Optoelectronic component and method for producing an optoelectronic component
US-2017069876-A1 · Mar 9, 2017 · US
US2016204378A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016204378-A1 |
| Application number | US-201414916560-A |
| Country | US |
| Kind code | A1 |
| Filing date | Sep 2, 2014 |
| Priority date | Sep 4, 2013 |
| Publication date | Jul 14, 2016 |
| Grant date | — |
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The invention relates to an organic optoelectronic component comprising a substrate ( 101 ) on which a first electrode ( 102 ), then an organic functional layer stack ( 103 ) having at least one organic optoelectronic layer, and then a second electrode ( 104 ) are successively arranged. A thin film encapsulation ( 107 ) is arranged over the second electrode ( 104 ) and in addition to the second electrode ( 104 ), at least one first intermediate layer ( 121 ) having a hardness which is different from the layer which is directly adjacent thereto is arranged between the organic functional layer stack ( 103 ) and the thin-film encapsulation ( 107 ).
Opening claim text (preview).
1 . An organic optoelectronic component, comprising a substrate, on which a first electrode, thereabove an organic functional layer stack having at least one organic optoelectronic layer, and thereabove a second electrode are arranged, above the second electrode a thin-film encapsulation and between the organic functional layer stack and the thin-film encapsulation in addition to the second electrode at least one first intermediate layer having a different hardness than a directly adjacent layer. 2 . The component according to claim 1 , wherein the at least one first intermediate layer is constructed to protect the organic functional layer stack against damage as a result of dirt particles, in particular dirt particles situated between the second electrode and the thin-film encapsulation. 3 . The component according to claim 1 , wherein the at least one first intermediate layer is arranged between the second electrode and the thin-film encapsulation, and the at least one first intermediate layer has a lower hardness than an underlying layer directly adjoining the first intermediate layer, and than an overlying layer directly adjoining the first intermediate layer. 4 . The component according to claim 3 , wherein the first intermediate layer has a thickness of greater than or equal to 200 nm and less than or equal to 10 μm. 5 . The component according to claim 3 , wherein the underlying layer directly adjoining the first intermediate layer is the second electrode. 6 . The component according to claim 5 , wherein the second electrode comprises Al, Ag, Mg or a combination thereof, and the first intermediate layer comprises In, Ga, Zn or a combination thereof. 7 . The component according to claim 3 , wherein the underlying layer directly adjoining the first intermediate layer is a second intermediate layer, which is arranged on the second electrode and which has a greater hardness than the second electrode. 8 . The component according to claim 7 , wherein the second intermediate layer comprises Cr, Wo, V, Os, Ru, Ir or a combination thereof. 9 . The component according to claim 3 , wherein the overlying layer directly adjoining the first intermediate layer is formed by a layer of the thin-film encapsulation. 10 . The component according to claim 1 , wherein the at least one first intermediate layer is arranged between the second electrode and the thin-film encapsulation, and the at least one first intermediate layer directly adjoins the second electrode and has a greater hardness than the second electrode. 11 . The component according to claim 10 , wherein the first intermediate layer has a lower hardness than a layer of the thin-film encapsulation that directly adjoins the first intermediate layer. 12 . The component according to claim 11 , wherein the second electrode comprises Al, Ag, Mg or a combination thereof and the first intermediate layer comprises Ni, Ti, V or a combination thereof. 13 . The component according to claim 10 , wherein the first intermediate layer has a greater hardness than a layer of the thin-film encapsulation that directly adjoins the first intermediate layer. 14 . The component according to claim 13 , wherein the second electrode comprises Al, Ag, Mg or a combination thereof and the first intermediate layer comprises Cr, Wo, V, Os, Ru, Ir or a combination thereof. 15 . The component according to claim 10 , wherein a second intermediate layer directly adjoining the first intermediate layer is arranged between the first intermediate layer and the thin-film encapsulation, and the first intermediate layer has a greater hardness than the second intermediate layer. 16 . The component according to claim 1 , wherein the at least one first intermediate layer completely covers the second electrode. 17 . The component according to claim 1 , wherein the first intermediate layer is arranged on that side of the second electrode which faces the organic functional layer stack in a manner directly adjoining the second electrode and has a greater hardness than the second electrode. 18 . The component according to claim 17 , wherein the first intermediate layer is formed by an electrically insulating material and is embodied as a tunnel layer for electrical charge carriers. 19 . The component according to claim 17 , wherein the second electrode comprises aluminum and the first intermediate layer comprises aluminum oxide. 20 . The component according to claim 17 , wherein the first intermediate layer comprises one or a plurality of materials selected from silicon nitride, silicon oxide, silicon carbide, boron carbide, boron nitride, aluminum nitride, aluminum oxide, aluminum tungsten nitride.
Multilayers, e.g. opaque multilayers · CPC title
Encapsulations · CPC title
Electron injection layers · CPC title
Electricity · mapped topic
Electricity · mapped topic
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