Liquid chemical supplying system, substrate processing system, and substrate processing method
US-2016368030-A1 · Dec 22, 2016 · US
US2016271652A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016271652-A1 |
| Application number | US-201414777756-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jun 19, 2014 |
| Priority date | Jul 24, 2013 |
| Publication date | Sep 22, 2016 |
| Grant date | — |
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Official abstract text for this publication.
A cleaning device ( 100 ) according to the present invention is constituted by including in a cleaning nozzle member ( 21 ) provided inside a cleaning tank ( 2 ): a large pipe diameter part ( 211 ) that supplies a cleaning fluid ( 31 ) pressure-fed from a retention tank ( 3 ); a small pipe diameter part ( 212 ) that increases the speed of a flow rate for the cleaning fluid ( 31 ) flowing in the large pipe diameter part; a conical pipe diameter part ( 213 ) that generates a fluid that includes minute bubbles by cavitation; and a guide pipe diameter part ( 214 ) for accommodating an object ( 5 ) to be cleaned. The cleaning fluid ( 31 ) is ejected to the entirety of the object ( 5 ).
Opening claim text (preview).
1 . A cleaning device comprising: a cleaning fluid retention portion which retains a cleaning fluid for cleaning an object; a cleaning tank which is capable of accommodating the cleaning fluid; a cleaning portion which ejects the cleaning fluid in the cleaning tank; and a cleaning fluid discharge portion which is connected to the cleaning fluid retention portion, and discharges the cleaning fluid retained in the cleaning fluid retention portion to the cleaning portion in a pressured state, wherein the cleaning portion includes a first flow passage which is connected to the cleaning fluid discharge portion, and to which the cleaning fluid which is pressure-fed by the cleaning fluid discharge portion is supplied, a second flow passage which is continued to a downstream end of the first flow passage, and of which a flow passage cross-sectional area is smaller than that of the first flow passage, a third flow passage which is continued to a downstream end of the second flow passage, and of which a flow passage cross-sectional area becomes gradually larger as being separated from the second flow passage, and an accommodating space which is continued to a downstream end of the third flow passage, is capable of accommodating the object, and is opened to the outside. 2 . The cleaning device according to claim 1 , wherein a size of the accommodating space is sufficient for accommodating the entirety of the object. 3 . The cleaning device according to claim 1 or 2 , wherein the first flow passage is formed into a right cylinder shape, wherein the second flow passage is formed into a right cylinder shape having an outer diameter which is smaller than an outer diameter of the first flow passage, and wherein the third flow passage is formed into a truncated cone shape having an outer diameter at an upstream end thereof which is equivalent to the outer diameter of the second flow passage, and an outer diameter at a downstream end thereof which is larger than the outer diameter of the second flow passage. 4 . The cleaning device according to claim 1 , wherein the accommodating space is formed into a right cylinder shape having an outer diameter which is the same or substantially the same as the outer diameter of the third flow passage at the downstream end. 5 . The cleaning device according to claim 4 , wherein the cleaning portion is provided with a projecting portion which is projected inwardly in an inner periphery portion which forms the accommodating space. 6 . The cleaning device according to claim 1 , wherein the flow passage cross-sectional area of the second flow passage is determined such that the cleaning fluid which flows the third flow in passage becomes a cleaning fluid containing minute bubbles caused by cavitation. 7 . A cleaning device comprising: a cleaning tank which is capable of accommodating an object; a cleaning fluid retention portion which retains a cleaning fluid for cleaning the object; a cleaning fluid discharge portion which is connected to the cleaning fluid retention portion, and pressure-feeds the cleaning fluid retained in the cleaning fluid retention portion in a pressured state; a gas retention portion which retains a gas fluid in a pressured state, and is capable of pressure-feeding the gas fluid; and a fluid ejecting nozzle which is provided in the cleaning tank, wherein the fluid ejecting nozzle includes a gas feed portion which is connected to the gas retention portion via a gas-passing pipe, and includes a gas feed flow passage to which the gas fluid which is pressure-fed from the gas retention portion is supplied, a cleaning fluid feed portion which is connected to the cleaning fluid discharge portion via a cleaning fluid-passing pipe, and includes a cleaning fluid feed flow passage to which the cleaning fluid which is pressure-fed by the cleaning fluid discharge portion is supplied, a gas-liquid mixture portion which is connected to the gas feed portion and the cleaning fluid feed portion, and includes a gas-liquid mixture flow passage in which the gas fluid which is pressure-fed from the gas feed flow passage and the cleaning fluid which is pressure-fed from the cleaning fluid feed flow passage are mixed with each other, and an ejecting portion which is connected to the gas-liquid mixture portion, includes a mixed fluid-passing flow passage in which the gas-liquid mixture fluid mixed in the gas-liquid mixture flow passage flows, and ejects the gas-liquid mixture fluid from the mixed fluid-passing flow passage. 8 . The cleaning device according to claim 7 , wherein a flow rate of the gas-liquid mixture fluid which is ejected from the ejecting portion is equal to or greater than 20 L/min. 9 . The cleaning device according to claim 7 , wherein the gas fluid is carbon dioxide. 10 . The cleaning device according to claim 7 , wherein the flow passage cross-sectional area of the gas-liquid mixture flow passage is smaller than the flow passage cross-sectional areas of the cleaning fluid feed flow passage and the mixed fluid-passing flow passage. 11 . The cleaning device according to claim 10 , wherein the flow passage cross-sectional area of the gas-liquid mixture flow passage is set such that the gas-liquid mixture fluid flowing into the mixed fluid-passing flow passage becomes a fluid containing minute bubbles caused by cavitation.
with means for agitating the liquid (by agitating the container B08B3/042, B08B3/044, B08B3/045, B08B3/06) · CPC title
the liquid having chemical or dissolving effect · CPC title
with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration · CPC title
Operations & Transport · mapped topic
Cleaning by the force of jets or sprays · CPC title
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