Barrier anodization methods to develop aluminum oxide layer for plasma equipment components

Patent metadata

Field	Value
Publication number	US-2016258064-A1
Application number	US-201514705659-A
Country	US
Kind code	A1
Filing date	May 6, 2015
Priority date	Mar 6, 2015
Publication date	Sep 8, 2016
Grant date	—

Abstract

The disclosure relates to a chamber component or a method for fabricating a chamber component for use in a plasma processing chamber apparatus. In one embodiment, a chamber component, for use in a plasma processing apparatus, includes an aluminum body having an anodized coating disposed on the aluminum body formed from a neutral electrolyte solution, wherein the anodized coating has a film density higher than 3.1 g/cm −2 .

First claim

What is claimed is:

1 . A chamber component, for use in a plasma processing apparatus, comprising:
an aluminum body having an anodized coating disposed on the aluminum body formed from a neutral electrolyte solution, wherein the anodized coating has a film density higher than 3.1 g/cm −2 .

2 . The chamber component of claim 1 , wherein the anodized coating is formed under the electrolyte solution with a pH value between 5 and 9.

3 . The chamber component of claim 1 , wherein the anodized coating has a thickness less than 1 μm.

4 . The chamber component of claim 1 , wherein the electrolyte solution includes at least one ammonium salt or neutral electrolyte.

5 . The chamber component of claim 4 , the ammonium salt is selected from a group consisting of ammonium borate ((NH 4 ) 3 BO 3 ), ammonium adipate ((NH 4 ) 2 C 4 H 8 (COO) 2 ), ammonium oxalate ((NH 4 ) 2 C 2 O 4 )), ammonium succinate ((NH 4 ) 2 C 2 H 4 (COO) 2 ), ammonium tartrate ((NH 4 ) 2 C 2 H 2 (OH) 2 (COO) 2 ), and combinations thereof.

6 . The chamber component of claim 1 , wherein the anodized coating has aluminum oxide layer.

7 . The chamber component of claim 1 , wherein the anodized coating has an average pore size less than 50 nm.

8 . The chamber component of claim 1 , wherein the anodized coating has corrosion resistance greater than 50 K-ohm.

9 . An apparatus for use in a plasma processing chamber having a substrate pedestal adapted to support a substrate, comprising:
a chamber component having an aluminum body with an anodized coating disposed on the aluminum body formed from a neutral electrolyte solution, wherein the anodized coating has a surface roughness less than 16 Ra.

10 . The apparatus of claim 9 , wherein anodized coating of the chamber component has corrosion resistance greater than 50 K-ohm.

11 . The apparatus of claim 9 , wherein anodized coating of the chamber component has a thickness less than 1 μm.

12 . A method for fabricating a chamber component for use in a plasma processing environment, comprising:
immersing a body of the chamber component from aluminum into an electrolyte solution including at least one ammonium salt; controlling a pH level of the electrolyte solution around neutral; applying a voltage to the electrolyte solution; and forming an anodizing coating on the body.

13 . The method of claim 12 , wherein the pH value of the electrolyte solution is between about 5 and about 9.

14 . The method of claim 12 , wherein the ammonium salt in the electrolyte solution has a concentration between about 0.5 M and about 2 M.

15 . The method of claim 12 , the ammonium salt is selected from a group consisting of ammonium borate ((NH 4 ) 3 BO 3 ), ammonium adipate ((NH 4 ) 2 C 4 H 8 (COO) 2 ), ammonium oxalate ((NH 4 ) 2 C 2 O 4 )), ammonium succinate ((NH 4 ) 2 C 2 H 4 (COO) 2 ), ammonium tartrate ((NH 4 ) 2 C 2 H 2 (OH) 2 (COO) 2 ), and combinations thereof.

16 . The method of claim 12 , wherein applying the voltage further comprises:
applying a voltage of between 5 Volts and about 200 Voltages to the electrolyte solution.

17 . The method of claim 12 , further comprising:
maintaining a solution temperature of less than 85 degrees Celsius.

18 . The method of claim 12 , wherein the anodizing coating has a surface finish of 16 Ra or smoother.

19 . The method of claim 12 , wherein the anodizing coating has an average pore size less than 50 nm.

20 . The method of claim 12 , wherein the anodizing coating has a thickness less than 1 μm.

Assignees

• Applied Materials Inc

Inventors

• Pareek Yogita
• Kadam Ankur
• Kalita Laksheswar
• Thakur Bipin
• Lubomirsky Dmitry

Classifications

• C23C16/4404

  Coatings or surface treatment on the inside of the reaction chamber or on parts thereof · CPC title

• C23C16/50 Primary

  using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)} · CPC title

• C23C16/4581

  characterised by material of construction or surface finish of the means for supporting the substrate · CPC title

• C25D11/06

  characterised by the electrolytes used · CPC title

• C25D11/10

  containing organic acids · CPC title