Method for Producing a Reflection-Reducing Layer System and Reflection-Reducing Layer System

Patent metadata

Field	Value
Publication number	US-2016216409-A1
Application number	US-201615008392-A
Country	US
Kind code	A1
Filing date	Jan 27, 2016
Priority date	Jan 27, 2015
Publication date	Jul 28, 2016
Grant date	—

Abstract

A method for producing a reflection-reducing layer system on a substrate and a reflection-reducing layer system are disclosed. According to an embodiment the method includes depositing a refractive index gradient layer on the substrate by co-evaporation of an inorganic material and an organic material, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction, depositing an organic layer above the refractive index gradient layer, and producing a nanostructure in the organic layer by a plasma etching process.

First claim

What is claimed is:

1 . A method for producing a reflection-reducing layer system on a substrate, the method comprising:
depositing a refractive index gradient layer on the substrate by coevaporation of an inorganic material and an organic material, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction; depositing an organic layer above the refractive index gradient layer; and producing a nanostructure in the organic layer by a plasma etching process.

2 . The method according to claim 1 , wherein the nanostructure has a plurality of structure elements whose heights are on average between 80 nm and 130 nm and whose spacings are on average less than 100 nm.

3 . The method according to claim 1 , wherein the inorganic material of the refractive index gradient layer has a refractive index n 1 where 1.37≦n 1 ≦1.46, and wherein the organic material of the refractive index gradient layer has a refractive index n 2 >n 1 where 1.6≦n 2 ≦1.9.

4 . The method according to claim 1 , wherein the refractive index of the refractive index gradient layer at an interface with the substrate is matched to a refractive index of the substrate.

5 . The method according to claim 1 , wherein the organic material is a UV-absorbing material.

6 . The method according to claim 1 , wherein the organic layer has at least regionally an effective refractive index of between 1.05 and 1.38.

7 . The method according to claim 1 , further comprising, prior to depositing the organic layer, depositing an inorganic intermediate layer on the refractive index gradient layer.

8 . The method according to claim 1 , further comprising, after producing the nanostructure, applying a protective layer having a thickness of between 10 nm and 50 nm to the nanostructure.

9 . The method according to claim 1 , wherein the entire reflection-reducing layer system is produced in a vacuum process.

10 . The method according to claim 1 , wherein the organic layer is deposited by plasma ion assisted deposition using a plasma ion source, and wherein the nanostructure is subsequently produced by increasing the ion energy and/or changing a process gas of the plasma ion source.

11 . The method according to claim 1 , wherein the organic layer comprises melamine.

12 . A reflection-reducing layer system, the system comprising
a refractive index gradient layer comprising an inorganic material and an organic material in a spatially varying composition, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction; and an organic layer arranged above the refractive index gradient layer, the organic layer having a surface provided with a nanostructure.

13 . The reflection-reducing layer system according to claim 12 , wherein the nanostructure has a plurality of structure elements whose heights are on average between 80 nm and 130 nm and whose spacings are on average less than 100 nm.

14 . The reflection-reducing layer system according to claim 12 , wherein the refractive index of the refractive index gradient layer at an interface with a substrate of the reflection-reducing layer system is matched to a refractive index of the substrate.

15 . The reflection-reducing layer system according to claim 12 , wherein a total thickness of the reflection-reducing layer system is between 250 nm and 450 nm.

Assignees

• Fraunhofer Ges Forschung

Inventors

• Schulz Ulrike
• Rickelt Friedrich
• Munzert Peter
• Heisse Hanno
• Knopf Heiko
• Füchsel Kevin
• Kaiser Norbert

Classifications

• B29C59/14

  by plasma treatment {(plasma tubes per se H01J)} · CPC title

• G02B1/118 Primary

  having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures · CPC title

• B05D3/148

  affecting the surface properties of the coating · CPC title

• B05D1/60

  Deposition of organic layers from vapour phase (vapour phase deposition in general C23C14/00, C23C16/00) · CPC title

• B05D3/145

  After-treatment · CPC title