Mask and manufacturing method therefor
US-2015259779-A1 · Sep 17, 2015 · US
US2016229170A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016229170-A1 |
| Application number | US-201415024561-A |
| Country | US |
| Kind code | A1 |
| Filing date | Aug 29, 2014 |
| Priority date | Sep 30, 2013 |
| Publication date | Aug 11, 2016 |
| Grant date | — |
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The present invention relates to a method for manufacturing a single-faced thin polarizing plate, including: supplying a process film to one surface of a polarizer having a thickness of 50 μm or less; supplying a protection film to the other surface of the polarizer; forming an adhesive layer by supplying an adhesive composition between the polarizer and the protection film; pressing a laminate of the process film/the polarizer/the protection film by disposing a pair of pressing units on a surface of each of the process film and the protection film; and stripping the process film, in which stripping force between the polarizer and the process film is 1.0 N or less.
Opening claim text (preview).
1 . A method for manufacturing a single-faced thin polarizing plate, comprising: supplying a process film to one surface of a polarizer having a thickness of 50 μm or less; supplying a protection film to the other surface of the polarizer; forming an adhesive layer by supplying an adhesive composition between the polarizer and the protection film; pressing a laminate of the process film/the polarizer/the protection film by disposing a pair of pressing units on each surface of each of the process film and the protection film; and stripping the process film, wherein stripping force between the polarizer and the process film is 1.0 N or less. 2 . The method for manufacturing a single-faced thin polarizing plate of claim 1 , further comprising: forming a protection layer on a surface from which the process film is stripped after the stripping of the process film. 3 . The method for manufacturing a single-faced thin polarizing plate of claim 1 , wherein the adhesive composition is formed by using a radical-curable composition or a cation-curable composition. 4 . The method for manufacturing a single-faced thin polarizing plate of claim 2 , wherein the protection layer is formed by using a radical-curable composition or a cation-curable composition. 5 . The method for manufacturing a single-faced thin polarizing plate of claim 2 , wherein a modulus of the protection layer is 500 MPa to 6000 MPa. 6 . The method for manufacturing a single-faced thin polarizing plate of claim 2 , wherein a thickness of the protection layer is 0.5 μm to 10 μm. 7 . The method for manufacturing a single-faced thin polarizing plate of claim 1 , wherein the pressing is performed under a pressure of 0.5 MPa to 6 MPa. 8 . The method for manufacturing a single-faced thin polarizing plate of claim 1 , wherein a thickness of the process film is 20 μm to 100 μm. 9 . The method for manufacturing a single-faced thin polarizing plate of claim 1 , wherein a width of the process film is larger than a width of the polarizer. 10 . The method for manufacturing a single-faced thin polarizing plate of claim 1 , wherein surface roughness (Ra) of the process film is 0.5 nm to 60 nm. 11 . The method for manufacturing a single-faced thin polarizing plate of claim 1 , wherein the process film includes one kind or more selected from the group consisting of a polyethylene terephthalate film, a polyethylene film, a polycarbonate film, a triacetylcellulose film, a cycloolefin polymer film, and an acryl film. 12 . The method for manufacturing a single-faced thin polarizing plate of claim 1 , wherein the protection film includes one kind or more selected from the group consisting of a polyethylene terephthalate film, a polyethylene film, a polycarbonate film, a triacetylcellulose film, a cycloolefin polymer film, and an acryl film. 13 . The method for manufacturing a single-faced thin polarizing plate of claim 1 , wherein the polarizer is subjected to wet stretching or dry stretching. 14 . The method for manufacturing a single-faced thin polarizing plate of claim 13 , wherein the wet stretching or the dry stretching is performed at a stretching magnification of 4 times or more. 15 . The method for manufacturing a single-faced thin polarizing plate of claim 1 , wherein a thickness of the single-faced thin polarizing plate is 30 μm to 140 μm.
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