Pellicles and methods of manufacturing the same

Patent metadata

Field	Value
Publication number	US-2016201201-A1
Application number	US-201514969645-A
Country	US
Kind code	A1
Filing date	Dec 15, 2015
Priority date	Jan 9, 2015
Publication date	Jul 14, 2016
Grant date	—

Abstract

A method of manufacturing a pellicle includes forming a membrane on a first surface of a substrate from a chemical reaction in which the substrate serves as a catalyst, forming a protective pattern on a second surface of the substrate, immersing the substrate in an etchant solution, such that a portion of the substrate exposed through the protective pattern is removed to form a frame, and replacing the etchant solution with a solvent.

First claim

What is claimed is:

1 . A method of manufacturing a pellicle, the method comprising:
forming a membrane on a first surface of a substrate from a chemical reaction in which the substrate serves as a catalyst; forming a protective pattern on a second surface of the substrate; immersing the substrate in an etchant solution, such that a portion of the substrate exposed through the protective pattern is removed to form a frame; and replacing the etchant solution with a solvent.

2 . The method as claimed in claim 1 , wherein the substrate is formed of at least one of iron (Fe), nickel (Ni), cobalt (Co), copper (Cu), and silicon (Si).

3 . The method as claimed in claim 1 , wherein the membrane is formed of at least one of graphite, carbon nano tube (CNT), and graphene.

4 . The method as claimed in claim 1 , wherein replacing the etchant solution with the solvent includes:
replacing the etchant solution with a first solvent; and removing the first solvent.

5 . The method as claimed in claim 1 , wherein replacing the etchant solution with the solvent includes:
replacing the etchant solution with a first solvent; replacing the first solvent with a second solvent; and removing the second solvent.

6 . The method as claimed in claim 5 , wherein the second solvent has a surface energy lower than that of the first solvent.

7 . The method as claimed in claim 5 , wherein the first solvent includes water, and the second solvent includes alcohol.

8 . The method as claimed in claim 5 , wherein replacing the first solvent with the second solvent is performed using a dropping pipette.

9 . The method as claimed in claim 5 , wherein removing the second solvent is performed by evaporation.

10 . The method as claimed in claim 1 , wherein:
the protective pattern is formed on a peripheral portion of the substrate, and the frame supports a peripheral portion of the membrane.

11 . The method as claimed in claim 1 , wherein the etchant solution has a relatively high etching rate with respect to the substrate, and has a relatively low etching rate with respect to the protective pattern and the membrane.

12 . The method as claimed in claim 1 , wherein the protective pattern is formed of a photoresist material, a polymer material, or an adhesive material.

13 . The method as claimed in claim 1 , wherein replacing the etchant solution with the solvent includes removing the protective pattern.

14 . A method of manufacturing a pellicle, the method comprising:
forming a membrane including graphite, carbon nano tube, or graphene; and forming a frame supporting a lower portion of the membrane, the frame including a catalytic material for a formation of the membrane.

15 . The method as claimed in claim 14 , wherein the frame is formed of at least one of iron (Fe), nickel (Ni), cobalt (Co), copper (Cu) and silicon (Si).

16 . A method of manufacturing a pellicle, the method comprising:
forming a membrane on a first surface of a substrate; forming a protective pattern on a second surface of the substrate, such that the protective pattern only partially covers the second surface of the substrate; immersing the substrate in an etchant solution, such that a portion of the substrate exposed through the protective pattern is removed to form a frame; and replacing the etchant solution with a solvent to remove the protective pattern, such that the membrane with the frame defines the pellicle.

17 . The method as claimed in claim 16 , wherein:
the first and second surfaces of the substrate are opposite to each other, and immersing the substrate includes immersing the substrate in its entirety in the etchant solution, such that the membrane and the protective pattern on the first and second surfaces of the substrate are at least partially immersed in the etchant solution.

18 . The method as claimed in claim 16 , wherein removal of portions of the substrate and of the protective patterns are performed while the substrate is immersed in liquid.

19 . The method as claimed in claim 16 , wherein the membrane is stationary during replacement of the etchant solution with the solvent.

20 . The method as claimed in claim 19 , wherein, during immersing of the substrate and replacing of the etchant, removal of portions of the substrate and of the protective patterns are performed in a liquid environment.

Assignees

• Samsung Electronics Co Ltd
• Sungkyunkwan University S Res & Business Foundation

Inventors

• Kim Mun-Ja
• Kim Tae-Sung
• Yoo Ji-Beom
• Kim Byung-Gook
• Kim Soo-Young
• Shin Dong-Wook
• Choi Jae-Hyuck

Classifications

• C23F1/14 Primary

  Aqueous compositions · CPC title

• C23C16/56

  After-treatment · CPC title

• G03F1/64 Primary

  characterised by the frames, e.g. structure or material, including bonding means therefor · CPC title

• C23F1/02

  Local etching · CPC title

• G03F1/62 Primary

  Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof · CPC title