Masking tools and methods
US-2024091807-A1 · Mar 21, 2024 · US
Mask for depositing a thin film and a thin film deposition method using the same
US2016236222A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016236222-A1 |
| Application number | US-201615139435-A |
| Country | US |
| Kind code | A1 |
| Filing date | Apr 27, 2016 |
| Priority date | Jun 14, 2013 |
| Publication date | Aug 18, 2016 |
| Grant date | — |
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- Title
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Abstract
Official abstract text for this publication.
A mask for depositing a thin film and a thin film deposition method using the same are disclosed. The mask includes pattern bars disposed on a frame. The pattern bars are moveable and are position to form a deposition pattern. The mask includes a pattern modification mechanism configured to move the pattern bars to a plurality of positions to modify the deposition pattern.
First claim
Opening claim text (preview).
What is claimed is: 1 . A method of depositing a thin film, the method comprising: preparing a mask in which pattern bars are disposed on a frame, the pattern bars configured to form a deposition pattern; moving the pattern bars to modify the deposition pattern; and performing a deposition process using the modified deposition pattern. 2 . The method of claim 1 , wherein the pattern bars are rotated to form the deposition pattern. 3 . The method of claim 1 , wherein the pattern bars are slid to form the deposition pattern.
Assignees
Inventors
Classifications
using means for protecting parts of a surface not to be coated, e.g. using stencils, resists · CPC title
- B05B12/29Primary
with adjustable size · CPC title
- C23C14/042Primary
using masks · CPC title
- B05B15/0481Primary
Operations & Transport · mapped topic
- H05B33/10Primary
Apparatus or processes specially adapted to the manufacture of electroluminescent light sources · CPC title
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Frequently asked questions
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- What does patent US2016236222A1 cover?
- A mask for depositing a thin film and a thin film deposition method using the same are disclosed. The mask includes pattern bars disposed on a frame. The pattern bars are moveable and are position to form a deposition pattern. The mask includes a pattern modification mechanism configured to move the pattern bars to a plurality of positions to modify the deposition pattern.
- Who is the assignee on this patent?
- Samsung Display Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification B05B12/29. Mapped technology areas include Operations & Transport.
- When was this patent published?
- Publication date Thu Aug 18 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).