Imprint apparatus, imprinting method, and method of manufacturing articles

Patent metadata

Field	Value
Publication number	US-2016207248-A1
Application number	US-201614993975-A
Country	US
Kind code	A1
Filing date	Jan 12, 2016
Priority date	Jan 16, 2015
Publication date	Jul 21, 2016
Grant date	—

Abstract

The invention provides an imprint apparatus configured to form a pattern including: a plurality of detectors configured to detect marks, the plurality of detectors including a first detector and a second detector, and a control unit, the control unit causing the first detector to detect a first mark on the mold and a first mark on the substrate formed in the first region, performing a first alignment, causing the first detector to detect the first mark on the mold and the first mark on the substrate, and then causing the second detector to detect a second mark formed on the second region of the mold and a second mark on the substrate while moving the first detector.

First claim

What is claimed is:

1 . An imprint apparatus configured to form a pattern of an imprint material on a substrate by using a mold comprising:
a plurality of detectors configured to detect marks formed on the substrate and marks formed on the mold, the plurality of detectors including a first detector and a second detector; and a control unit configured to control the imprint apparatus, the control unit bringing the imprint material and the mold into contact with each other so that a first region and a second region of the mold contact sequentially with the imprint material, causing the first detector to detect a first mark on the mold and a first mark on the substrate formed in the first region, performing a first alignment between the substrate and the mold on the basis of a result of detection of the first mark on the mold and the first mark on the substrate, causing the first detector to detect the first mark on the mold and the first mark on the substrate, and then causing the second detector to detect a second mark formed on the second region of the mold and a second mark on the substrate, while moving the first detector.

2 . The imprint apparatus according to claim 1 , wherein
the control unit causes the first detector to detect the first mark on the mold and the first mark on the substrate, and then moves the first detector while the first alignment is performed.

3 . The imprint apparatus according to claim 1 , wherein
the control unit obtains a relative position between the substrate and the mold from a result of detection of the second mark on the mold and the second mark on the substrate, and performs a second alignment between the substrate and the mold on the basis of the obtained relative position.

4 . The imprint apparatus according to claim 1 , wherein
the first mark formed on the mold comes into contact first with the imprint material on the substrate.

5 . The imprint apparatus according to claim 1 , wherein the first region corresponds to a center in a pattern region formed on the mold.

6 . The imprint apparatus according to claim 1 , wherein the second region corresponds to a periphery of the pattern region formed on the mold.

7 . The imprint apparatus according to claim 1 , wherein
the control unit moves the first detector, and then causes the first detector to detect a third mark on the mold and a third mark on the substrate formed in a third region which is different from the first region and the second region.

8 . The imprint apparatus according to claim 7 , wherein
the control unit obtains a relative position between the substrate and the mold from a result of detection of the third mark on the mold and the third mark on the substrate and performs a third alignment between the substrate and the mold on the basis of the obtained relative position.

9 . The imprint apparatus according to claim 7 , wherein the control unit performs the third alignment between the substrate and the mold on the basis of the result of detection of the second mark on the mold and the second mark on the substrate detected by the second detector, and the result of detection of the third mark on the mold and the third mark on the substrate detected by the first detector.

10 . The imprint apparatus according to claim 7 , wherein
the third region is a periphery of the pattern region formed on the mold.

11 . The imprint apparatus according to claim 1 , wherein
the first detector includes a plurality of detectors.

12 . The imprint apparatus according to claim 1 , wherein
the second detector includes a plurality of detectors.

13 . A method of manufacturing articles comprising:
a process of forming a pattern of an imprint material on a substrate by using an imprint apparatus; and a process of processing the substrate on which the pattern is formed in the previous step, wherein the imprint apparatus is configured to form a pattern of an imprint material on a substrate by using a mold, the imprint apparatus including: a plurality of detectors configured to detect marks formed on the substrate and marks formed on the mold, the plurality of detectors including a first detector and a second detector; and a control unit configured to control the imprint apparatus, the control unit bringing the imprint material and the mold into contact with each other so that a first region and a second region of the mold contact sequentially with the imprint material, causing the first detector to detect a first mark on the mold and a first mark on the substrate formed in the first region, performing a first alignment between the substrate and the mold on the basis of a result of detection of the first mark on the mold and the first mark on the substrate, and then causing the first detector to detect the first mark on the mold and the first mark on the substrate, and then causing the second detector to detect a second mark formed on the second region of the mold and a second mark on the substrate while moving the first detector.

14 . An imprinting method configured to form a pattern of an imprint material by bringing the imprint material on a substrate into contact sequentially with a first region and a second region of a mold, comprising:
a process of detecting a first mark on the mold and a first mark on the substrate formed in the first region by a first detector; a process of alignment between the substrate and the mold on the basis of a result of detection detected by the process of detecting; a process of moving the first detector for detecting a mark on the mold formed in a region different from the first region after the first detector has detected the first mark on the mold and the first mark on the substrate; and a process of causing the second detector to detect a second mark formed in the second region of the mold and a second mark on the substrate while the first detector is moving.

Assignees

• Canon Kk

Inventors

• Sato Hiroshi

Classifications

• B29C59/002 Primary

  Component parts, details or accessories; Auxiliary operations · CPC title

• B29C59/02

  by mechanical means, e.g. pressing {(B29C59/007 takes precedence; embossing expanded porous articles B29C44/5627)} · CPC title

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title