Coating composition, and process for producing photoresist laminate

Patent metadata

Field	Value
Publication number	US-2016238935-A1
Application number	US-201615139566-A
Country	US
Kind code	A1
Filing date	Apr 27, 2016
Priority date	Nov 29, 2013
Publication date	Aug 18, 2016
Grant date	—

Abstract

To provide a coating composition which exhibits excellent followability to a difference in level in its application, and which is capable of forming a coating layer having a low refractive index in a short-wavelength region and exhibiting excellent solubility to an alkaline aqueous solution. A coating composition comprising a solvent and a fluorinated polymer (A) which has a unit represented by —[CX 1 X 2 —CY(—Rf—COOM)]— and has a number average molecular weight of from 1,000 to 7,500. X 1 and X 2 are each independently a hydrogen atom, a fluorine atom or a chlorine atom; Y is a hydrogen atom, a fluorine atom, a chlorine atom, a methyl group or a trifluoromethyl group; Rf is a branched perfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms, or a branched oxyperfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms; and M is a hydrogen atom or an ammonium ion which may be substituted.

First claim

What is claimed is:

1 . A coating composition characterized by comprising a fluorinated polymer (A) which has a unit represented by the following formula (1) and has a number average molecular weight of from 1,000 to 7,500, and a solvent:
—[CX 1 X 2 —CY(—Rf—COOM)]—  (1)

(wherein each of X 1 and X 2 which are independent of each other, is a hydrogen atom, a fluorine atom or a chlorine atom, Y is a hydrogen atom, a fluorine atom, a chlorine atom, a methyl group or a trifluoromethyl group, Rf is a branched perfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms, or a branched oxyperfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms, and M is a hydrogen atom, or an ammonium ion which may be substituted).

2 . The coating composition according to claim 1 , wherein each of X 1 , X 2 and Y is a fluorine atom.

3 . The coating composition according to claim 1 , wherein the unit represented by the formula (1) is
—[CF 2 —CF(OCF 2 CF(CF 3 )OCF 2 CF 2 COOM)]—,
—[CF 2 —CF(OCF 2 CF(CF 3 )OCF 2 CF 2 CF 2 COOM)]—, or
—[CF 2 —CF(CF 2 OCF(CF 3 )CF 2 OCF(CF 3 )COOM)]—.

4 . The coating composition according to claim 1 , wherein the content of the group represented by —COOM in the fluorinated polymer (A) is from 1.5×10 −3 to 3.0×10 −3 mol/g.

5 . The coating composition according to claim 1 , wherein the refractive index at 193 nm of a coating layer made of the fluorinated polymer (A) is at most 1.43.

6 . The coating composition according to claim 1 , wherein the content of the fluorinated polymer (A) is from 1 to 10 mass %.

7 . The coating composition according to claim 1 , wherein the solvent is water.

8 . The coating composition according to claim 1 , wherein the solvent is a mixed solvent of water and a water-soluble organic solvent.

9 . The coating composition according to claim 8 , wherein the mass ratio of water to the water-soluble organic solvent in the mixed solvent is from 3:7 to 9:1.

10 . The coating composition according to claim 8 , wherein the water-soluble organic solvent is a fluorinated alcohol.

11 . The coating composition according to claim 10 , wherein content of the fluorinated alcohol in the coating composition is from 9 to 40 mass %.

12 . A photoresist laminate comprising a photoresist layer and an antireflection coating layer provided on a surface of the photoresist layer, characterized in that the antireflection layer contains the fluorinated polymer (A) as defined in claim 1 .

13 . A process for producing a photoresist laminate having an antireflection coating layer provided on a surface of a photoresist layer, characterized by comprising a step of applying the coating composition as defined in claim 1 on a surface of a photoresist layer, and a step of removing the solvent from the obtained coating layer.

Assignees

• Asahi Glass Co Ltd

Inventors

• Yamasaki Ryujiro
• Asakawa Akihiko
• Sakane Yoshihiko
• Sato Masakuni
• Umemura Kazuo

Classifications

• G03F7/091 Primary

  characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement · CPC title

• C09D133/16

  Homopolymers or copolymers of esters containing halogen atoms · CPC title

• C08F16/26

  Monomers containing oxygen atoms in addition to the ether oxygen · CPC title

• B32B2255/26

  Polymeric coating · CPC title

• B32B2255/10

  on synthetic resin layer or on natural or synthetic rubber layer · CPC title