Substrate treating apparatus and treatment liquid nozzle

US2016218022A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016218022-A1
Application numberUS-201615006359-A
CountryUS
Kind codeA1
Filing dateJan 26, 2016
Priority dateJan 28, 2015
Publication dateJul 28, 2016
Grant date

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Disclosed is a substrate treating apparatus. The substrate treating apparatus includes a housing having a space for treating a substrate in the interior thereof, a spin head which supports and rotates the substrate inside the housing, and an ejection unit having a first nozzle member for ejecting a first treatment liquid onto the substrate positioned on the spin head. The first nozzle member includes a body having an ejection passage, through which the first treatment liquid flows, therein and a first discharge hole communicated with the ejection passage to eject the first treatment liquid onto the substrate, and a vibrator installed in the body to provide vibration for the first treatment liquid flowing through the ejection passage. The vibrator has an interference preventing recess for preventing an interference by reflective waves therein.

First claim

Opening claim text (preview).

What is claimed is: 1 . A substrate treating apparatus, comprising: a housing having a space for treating a substrate in the interior thereof; a spin head which supports and rotates the substrate inside the housing; and an ejection unit having a first nozzle member for ejecting a first treatment liquid onto the substrate positioned on the spin head, wherein the first nozzle member comprises: a body having an ejection passage, through which the first treatment liquid flows, therein and a first discharge hole communicated with the ejection passage to eject the first treatment liquid onto the substrate; and a vibrator installed in the body to provide vibration for the first treatment liquid flowing through the ejection passage, and wherein the vibrator has an interference preventing recess for preventing an interference by reflective waves therein. 2 . The substrate treating apparatus of claim 1 , wherein the interference preventing recess is formed at a central portion of the vibrator. 3 . The substrate treating apparatus of claim 2 , wherein the interference preventing recess has a polygonal shape. 4 . The substrate treating apparatus of claim 3 , wherein the vibrator is a piezoelectric element. 5 . The substrate treating apparatus of claim 1 , wherein the vibrator has a polygonal shape. 6 . The substrate treating apparatus of claim 1 , wherein the ejection unit further comprises: a second nozzle member for ejecting a second treatment liquid onto the substrate. 7 . The substrate treating apparatus of claim 1 , wherein the first treatment liquid is a cleaning liquid, and the second treatment liquid is a mixture solution containing ammonia and hydrogen peroxide. 8 . A treatment liquid nozzle configured to supply a treatment liquid to a target treatment body and comprising a vibrator for providing vibration with the treatment liquid, wherein the vibrator has an interference preventing recess for preventing an interference by reflective waves therein. 9 . The treatment liquid nozzle of claim 8 , wherein the interference preventing recess is formed at a central portion of the vibrator. 10 . The treatment liquid nozzle of claim 9 , wherein the interference preventing recess has a polygonal shape. 11 . The treatment liquid nozzle of claim 10 , wherein the vibrator is a piezoelectric element. 12 . The treatment liquid nozzle of claim 8 , wherein the vibrator has a polygonal shape. 13 . A treatment liquid nozzle configured to supply a treatment liquid to a target treatment body and comprising a vibrator for providing vibration with the treatment liquid, wherein the vibrator has a polygonal shape. 14 . The treatment liquid nozzle of claim 13 , wherein the vibrator is a piezoelectric element.

Assignees

Inventors

Classifications

  • using mainly spraying means, e.g. nozzles · CPC title

  • Cleaning by the force of jets or sprays · CPC title

  • Ultra or megasonic jets · CPC title

  • generated by electrical means, e.g. piezoelectric transducers · CPC title

  • by sonic or ultrasonic vibrations · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US2016218022A1 cover?
Disclosed is a substrate treating apparatus. The substrate treating apparatus includes a housing having a space for treating a substrate in the interior thereof, a spin head which supports and rotates the substrate inside the housing, and an ejection unit having a first nozzle member for ejecting a first treatment liquid onto the substrate positioned on the spin head. The first nozzle member in…
Who is the assignee on this patent?
Semes Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10P72/0414. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Jul 28 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).