylformamide hydrochloride, dimethylformamide hydrochloride, acetamide hydrochloride, di(C 1 -C 10 )hydrocarbylacetamide hydrochloride, dimethylacetamide hydrochloride, carbamimidoylurea hydrochloride, imidourea hydrochloride, and urea hydrochloride, wherein each hydrocarbyl is independently selected.

72 . The method of claim wherein the composition further comprises a chelating agent.

73 . The method of claim 72 , wherein the chelating agent is 5 wt % to about 60 wt % of the substantially solid composition.

74 . The method of claim 72 , wherein the chelating agent is at least one chosen from an aminopolycarboxylate, a gluconate, an organophosphonate, and a glucoheptonate.

75 . The method of claim 72 , wherein the chelating agent is at least one chosen from polyaspartic acid, methylglycine diacetic acid (MGDA), glutamic acid N,N-diacetic acid (GLDA), L-aspartic acid N,N-diacetic acid (ASDA), cysteic acid-N,N-diacetic acid, cysteic acid-N-monoacetic acid, alanine-N-monoacetic acid, N-(3-hydroxysuccinyl)aspartic acid, N-[2-(3-hydroxysuccinyl)]-L-serine, diethanol/2-hydroxyethyliminodiacetic acid (DEG/HEIDA), iminodisuccinic acid (IDS), hydroxyethylene iminodisuccinic acid (HIDS), N-bis[2-(1,2-dicarboxyethoxy)ethyl]glycine (BCA6), N-bis[2-(1,2-dicarboxyethoxy)ethyl]aspartic acid (BCA5), N-bis[2-(1,2-dicarboxyethoxy)ethyl]methylglycine (MCBA5), N-tris[(1,2-dicarboxyethoxy)ethyl]amine (TCA6), ethylenediaminedisuccinic acid (EDDS), ethylenediaminetetraacetic acid (EDTA), diethylenetriaminepentaacetic acid (DTPA), hydroxyethylethylenediaminetriacetic acid (HEDTA), 1,3-propylenediaminetetraacetic acid (1,3-PDTA), nitrilotriacetic acid (NTA), gluconic acid, glucoheptonic acid, sodium tripolyphosphate (STPP), trisodium phosphate (TSP), aminotris(methylene phosphonic acid) (ATMP), ethylenediamine tetra(methylene phosphonic acid) (EDTMP), diethylenetriamine penta(triethylene phosphonic acid)) (DTPMP), 1-hydroxy ethylidene-1,1-diphosphonic acid (HEDP), phosphonobutanetricarboxylic acid (PBTC), hexamethylenediamine tetra(methylene phosphonic acid)) (HDTMP), N-(2-acetamido)iminodiacetic acid (ADA), hydroxymethyl-iminodiacetic acid, 2-(2-carboxyethylamino)succinic acid (CEAA), 2-(2-carboxymethylamino)succinic acid (CMAA), diethylenetriamine-N,N″-disuccinic acid, triethylenetetramine-N,N′″-disuccinic acid, 1,6-hexamethylenediamine-N,N′-disuccinic acid, tetraethylenepentamine-N,N″″-disuccinic acid, 2-hydroxypropylene-1,3-diamine-N,N′-disuccinic acid, 1,2-propylenediamine-N,N′-disuccinic acid, 1,3-propylenediamine-N,N′-disuccinic acid, cis-cyclohexanediamine-N,N′-disuccinic acid, trans-cyclohexanediamine-N,N′-disuccinic acid, ethylenebis(oxyethylenenitrilo)-N,N′-disuccinic acid, citric acid, tartaric acid, maleic acid, and a salt of any member of the preceding list.

76 . A system for performing the method of claim 59 , the system comprising
a tubular disposed in a wellbore; and a pump configured to pump the mixture downhole through the tubular and into the subterranean formation.

77 . A method of treating a subterranean formation, the method comprising:
obtaining or providing a substantially solid composition comprising
about 0.001 wt % to about 50 wt % ammonium bifluoride;
about 20 wt % to about 99 wt % urea hydrochloride; and
about 5 wt % to about 60 wt % of a chelating agent that is at least one chosen from polyaspartic acid, methylglycine diacetic acid (MGDA), iminodisuccinic acid (IDS), hydroxyethylene iminodisuccinic acid (HIDS), hydroxyethylethylenediaminetriacetic acid (HEDTA), and glutamic acid diacetic acid (GLDA);
combining the composition with a carrier fluid, to form a mixture; and placing the mixture in a subterranean formation downhole, wherein the combining occurs at least one of before, during, and after placing the mixture in the subterranean formation.

78 . A composition for treatment of a subterranean formation, the composition comprising:
a hydrogen fluoride precursor salt; and an amide hydrochloride salt; wherein the composition is substantially solid.

Assignees

• Halliburton Energy Services Inc

Inventors

• Reddy Baireddy Raghava
• Reyes Enriqe Antonio
• Smith Alyssa Lynn
• Beauterbaugh Aaron M
• Gaugler Drew Henry

Classifications

• C09K8/72

  Eroding chemicals, e.g. acids · CPC title

• C09K8/74 Primary

  combined with additives added for specific purposes · CPC title

• C09K8/52

  Compositions for preventing, limiting or eliminating depositions, e.g. for cleaning · CPC title

• C09K8/725

  Compositions containing polymers · CPC title