Micromachined monolithic 3-axis gyroscope with single drive

US2016264404A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016264404-A1
Application numberUS-201615005783-A
CountryUS
Kind codeA1
Filing dateJan 25, 2016
Priority dateSep 18, 2010
Publication dateSep 15, 2016
Grant date

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  2. Abstract

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  5. First independent claim

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Abstract

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This document discusses, among other things, a cap wafer and a via wafer configured to encapsulate a single proof-mass 3-axis gyroscope formed in an x-y plane of a device layer. The single proof-mass 3-axis gyroscope can include a main proof-mass section suspended about a single, central anchor, the main proof-mass section including a radial portion extending outward towards an edge of the 3-axis gyroscope sensor, a central suspension system configured to suspend the 3-axis gyroscope from the single, central anchor, and a drive electrode including a moving portion and a stationary portion, the moving portion coupled to the radial portion, wherein the drive electrode and the central suspension system are configured to oscillate the 3-axis gyroscope about a z-axis normal to the x-y plane at a drive frequency.

First claim

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1 - 20 . (canceled) 21 . An inertial measurement system, comprising: a device layer including: a 3-axis gyroscope including a single proof mass formed in an x-y plane of a device layer; and a 3-axis accelerometer including a single proof mass formed in the x-y plane of the device layer adjacent the 3-axis gyroscope, wherein the 3-axis gyroscope includes a central suspension configured to suspend the single proof-mass of the 3-axis gyroscope about a single, central gyroscope anchor, and wherein the 3-axis accelerometer including separate x, y, and z-axis flexure bearings configured to suspend a single proof-mass of the 3-axis accelerometer about a single, central accelerometer anchor. 22 . The system of claim 21 , including: a cap wafer bonded to a first surface of the device layer; and a via wafer bonded to a second surface of the device layer, wherein the cap wafer and the via wafer are configured to encapsulate the 3-axis accelerometer and the 3-axis gyroscope in the same cavity. 23 . The system of claim 21 , including a via wafer bonded to a perimeter of a surface of the device layer, and wherein the single proof masses of the 3-axis gyroscope and the 3-axis accelerometer are anchored to the via wafer using the single, central gyroscope anchor and the single, central accelerometer anchor. 24 . The system of claim 21 , wherein the 3-axis gyroscope includes: a drive electrode including a moving portion and a stationary portion, the moving portion coupled to the single proof mass of the 3-axis gyroscope, wherein the drive electrode and the central suspension are configured to oscillate the 3-axis gyroscope about a z-axis normal to the x-y plane at a drive frequency. 25 . The system of claim 21 , wherein the x and y-axis flexure bearings are symmetrical about the single, central accelerometer anchor and the z-axis flexure is not symmetrical about the single, central accelerometer anchor. 26 . The system of claim 21 , wherein the single proof mass of the 3-axis gyroscope includes symmetrical x-axis proof-mass sections configured to move anti-phase along an x-axis of the x-y plane in response to a z-axis angular motion. 27 . The system of claim 26 , wherein the single proof mass of the 3-axis gyroscope includes a z-axis gyroscope coupling flexure bearing configured to couple the x-axis proof mass sections and to resist in-phase motion between the x-axis proof mass sections. 28 . The system of claim 21 , including: a via wafer bonded to a surface of the device layer, the via wafer including: x-axis and y-axis gyroscope sense electrodes out-of-plane with the device layer configured to detect x-axis and y-axis angular rotation of the single proof mass of the 3-axis gyroscope; and z-axis accelerometer sense electrodes out-of-plane with the device layer configured to detect z-axis acceleration of the single proof mass of the 3-axis accelerometer; and wherein the device layer includes: x-axis and y-axis accelerometer sense electrodes in-plane with the device layer configured to detect x-axis and y-axis acceleration of the single proof mass of the 3-axis accelerometer; and z-axis gyroscope sense electrodes in-plane with the device layer configured to detect z-axis angular rotation of the single proof mass of the 3-axis gyroscope. 29 . An inertial measurement system, comprising: a device layer including: a 3-axis gyroscope including a single proof mass formed in an x-y plane of a device layer; and a 3-axis accelerometer including a single proof mass formed in the x-y plane of the device layer adjacent the 3-axis gyroscope; a cap wafer bonded to a first surface of the device layer; and a via wafer bonded to a second surface of the device layer, wherein the 3-axis gyroscope includes a central suspension configured to suspend the single proof-mass of the 3-axis gyroscope about a single, central gyroscope anchor, wherein the 3-axis accelerometer including separate x, y, and z-axis flexure bearings configured to suspend a single proof-mass of the 3-axis accelerometer about a single, central accelerometer anchor, and wherein the cap wafer and the via wafer are configured to encapsulate the 3-axis accelerometer and the 3-axis gyroscope in the same cavity. 30 . The system of claim 29 , wherein the via wafer is bonded to a perimeter of the second surface of the device layer, and wherein the single proof masses of the 3-axis gyroscope and the 3-axis accelerometer are anchored to the via wafer using the single, central gyroscope anchor and the single, central accelerometer anchor. 31 . The system of claim 29 , wherein the single proof mass of the 3-axis gyroscope includes symmetrical x-axis proof-mass sections configured to move anti-phase along an x-axis of the x-y plane in response to a z-axis angular motion. 32 . The system of claim 31 , wherein the single proof mass of the 3-axis gyroscope includes a z-axis gyroscope coupling flexure bearing configured to couple the x-axis proof mass sections and to resist in-phase motion between the x-axis proof mass sections. 33 . The system of claim 29 , including: a via wafer bonded to a surface of the device layer, the via wafer including: x-axis and y-axis gyroscope sense electrodes out-of-plane with the device layer configured to detect x-axis and y-axis angular rotation of the single proof mass of the 3-axis gyroscope; and z-axis accelerometer sense electrodes out-of-plane with the device layer configured to detect z-axis acceleration of the single proof mass of the 3-axis accelerometer; and wherein the device layer includes: x-axis and y-axis accelerometer sense electrodes in-plane with the device layer configured to detect x-axis and y-axis acceleration of the single proof mass of the 3-axis accelerometer; and z-axis gyroscope sense electrodes in-plane with the device layer configured to detect z-axis angular rotation of the single proof mass of the 3-axis gyroscope. 34 . The system of claim 29 , wherein the 3-axis gyroscope includes: a drive electrode including a moving portion and a stationary portion, the moving portion coupled to the single proof mass of the 3-axis gyroscope, wherein the drive electrode and the central suspension are configured to oscillate the 3-axis gyroscope about a z-axis normal to the x-y plane at a drive frequency. 35 . The system of claim 29 , wherein the x and y-axis flexure bearings are symmetrical about the single, central accelerometer anchor and the z-axis flexure is not symmetrical about the single, central accelerometer anchor. 36 . The system of claim 29 , wherein the single proof mass of the 3-axis gyroscope includes symmetrical x-axis proof-mass sections configured to move anti-phase along an x-axis of the x-y plane in response to a z-axis angular motion. 37 . An inertial measurement system, comprising: a device layer including: a 3-axis gyroscope including a single proof mass formed in an x-y plane of a device layer; and a 3-axis accelerometer including a single proof mass formed in the x-y plane of the device layer adjacent the 3-axis gyroscope; a cap wafer bonded to a first surface of the device layer; and a via wafer bonded to a second surface of the device layer, wherein the cap wafer and the via wafer are configured to encapsulate the 3-axis accelerometer and the 3-axis gyroscope in the same cavity. 38 . The system of claim 37 , wherein the 3-axis gyroscope includes a central suspension configured to suspend the single proof-mass of the 3-axis gyroscope about a single, central gyroscop

Assignees

Inventors

Classifications

  • H10D48/50Primary

    Devices controlled by mechanical forces, e.g. pressure · CPC title

  • Gyroscopes · CPC title

  • the devices having a single sensing mass · CPC title

  • Translation according to an axis perpendicular to the substrate · CPC title

  • Translation in a plane parallel to the substrate, i.e. enabling movement along any direction in the plane · CPC title

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What does patent US2016264404A1 cover?
This document discusses, among other things, a cap wafer and a via wafer configured to encapsulate a single proof-mass 3-axis gyroscope formed in an x-y plane of a device layer. The single proof-mass 3-axis gyroscope can include a main proof-mass section suspended about a single, central anchor, the main proof-mass section including a radial portion extending outward towards an edge of the 3-ax…
Who is the assignee on this patent?
Fairchild Semiconductor
What technology area does this patent fall under?
Primary CPC classification H10D48/50. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Sep 15 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).