Article with buffer layer and method of making the same

Patent metadata

Field	Value
Publication number	US-2016264458-A1
Application number	US-201514963799-A
Country	US
Kind code	A1
Filing date	Dec 9, 2015
Priority date	Mar 12, 2015
Publication date	Sep 15, 2016
Grant date	—

Abstract

A method of forming a coating layer on a glass substrate in a glass manufacturing process includes: providing a first coating precursor material for a selected coating layer composition to at least one multislot coater to form a first coating region of the selected coating layer; and providing a second coating precursor material for the selected coating layer composition to the multislot coater to form a second coating region of the selected coating layer over the first region. The first coating precursor material is different than the second precursor coating material.

First claim

What is claimed is:

1 . A method of forming a coating layer on a glass substrate in a glass manufacturing process, comprising:
providing a first coating precursor material for a selected coating layer composition to at least one multislot coater to form a first coating region of the selected coating layer; and providing a second coating precursor material for the selected coating layer composition to the multislot coater to form a second coating region of the selected coating layer over the first region, wherein the first coating precursor material is different than the second precursor coating material.

2 . The method of claim 1 , wherein the glass manufacturing process is a float glass process and the multislot coater is located in a float bath.

3 . The method of claim 1 , wherein the glass manufacturing process is a glass drawdown process and the multislot coater is located adjacent a glass ribbon flow path.

4 . The method of claim 1 , wherein the glass manufacturing process is a glass drawdown process having a glass ribbon flow path comprising a first side and a second side, wherein at least one multislot coater is located adjacent the second side of the glass ribbon flow path, and wherein at least one other multislot coater is located adjacent the first side of the glass ribbon flow path.

5 . The method of claim 1 , wherein the multislot coater is a vapor deposition coater having a discharge face, and the method comprises:
providing the first coating precursor material to a first inlet plenum of the vapor deposition coater, wherein the first inlet plenum is in flow communication with a first discharge channel, and wherein the first discharge channel defines a first discharge path; and providing the second coating precursor material to a second inlet plenum of the vapor deposition coater, wherein the second inlet plenum is in flow communication with a second discharge channel, and wherein the second discharge channel defines a second discharge path, and wherein the first discharge path intersects the second discharge path at a position selected from (a) above a surface level of a glass ribbon or (b) at a surface level of a glass ribbon or (c) below a surface level of a glass ribbon.

6 . A method of making a coated glass article in a glass drawdown process, comprising:
positioning at least one first coater adjacent a first side of a glass ribbon flow path; positioning at least one second coater adjacent a second side of the glass ribbon flow path; depositing a first coating on a first side of a glass ribbon with the first coater; and depositing a second coating on a second side of a glass ribbon with the second coater.

7 . The method of claim 6 , wherein the at least one first coater comprises a chemical vapor deposition coater.

8 . The method of claim 6 , wherein the at least one second coater comprises a chemical vapor deposition coater.

9 . The method of claim 6 , wherein at least one of the first coater and second coater comprises a flame spray coater.

10 . The method of claim 6 , wherein the at least one second coater comprises a flame spray device located above a chemical vapor deposition coater.

11 . The method of claim 6 , wherein at least one of the first coater and the second coater comprises a multislot coater.

12 . The method of claim 6 , wherein the second coating comprises at least one of (1) a buffer layer comprising tin oxide and at least one material selected from the group consisting of zinc, indium, gallium, and magnesium, and (2) a transparent conductive oxide layer comprising tin oxide doped with a material selected from the group consisting of tungsten, molybdenum, and niobium.

13 . The method of claim 12 , wherein the buffer layer comprises tin oxide and zinc.

14 . The method of claim 12 , wherein the buffer layer comprises tin oxide and magnesium.

15 . The method of claim 12 , wherein the transparent conductive oxide layer comprises tin oxide doped with tungsten.

16 . A vapor deposition coater, comprising:
a plenum assembly comprising at least one inlet plenum and at least one exhaust plenum; and a nozzle block comprising a discharge face, at least one discharge channel in flow communication with the inlet plenum, and an exhaust conduit in flow communication with the exhaust plenum, wherein the at least one discharge channel is angled with respect to the discharge face of the nozzle block.

17 . The vapor deposition coater of claim 16 , including a first inlet plenum in flow communication with a first discharge channel, a second inlet plenum in flow communication with a second discharge channel, and a third inlet plenum in flow communication with a third discharge channel, wherein at least one of the discharge channels is angled with respect to the discharge face and at least one of the discharge channels is perpendicular to the discharge face.

18 . The vapor deposition coater of claim 16 , including a first exhaust plenum in flow communication with a first exhaust conduit and a second exhaust plenum in flow communication with a second exhaust conduit, wherein the first exhaust conduit and the second exhaust conduit are angled with respect to the discharge face.

19 . The vapor deposition coater of claim 17 , wherein the first discharge channel has a first discharge outlet, the second discharge channel has a second discharge outlet, and the third discharge channel has a third discharge outlet, wherein the first discharge outlet, the second discharge outlet, and the third discharge outlet are located on the discharge face.

20 . The vapor deposition coater of claim 17 , wherein the first discharge channel has a first discharge outlet, the second discharge channel has a second discharge outlet, and the third discharge channel has a third discharge outlet, wherein the second discharge outlet is located on the discharge face, and wherein the first discharge outlet and the third discharge outlet are in flow communication with the second discharge conduit at a distance from the discharge face.

Assignees

• Ppg Ind Ohio Inc

Inventors

• Mccamy James W
• Ma Zhixun
• Kabagambe Benjamin
• Koram Kwaku K
• Hung Cheng-Hung
• Neiis Gary J

Classifications

• C03C2217/94

  Transparent conductive oxide layers [TCO] being part of a multilayer coating · CPC title

• C23C16/40

  Oxides · CPC title

• C23C16/45595

  Atmospheric CVD gas inlets with no enclosed reaction chamber · CPC title

• C03C17/3678

  specially adapted for use in solar cells · CPC title

• C03C2217/948

  Layers comprising indium tin oxide [ITO] · CPC title