Metal Grating For X-Rays, Production Method For Metal Grating For X-Rays, Metal Grating Unit For X-Rays, And X-Ray Imaging Device

Patent metadata

Field	Value
Publication number	US-2016240276-A1
Application number	US-201415025174-A
Country	US
Kind code	A1
Filing date	Jul 24, 2014
Priority date	Sep 26, 2013
Publication date	Aug 18, 2016
Grant date	—

Abstract

An X-ray metal grating structure of the present invention has a grating region in which a plurality of first structural portions are periodically provided, wherein an air gap is formed between each of the plurality of first structural portions and a second structural portion as a remaining part of the grating region other than the plurality of first structural portions. Thus, the X-ray metal grating structure of the present invention is formed as a grating structure having high flatness. A production method therefor comprises a step of forming the air gap between the first structural portion and the second structural portion. Thus, the production method makes it possible to produce an X-ray metal grating structure having high flatness. The present invention further provides an X-ray metal grating unit and an X-ray imaging device each comprising the X-ray metal grating structure.

First claim

1 . An X-ray metal grating structure comprising a grating-forming workpiece having one surface formed with a grating region in which a plurality of first structural portions mutually having a same shape are periodically provided, wherein:
the grating region comprising the plurality of first structural portions, a second structural portion as a remaining part of the grating region other than the plurality of first structural portions, and an air gap formed between each of the first structural portions and the second structural portion, in such a manner as to provide a given spacing therebetween in a given planar direction on a grating plane of the grating region, and extend along a direction normal to the grating plane of the grating region; and the first structural portion and the second structural portion are made, respectively, of first and second grating region materials each having a respective one of mutually different first and second characteristic values of a given characteristic with respect to X-ray, wherein at least one of the first and second grating region materials is a metal.

2 . An X-ray metal grating structure production method comprising:
a grating forming step of forming, on one surface of a grating-forming workpiece made of an electrically-conductive material, a grating region in which a plurality of first structural portions mutually having a same shape are periodically provided via a recess; on-non-bottom-surface insulation layer forming step of forming an insulation layer on a surface of the recess in the grating-forming workpiece, except for a bottom surface of the recess; an electroforming step of applying voltage across the grating-forming workpiece to perform an electroforming process to thereby fill the recess with a metal; and an intervening-insulation layer removing step of removing the insulation layer formed on the surface of the recess in the on-non-bottom-surface insulation layer forming step, at least in a region intervening between the grating-forming workpiece and the metal filled in the electroforming step.

3 . The X-ray metal grating structure production method as recited in claim 2 , wherein the grating-forming workpiece is a substrate made of silicon.

4 . The X-ray metal grating structure production method as recited in claim 3 , wherein the silicon is n-type silicon.

5 . The X-ray metal grating structure production method as recited in claim 2 , wherein the intervening-insulation layer removing step includes immersing the grating-forming workpiece in a hydrofluoric acid solution to thereby remove the at least region of the insulation layer intervening between the grating-forming workpiece and the metal filled in the electroforming step.

6 . The X-ray metal grating structure production method as recited in claim 2 , wherein the grating forming step includes forming the recess in the one surface of the grating-forming workpiece by dry etching using a Bosch process to thereby form the grating region.

7 . The X-ray metal grating structure production method as recited in claim 2 , wherein the on-non-bottom-surface insulation layer forming step includes forming the insulation layer by a thermal oxidation process or an anodic oxidation process.

8 . The X-ray metal grating structure production method as recited in claim 2 , wherein the metal is at least one selected from the group consisting of gold (Au), platinum (Pt), iridium (Ir) and rhodium (Rh).

9 . An X-ray metal grating structure produced by the X-ray metal grating structure production method as recited in claim 2 .

10 . An X-ray metal grating unit comprising a plurality of X-ray metal grating structures arranged to form one grating plane, wherein at least one of the plurality of X-ray metal grating structures is composed of the X-ray metal grating structure as recited in claim 1 .

11 . An X-ray imaging device comprising:
an X-ray source for radiating X-rays; a Talbot interferometer or Talbot-Lau interferometer configured to be irradiated with X-rays radiated from the X-ray source; and an X-ray imaging element for imaging X-rays from the Talbot interferometer or Talbot-Lau interferometer, wherein the Talbot interferometer or Talbot-Lau interferometer comprises the X-ray metal grating structure as recited in claim 1 .

12 . An X-ray metal grating unit comprising a plurality of X-ray metal grating structures arranged to form one grating plane, wherein at least one of the plurality of X-ray metal grating structures is composed of the X-ray metal grating structure as recited in claim 9 .

13 . An X-ray imaging device comprising:
an X-ray source for radiating X-rays; a Talbot interferometer or Talbot-Lau interferometer configured to be irradiated with X-rays radiated from the X-ray source; and an X-ray imaging element for imaging X-rays from the Talbot interferometer or Talbot-Lau interferometer, wherein the Talbot interferometer or Talbot-Lau interferometer comprises the X-ray metal grating structure as recited in claim 9 .

Assignees

• Konica Minolta Inc

Inventors

• Yokoyama Mitsuru

Classifications

• G21K2207/005

  Methods and devices obtaining contrast from non-absorbing interaction of the radiation with matter, e.g. phase contrast · CPC title

• A61B6/4291

  the detector being combined with a grid or grating · CPC title

• G01N23/20075

  by measuring interferences of X-rays, e.g. Borrmann effect · CPC title

• G02B5/1838

  for use with ultraviolet radiation or X-rays · CPC title

• A61B6/484

  involving phase contrast X-ray imaging · CPC title