Multi-source gis for particle-optical apparatus

Patent metadata

Field	Value
Publication number	US-2016244871-A1
Application number	US-201615052716-A
Country	US
Kind code	A1
Filing date	Feb 24, 2016
Priority date	Feb 25, 2015
Publication date	Aug 25, 2016
Grant date	—

Abstract

A Gas Injection System (GIS) applies at least two fluids in the vacuum chamber of a particle-optical apparatus, the gas injection system having two or more channels. Each channel is connected to an associated reservoir holding a fluid at a first side and having an associated exit opening at the other side, the exit sides individually exiting to the outside of the GIS via a nozzle with a nozzle opening. At least two exit openings separated by less than the diameter of the channels near the exit openings, preferably concentric to each other.

First claim

1 . A Gas Injection System (GIS) for applying at least two fluids in the vacuum chamber of a particle-optical apparatus, the gas injection system having two or more channels, each channel connected to an associated reservoir holding a fluid at a first side and having an associated exit opening at the other side, the exit sides individually exiting to the outside of the GIS via a nozzle with a nozzle opening, the at least two exit openings being separated by less than the diameter of the channels near the exit openings.

2 . The GIS of claim 1 in which one of the exit openings is concentric with another exit opening.

3 . The GIS of claim 2 in which the inner exit opening protrudes through the outer exit opening.

4 . The GIS of claim 1 in which, the fluids are mixed after exiting the exit opening.

5 . The GIS claim 1 in which a first channel is connected with a positioning unit for positioning the GIS, and at least one other channel is detachably mounted on the first channel.

6 . A particle-optical apparatus equipped with a GIS according to claim 1 .

7 . A method of using a GIS according to claim 1 , the method comprising at least two fluids exiting the GIS, one fluid exiting the GIS with a first flux and the other fluid exiting the GIS with a flux differing by at least two orders of magnitude.

8 . The method of using a GIS according to claim 1 in which a first fluid is a precursor material and a second fluid is reactive to at least one breakdown product of the precursor material.

9 . The method of claim 8 in which the second fluid is delivered with a flux at least two orders of magnitude greater than the first fluid.

10 . The method of claim 8 in which the second fluid is a reducing fluid or an oxidizing fluid.

11 . The method of claim 10 in which the fluid is a reducing fluid comprising H 2

12 . The method of claim 10 in which the fluid is an oxidizing fluid comprising O 2 or H 2 O.

13 . The method of claim 8 , wherein the precursor material comprises a deposition precursor and wherein the deposition precursor decomposes in the presence of a charged particle beam to form a deposit on a workpiece.

14 . The method of claim 13 , wherein the second fluid is reactive to at least one breakdown product of the precursor material, the reaction forming volatile reaction products, and wherein the reaction of the second fluid with at least one breakdown product of the precursor material prevents contamination of the deposit with breakdown products.

15 . The method of claim 9 , in which the second fluid is delivered with a flux at least four orders of magnitude greater than the flux of the first fluid.

16 . A method of introducing at least two fluids into the vacuum chamber of a particle-optical apparatus, comprising:
flowing a first fluid through a first channel into a first nozzle introducing the first fluid into the vacuum chamber through the first nozzle; flowing a second fluid through a second channel into a second nozzle introducing the second fluid into the vacuum chamber through a second nozzle separated from first nozzle by less than the diameter of the larger of the first or the second channels.

17 . The method of claim 16 , in which the first fluid and second fluid mix are mixed after exiting the first and second nozzles.

18 . The GIS of claim 1 , in which the GIS is manufactured using additive manufacturing.

19 . The GIS of claim 1 , wherein one of the two or more channels is a fixed channel, and another one or more of the two or more channels is detachable from the fixed channel.

20 . The GIS of claim 20 , wherein the fixed channel is a pre-existing channel and the one or more detachable channels are provided as a retrofit to the pre-existing channel.

Assignees

• Fei Co

Inventors

• Mulders Johannes Jacobus Lambertus
• Trompenaars Petrus Hubertus Franciscus
• Dona Pleun

Classifications

• H01J2237/006

  Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece, (H01J37/3244 takes precedence; environmental cells for electron microscopes H01J2237/2003; microscopes with environmental specimen chamber H01J2237/2608) · CPC title

• C23C14/221 Primary

  Ion beam deposition (C23C14/46, C23C14/48 take precedence) · CPC title

• B05B1/005

  Nozzles or other outlets specially adapted for discharging one or more gases · CPC title

• B05B7/24

  with means, e.g. a container, for supplying liquid or other fluent material to a discharge device (B05B7/14, B05B7/16, B05B11/00 take precedence) · CPC title

• H01J2237/31749

  Focused ion beam · CPC title