Glass panel including a first glass sheet at least partially coated with an electrically conductive coating
US-10036193-B2 · Jul 31, 2018 · US
US2016229741A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016229741-A1 |
| Application number | US-201415029656-A |
| Country | US |
| Kind code | A1 |
| Filing date | Oct 14, 2014 |
| Priority date | Oct 17, 2013 |
| Publication date | Aug 11, 2016 |
| Grant date | — |
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A process for obtaining an item including a substrate made of glass or glass ceramic coated on at least one portion of at least one of its faces with a stack of thin-layers including no silver layers and including at least one thin layer of a transparent electrically conductive oxide, the process including: a step of depositing the stack, in which step the thin layer of a transparent electrically conductive oxide and at least one thin homogenizing layer are deposited, the thin homogenizing layer being a metal layer or a layer based on a metal nitride other than aluminum nitride, or a layer based on metal carbide; then a heat treatment step in which the stack is exposed to radiation.
Opening claim text (preview).
1 . A process for obtaining an item comprising a substrate made of glass or glass ceramic coated on at least one portion of at least one of its faces with a stack of thin-layers comprising no silver layers and comprising at least one thin layer of a transparent electrically conductive oxide, said process comprising: a step of depositing said stack, in which step said thin layer of a transparent electrically conductive oxide and at least one thin homogenizing layer are deposited, said thin homogenizing layer being a metal layer or a layer based on a metal nitride other than aluminum nitride, or a layer based on a metal carbide; then a heat treatment step in which said stack is exposed to radiation. 2 . The process as claimed in claim 1 , wherein the transparent conductive oxide is chosen from indium tin oxide, indium zinc oxide, antimony- or fluorine-doped tin oxide, aluminum- and/or gallium- and/or titanium-doped zinc oxide, niobium- and/or tantalum-doped titanium oxide and zinc or cadmium stannate. 3 . The process as claimed in claim 2 , wherein the transparent conductive oxide is indium tin oxide. 4 . The process as claimed in claim 1 , wherein a physical thickness of the thin layer of a transparent electrically conductive oxide is at least 30 nm. 5 . The process as claimed in claim 1 , wherein a ratio of the light absorption to a physical thickness of the thin layer of a transparent electrically conductive oxide is comprised in a range extending from 0.1 to 0.9 μm −1 before heat treatment. 6 . The process as claimed in claim 1 , wherein the stack comprises a plurality of layers of a transparent conductive oxide. 7 . The process as claimed in claim 1 , wherein the thin homogenizing layer is located above the layer of a transparent electrically conductive oxide. 8 . The process as claimed in claim 1 , wherein the thin homogenizing layer is a metal layer chosen from layers of a metal chosen from titanium, tin, zirconium, zinc, aluminum, cerium or any one of their alloys. 9 . The process as claimed in claim 8 , wherein the metal is titanium. 10 . The process as claimed in claim 1 , wherein the thin homogenizing layer is based on a metal nitride chosen from titanium nitride, hafnium nitride, zirconium nitride or any one of their solid solutions, 11 . The process as claimed in claim 1 , wherein the thin homogenizing layer is based on a metal carbide chosen from titanium carbide, tungsten carbide or any one of their solid solutions. 12 . The process as claimed in claim 1 , wherein a physical thickness of the thin homogenizing layer is at most 15 nm. 13 . The process as claimed in claim 1 , wherein the radiation is emitted by at least one flash lamp. 14 . The process as claimed in claim 1 , wherein the radiation is laser radiation focused on said coating in the form of at least one laser line. 15 . The process as claimed in claim 14 , wherein a wavelength of the laser radiation is comprised in a range extending from 500 to 2000 nm. 16 . An item obtainable by way of the process of claim 1 . 17 . A single, multiple or laminated glazing unit, a mirror, a glass wall coating, an oven door or a fireplace insert comprising at least one item according to claim 16 . 18 . A photovoltaic cell, display screen or active glazing unit comprising at least one item according to claim 16 , the coating being used as an electrode. 19 . The process as claimed in claim 4 , wherein the physical thickness of the thin layer of a transparent electrically conductive oxide is at least 50 nm. 20 . The process as claimed in claim 5 , wherein the ratio is in the range extending from 0.2 to 0.7 μm −1 before heat treatment. 21 . The process as claimed in claim 6 , wherein the stack comprises two or three layers of a transparent conductive oxide. 22 . The process as claimed in claim 8 , wherein the metal layer is an alloy of tin and zinc. 23 . The process as claimed in claim 12 , wherein the physical thickness of the thin homogenizing layer is at most 8 nm. 24 . The process as claimed in claim 13 , wherein the at least one flash lamp is a xenon flash lamp. 25 . The process as claimed in claim 15 , wherein the wavelength of the laser radiation is comprised in the range extending from 700 to 1100 nm.
the multilayer coating having electrical properties · CPC title
comprising carbon, a carbide or oxycarbide · CPC title
at least one of the coatings comprising a suboxide · CPC title
Layers comprising indium tin oxide [ITO] · CPC title
comprising a nitride, oxynitride, boronitride or carbonitride · CPC title
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