Copolymer formulation for directed self-assembly, methods of manufacture thereof and articles comprising the same

Patent metadata

Field	Value
Publication number	US-2016254141-A1
Application number	US-201615052922-A
Country	US
Kind code	A1
Filing date	Feb 25, 2016
Priority date	Feb 26, 2015
Publication date	Sep 1, 2016
Grant date	—

Abstract

Disclosed herein is a pattern forming method comprising providing a substrate devoid of a layer of a brush polymer; disposing upon the substrate a composition comprising a block copolymer comprising a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other; and an additive polymer where the additive polymer comprises a bottlebrush polymer; where the bottlebrush polymer comprises a polymeric chain backbone and a grafted polymer that are bonded to each other; and where the bottlebrush polymer comprises a polymer that is chemically and structurally the same as one of the polymers in the block copolymer or where the bottlebrush polymer comprises a polymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent; and annealing the composition to facilitate domain separation between the first polymer and the second polymer.

First claim

What is claimed is:

1 . A pattern forming method comprising:
providing a substrate; disposing upon the substrate a composition comprising: a block copolymer comprising a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other; and an additive polymer where the additive polymer comprises a bottlebrush polymer; where the bottlebrush polymer comprises a polymeric chain backbone and a grafted polymer that are bonded to each other; and where the bottlebrush polymer comprises a polymer that is chemically and structurally the same as one of the polymers in the block copolymer or where the bottlebrush polymer comprises a polymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent; and annealing the composition to facilitate domain separation between the first polymer and the second polymer of the block copolymer to form a morphology of periodic domains formed from the first polymer and the second polymer; where a longitudinal axis of the periodic domains are perpendicular to the substrate.

2 . The method of claim 1 , further comprising removing at least one domain of the block copolymer.

3 . The method of claim 1 , where the bottlebrush polymer comprises a third polymer; where the third polymer is chemically identical with or substantially chemically similar to either the first polymer or the second polymer of the block copolymer; or where the bottlebrush polymer is a copolymer that comprises a third polymer and a fourth polymer; where the third polymer and the fourth polymer of the bottlebrush copolymer are different from each other; where the first polymer of the block copolymer is chemically identical with or substantially chemically similar to the third polymer of the bottlebrush copolymer or where the second polymer of the block copolymer is chemically identical with or substantially chemically similar to the fourth polymer of the bottlebrush copolymer.

4 . The method of claim 1 , where the first polymer is a vinyl aromatic polymer obtained by a polymerization of units having a structure of formula (1):

wherein R 5 is hydrogen, an alkyl, a haloalkyl or halogen; Z 1 is hydrogen, halogen, a hydroxyl, a haloalkyl or an alkyl; and p is from 1 to about 5.

5 . The method of claim 1 , where the second polymer is obtained from a polymerization of units having a structure represented by formula (2):

where R 1 is a hydrogen or an alkyl group having 1 to 10 carbon atoms. Examples of the first repeat monomer are acrylates and alkyl acrylates such as α-alkyl acrylates, methacrylates, ethacrylates, propyl acrylates, butyl acrylate, or the like, or a combination comprising at least one of the foregoing acrylates; or where the second polymer has a structure derived from a monomer having a structure represented by the formula (3):

where R 1 is a hydrogen or an alkyl group having 1 to 10 carbon atoms and R 2 is a C 1-10 alkyl, a C 3-10 cycloalkyl, or a C 7-10 aralkyl group.

6 . The method of claim 1 , where the bottlebrush copolymer is poly(norbornene-g-polymethylmethacrylate) or a poly(norbornene-g-polystyrene) or a poly(norbornene-g-polymethylmethacrylate-g-polystyrene).

7 . The method of claim 1 , where the block copolymer comprises polystyrene and polymethylmethacrylate and where the polystyrene is present in an amount of 20 to 35 mole percent based on a total number of moles of the block copolymer.

8 . The method of claim 1 , where the block copolymer is present in an amount of 80 to 99 wt %, based on a total weight of the block copolymer and the additive polymer and where the additive polymer is present in an amount of 1 to 20 wt %, based on a total weight of the block copolymer and the additive polymer.

Assignees

• Dow Global Technologies Llc
• Rohm & Haas Elect Mat
• Univ California

Inventors

• Hustad Phillip D
• Trefonas Iii Peter
• Ginzburg Valeriy V
• Kim Bongkeun
• Fredrickson Glenn H

Classifications

• H10P76/2041

  Photolithographic processes · CPC title

• H10P76/20

  of masks comprising organic materials · CPC title

• H10P50/242

  of Group IV materials · CPC title

• H10P14/68

  Organic materials, e.g. photoresists · CPC title

• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title