Neural electrode for measuring neural signal and method for manufacturing the same

US2016270680A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016270680-A1
Application numberUS-201615065755-A
CountryUS
Kind codeA1
Filing dateMar 9, 2016
Priority dateMar 19, 2015
Publication dateSep 22, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

Disclosed are a neural electrode for measuring a neural signal and a method for manufacturing the same. In the method, an indium tin oxide (ITO) electrode is formed on a substrate, an insulative passivation layer is formed on the substrate and the ITO electrode to expose a portion of the ITO electrode, and ITO nanorods are formed on the portion of the ITO electrode and the insulative passivation layer. Accordingly, it is possible to reduce electrical noise and improve a neurotrophic property by using the existing process.

First claim

Opening claim text (preview).

What is claimed is: 1 . A method for manufacturing a neural electrode for measuring a neural signal, the method comprising: forming an indium tin oxide (ITO) electrode on a substrate; forming an insulative passivation layer on the substrate and the ITO electrode to expose a portion of the ITO electrode; and forming ITO nanorods on the portion of the ITO electrode and the insulative passivation layer. 2 . The method of claim 1 , further comprising removing some of the ITO nanorods. 3 . The method of claim 2 , wherein, in the removing of the some of the ITO electrodes, ITO nanorods adjacent to an edge of the portion of the ITO electrode among the ITO nanorods are removed. 4 . The method of claim 3 , wherein the ITO nanorods adjacent to the edge of the portion of the ITO electrode are positioned on the insulative passivation layer formed on the ITO electrode. 5 . The method of claim 4 , wherein the ITO nanorods include first nanorods formed on the portion of the ITO electrode and second nanorods on the insulative passivation layer, and wherein, in the removing of the some of the ITO nanorods, ITO nanorods adjacent to the first nanorods among the second nanorods are removed. 6 . The method of claim 3 , wherein the removing of the some of the ITO nanorods includes: coating a photoresist on the ITO nanorods; patterning the photoresist to expose ITO nanorods adjacent to an edge of the portion of the ITO electrode; removing the exposed ITO nanorods; and removing the photoresist. 7 . The method of claim 6 , wherein, in the removing of the exposed ITO nanorods, an ITO echant is used. 8 . The method of claim 2 , further comprising combining poly-D-lysine on the ITO nanorods from which the some of the ITO nanorods are removed. 9 . The method of claim 1 , wherein the forming of the ITO nanorods is performed using sputtering or pulsed laser deposition. 10 . A neural electrode for measuring a neural signal, comprising: a substrate; an ITO electrode formed on the substrate; an insulative passivation layer formed on the substrate and the ITO electrode, the insulative passivation layer exposing a portion of the ITO electrode; and ITO nanorods formed on the portion of the ITO electrode and the insulative passivation layer. 11 . The neural electrode of claim 10 , wherein the ITO nanorods include first nanorods formed on the portion of the ITO electrode and second nanorods on the insulative passivation layer, wherein the first nanorods and the second nanorods are spaced apart from each other by a region in which the ITO nanorods do not exist. 12 . The neural electrode of claim 11 , wherein the region in which the ITO nanorods do not exist is positioned on the insulative passivation layer formed on the ITO electrode. 13 . The neural electrode of claim 12 , further comprising poly-D-lysine combined on the ITO nanorods.

Assignees

Inventors

Classifications

  • characterised by the electrode materials · CPC title

  • A61B5/291Primary

    for electroencephalography [EEG] · CPC title

  • by wave energy or particle radiation (C23C14/32 - C23C14/48 take precedence) · CPC title

  • characterised by the manufacture of electrodes · CPC title

  • Special features of electrodes classified in A61B5/24, A61B5/25, A61B5/283, A61B5/291, A61B5/296, A61B5/053 · CPC title

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What does patent US2016270680A1 cover?
Disclosed are a neural electrode for measuring a neural signal and a method for manufacturing the same. In the method, an indium tin oxide (ITO) electrode is formed on a substrate, an insulative passivation layer is formed on the substrate and the ITO electrode to expose a portion of the ITO electrode, and ITO nanorods are formed on the portion of the ITO electrode and the insulative passivatio…
Who is the assignee on this patent?
Electronics & Telecommunications Res Inst
What technology area does this patent fall under?
Primary CPC classification A61B5/291. Mapped technology areas include Human Necessities.
When was this patent published?
Publication date Thu Sep 22 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).