Gas treatment apparatus

Patent metadata

Field	Value
Publication number	US-2016236205-A1
Application number	US-201415031096-A
Country	US
Kind code	A1
Filing date	Sep 30, 2014
Priority date	Nov 5, 2013
Publication date	Aug 18, 2016
Grant date	—

Abstract

A gas treatment includes: a gas scrubber chamber operable to receive an effluent gas stream originating from a manufacturing process tool to be scrubbed therewithin to provide a scrubbed gas stream; and an electrostatic precipitation chamber operable to receive the scrubbed gas stream to be treated therewithin to provide a treated gas stream, one of the gas scrubber chamber and the electrostatic precipitation chamber defining a first chamber and another of the gas scrubber chamber and the electrostatic precipitation chamber defining a second chamber, the first chamber being configured to surround the second chamber. In this way, the first chamber and the second chamber can share the same volume.

First claim

1 . A gas treatment apparatus, comprising:
a gas scrubber chamber operable to receive an effluent gas stream originating from a manufacturing process tool to be scrubbed therewithin to provide a scrubbed gas stream; and an electrostatic precipitation chamber operable to receive said scrubbed gas stream to be treated therewithin to provide a treated gas stream, one of said gas scrubber chamber and said electrostatic precipitation chamber defining a first chamber and another of said gas scrubber chamber and said electrostatic precipitation chamber defining a second chamber, said first chamber being configured to surround said second chamber.

2 . The apparatus of claim 1 , wherein said first chamber and said second chamber share a common wall.

3 . The apparatus of claim 2 , wherein an inner surface of said common wall defines an outer wall of said second chamber and an outer surface of said common wall defines inner wall of said first chamber.

4 . The apparatus of claim 2 , wherein said second chamber comprises an elongate chamber defined by said inner surface of said common wall and said first chamber comprises an elongate annular chamber defined by said outer surface of said common wall and an inner surface of an enclosing wall.

5 . The apparatus of claim 1 , wherein said gas scrubbing chamber comprises a header tank at least partially defining said gas scrubbing chamber, said header tank being operable to provide a constant flow of a received liquid to said gas scrubbing chamber.

6 . The apparatus of claim 1 , wherein said electrostatic precipitation chamber comprises outlets for ejecting liquid to provide a circumferentially flowing liquid curtain therewithin.

7 . The apparatus of claim 1 , wherein said electrostatic precipitation chamber defines said first chamber and said gas scrubbing chamber defines said second chamber.

8 . The apparatus of claim 3 , wherein said electrostatic precipitation chamber comprises outlets for ejecting liquid to provide a circumferentially flowing liquid curtain along both said outer surface of said common wall and said inner surface of said enclosing wall.

9 . The apparatus of claim 3 , wherein said electrostatic precipitation chamber comprises an elongate annular electrode structure located between said outer surface of said common wall and said inner surface of said enclosing wall.

10 . The apparatus of claim 9 , wherein said elongate annular electrode structure extends axially along said electrostatic precipitation chamber.

11 . The apparatus of claim 9 , wherein said elongate annular electrode structure is located a constant distance between said outer surface of said common wall and said inner surface of said enclosing wall.

12 . The apparatus of claim 9 , wherein said elongate annular electrode structure comprises discharge points extending towards said outer surface of said common wall and said inner surface of said enclosing wall.

13 . The apparatus of claim 12 , wherein a ratio of that number of said discharge points extending towards said outer surface of said common wall and that number of said discharge points extending towards said inner surface of said enclosing wall is proportional to a ratio of an area of said outer surface of said common wall and an area of said inner surface of said enclosing wall.

14 . The apparatus of claim 1 , wherein said gas scrubbing chamber comprises an effluent gas stream inlet for receiving said effluent gas stream and said electrostatic precipitation chamber comprises an treated gas stream outlet for providing treated gas stream, said effluent gas stream inlet and said treated gas stream outlet being positioned to cause gas flow along an axial length of both said gas scrubbing chamber and said electrostatic precipitation chamber.

15 . The apparatus of claim 9 , wherein said gas scrubbing chamber comprises a conduit to convey said scrubbed gas stream to an inlet of said electrostatic precipitation chamber located away from a suspension structure for said elongate annular electrode structure.

Assignees

• Edwards Ltd

Inventors

• Seeley Andrew James
• Pope Alexander Michael
• Cohn Thomas Frank

Classifications

• B01D53/1456 Primary

  Removing acid components · CPC title

• B03C3/01 Primary

  Pretreatment of the gases prior to electrostatic precipitation · CPC title

• B03C3/41

  Ionising-electrodes · CPC title

• B01D53/14

  by absorption · CPC title

• B01D2257/2045

  Hydrochloric acid · CPC title