Security element for a security document and process for the production thereof

Patent metadata

Field	Value
Publication number	US-2016257159-A1
Application number	US-201615158037-A
Country	US
Kind code	A1
Filing date	May 18, 2016
Priority date	Feb 7, 2007
Publication date	Sep 8, 2016
Grant date	—

Abstract

The invention concerns a security element for a security document comprising a structure layer and diffractive first and second relief structures, wherein the relief structures viewed parallel to the plane of the structure layer are arranged in different planes of the security element, wherein the first relief structure adjoins a partial first reflection layer and the second relief structure adjoins a partial second reflection layer, and wherein—if the first reflection layer is towards a viewer—a second item of information generated by the second relief structure is at least partially concealed and—if the second reflection layer is towards the viewer—a first item of information generated by the first relief structure is at least partially concealed, and processes for the production of such security elements and security documents formed therewith.

First claim

1 - 22 . (canceled)

23 . A process for the production of a security element, the process comprising the following steps:
a) providing a transparent first replication layer; b) forming a diffraction master relief structure on a first surface of the first replication layer; c) forming a region-wise first reflection layer and at least one region-wise first opaque auxiliary layer, on the first surface; d) forming a structure layer which is transparent in at least region-wise fashion by a second replication layer which is arranged on the first reflection layer and the at least one first opaque auxiliary layer and regions which are free therefrom of the first surface; e) forming a diffractive second relief structure on a second side of the structure layer; and f) forming a region-wise second reflection layer on the second side of the structure layer in a layer thickness, with which the second relief structure is shaped on the side, remote from the structure layer, of the second reflection layer.

24 . A process according to claim 23 , wherein the first reflection layer and/or the second reflection layer is/are opaque.

25 . A process according to claim 23 , wherein the first and/or the second reflection layer is transparent and viewed perpendicularly to the plane of the structure layer at least one opaque auxiliary layer is arranged in congruent relationship with the transparent reflection layer or layers.

26 . A process for the production of a security element, the process comprising the following steps:
g) providing a transparent structure layer; h) forming a diffractive first relief structure on a first side and a diffractive second relief structure on a second side of the structure layer; i) forming an at least region-wise first reflection layer and at least one first opaque auxiliary layer on the first side of the structure layer; and k) forming an at least region-wise second reflection layer and at least one second opaque auxiliary layer on the second side of the structure layer.

27 . A process according to claim 23 , wherein the at least one opaque auxiliary layer is formed by the structure layer being exposed region-wise and by a transparent colouring agent contained in the structure layer being converted into an opaque coloured colouring agent in the exposed regions.

28 . A process according to claim 26 , wherein the first and second relief structures are formed simultaneously by stamping.

29 . A process according to claim 23 , wherein the relief structures are formed by thermal replication or UV replication.

30 . A process according to claim 23 , wherein, in step c) the first reflection layer is applied over the full surface area, a first photoresist layer is applied over the full surface area involved to the first reflection layer the first photoresist layer is partially exposed and removed, the first reflection layer is removed by etching in the regions in which the first photoresist layer was removed and the remaining regions of the first photoresist layer are removed or are used as a first opaque auxiliary layer.

31 . A process according to claim 30 , wherein exposure of the first photoresist layer is effected through the first reflection layer, wherein partial exposure of the first photoresist layer is effected in dependence on the configuration and/or arrangement of the first relief structure.

32 . A process according to claim 23 , wherein, in step f), the second reflection layer is applied over the full surface area involved, a second photoresist layer is applied over the full surface area to the second reflection layer, the second photoresist layer is partially exposed and removed, the second reflection layer is removed by etching in the regions in which the second photoresist layer was removed, and the remaining regions of the second photoresist layer are removed.

33 . A process according to claim 32 , wherein exposure of the second photoresist layer is effected through the first and second reflection layers, wherein partial exposure of the second photoresist layer is effected in dependence on the configuration and/or arrangement of the first relief structure and/or the second relief structure.

34 . A security element formed by a process according to claim 23 .

35 . A security element formed by a process according to claim 26 .

Assignees

• Leonhard Kurz Stiftung & Co Kg

Inventors

• Attner Juri
• Staub Rene
• Weber Klaus

Classifications

• B42D25/324

  Reliefs · CPC title

• B42D25/364

  Liquid crystals · CPC title

• B42D25/328

  Diffraction gratings; Holograms · CPC title

• B42D25/351

  Translucent or partly translucent parts, e.g. windows · CPC title

• B42D25/382

  absorbing or reflecting infrared light · CPC title