Xylylenediamine composition and method for producing polyamide resin

US2016257784A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016257784-A1
Application numberUS-201415032029-A
CountryUS
Kind codeA1
Filing dateOct 29, 2014
Priority dateOct 31, 2013
Publication dateSep 8, 2016
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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Provided are [1] a xylylenediamine composition containing xylylenediamine and 1,2-ditolylethane wherein the content of 1,2-ditolylethane is 0.001 to 0.02 parts by mass based on 100 parts by mass of the xylylenediamine; and [2] a method for producing a polyamide resin including the steps of introducing a diamine containing xylylenediamine, a dicarboxylic acid, and 1,2-ditolylethane into a reaction system and performing polycondensation reaction, wherein the amount of the 1,2-ditolylethane to be introduced is 0.001 to 0.02 parts by mass based on 100 parts by mass of the xylylenediamine.

First claim

Opening claim text (preview).

1 . A xylylenediamine composition comprising xylylenediamine and 1,2-ditolylethane, wherein the content of the 1,2-ditolylethane is 0.001 to 0.02 parts by mass based on 100 parts by mass of the xylylenediamine 2 . The xylylenediamine composition according to claim 1 , wherein the xylylenediamine is m-xylylenediamine, p-xylylenediamine, or a mixture thereof. 3 . The xylylenediamine composition according to claim 1 , wherein the xylylenediamine is m-xylylenediamine. 4 . The xylylenediamine composition according to claim 1 , wherein the content of xylylenediamine is 99.5% by mass or more. 5 . The xylylenediamine composition according to claim 1 , which is used for a raw material for polyamide resin. 6 . The xylylenediamine composition according to claim 1 , which is used for an epoxy resin curing agent. 7 . A method for producing a polyamide resin comprising the steps of introducing a diamine comprising xylylenediamine, a dicarboxylic acid, and 0.001 to 0.02 parts by mass, based on 100 parts by mass of the xylylenediamine, of 1,2-ditolylethane into a reaction system and performing a polycondensation reaction. 8 . The method for producing a polyamide resin according to claim 7 , wherein the dicarboxylic acid is at least one selected from an aliphatic dicarboxylic acid having 4 to 20 carbon atoms, terephthalic acid, and isophthalic acid. 9 . The method for producing a polyamide resin according to claim 7 , wherein the content of xylylenediamine in the diamine is 70 mol % or more, and the content of the aliphatic dicarboxylic acid having 4 to 20 carbon atoms in the dicarboxylic acid is 50 mol % or more. 10 . The method for producing a polyamide resin according to claim 8 , wherein the aliphatic dicarboxylic acid having 4 to 20 carbon atoms is at least one selected from adipic acid and sebacic acid. 11 . The method for producing a polyamide resin according to claim 7 , wherein the xylylenediamine is m-xylylenediamine, p-xylylenediamine, or a mixture thereof. 12 . The method for producing a polyamide resin according to claim 7 , wherein the xylylenediamine is m-xylylenediamine. 13 . The method for producing a polyamide resin according to claim 7 , further comprising the step of performing solid-phase polymerization.

Assignees

Inventors

Classifications

  • C08G69/28Primary

    Preparatory processes · CPC title

  • aromatic · CPC title

  • C08G69/06Primary

    Solid state polycondensation · CPC title

  • Hydrocarbons {(C08K5/0091 takes precedence)} · CPC title

  • Nucleating agents promoting the crystallisation of the polymer matrix · CPC title

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What does patent US2016257784A1 cover?
Provided are [1] a xylylenediamine composition containing xylylenediamine and 1,2-ditolylethane wherein the content of 1,2-ditolylethane is 0.001 to 0.02 parts by mass based on 100 parts by mass of the xylylenediamine; and [2] a method for producing a polyamide resin including the steps of introducing a diamine containing xylylenediamine, a dicarboxylic acid, and 1,2-ditolylethane into a reacti…
Who is the assignee on this patent?
Mitsubishi Gas Chemical Co
What technology area does this patent fall under?
Primary CPC classification C08G69/28. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Sep 08 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).