Processes for forming metal oxide films on substrates using amino acids

Patent metadata

Field	Value
Publication number	US-2016201197-A1
Application number	US-201414913726-A
Country	US
Kind code	A1
Filing date	Oct 2, 2014
Priority date	Oct 2, 2013
Publication date	Jul 14, 2016
Grant date	—

Abstract

Processes for forming metal oxide films on substrates are disclosed. The processes include depositing a composition comprising a metal oxide precursor, an amino acid, and a solvent onto a substrate. The composition is dried to remove solvent, and then heated to initiate combustion to form a metal oxide film.

First claim

1 . A process for producing a metal oxide film on a substrate, the process comprising:
preparing a metal oxide precursor composition comprising a metal oxide precursor, an amino acid, and a solvent; depositing the metal oxide precursor composition on a substrate to form a coating; drying the coating to remove the solvent and form a gel film; and heating the gel film to form the metal oxide film on the substrate.

2 . The process of claim 1 , wherein the metal oxide is TiO 2 .

3 . The process of claim 1 , wherein the metal precursor is titanyl nitrate.

4 . The process of claim 1 , wherein the metal precursor is a blend of a non-nitrate-containing titanium compound and a nitrate-containing compound.

5 . The process of claim 1 , wherein the amino acid is glycine.

6 . The process of claim 1 , wherein the amino acid contains only atoms selected from the group consisting of carbon, oxygen, nitrogen, and hydrogen.

7 . The process of claim 1 , wherein the amino acid does not contain sulfur, phosphorus, chlorine, or selenium atoms.

8 . The process of claim 1 , wherein the solvent is water.

9 . The process of claim 1 , wherein the metal oxide precursor composition further comprises an alcohol.

10 . The process of claim 9 , wherein the alcohol is isopropyl alcohol.

11 . The process of claim 1 , wherein the metal oxide precursor composition is deposited by spin coating.

12 . The process of claim 1 , further comprising etching the substrate with an acid prior to depositing the metal oxide precursor composition on the substrate.

13 . The process of claim 12 , wherein the acid is HCl or HF.

14 . The process of claim 1 , wherein the coating is dried at a temperature of 0° C. to 150° C.

15 . The process of claim 1 , wherein the coating is dried for a time period of from 1 second to 59 minutes.

16 . The process of claim 1 , wherein the gel film is heated to a temperature of from 200° C. to 250° C.

17 . The process of claim 1 , wherein the gel film is heated for a time period of 3 minutes to 59 minutes.

18 . The process of claim 1 , wherein, in the metal oxide precursor composition, a molar ratio of the metal precursor to the amino acid is from about 9:10 to about 5:1.

19 . A process for producing a TiO 2 film on an indium tin oxide (ITO) surface, the process comprising:
providing a titanium oxide precursor solution comprising a titanyl nitrate, glycine, water, and isopropyl alcohol; depositing the titanium oxide precursor solution on the indium tin oxide surface to form a coating; drying the coating to form a gel film; and heating the gel film to form the TiO 2 film on the indium tin oxide surface.

20 . An electronic device comprising a metal oxide film produced by the process of claim 1 .

21 . A continuous process for producing a multilayered metal oxide film on a substrate, the process comprising:
preparing a metal oxide precursor solution comprising a metal oxide precursor, an amino acid, and a solvent; depositing the metal oxide precursor solution on a substrate to form a coating; drying the coating to remove the solvent and form a gel film; heating the gel film to form a metal oxide film layer on the substrate; and repeating the depositing, drying, and heating steps multiple times in succession until the desired multilayered metal oxide film is obtained.

22 . The process of claim 21 , wherein a different metal oxide precursor solution is prepared during repeating of the depositing, drying, and heating steps, so that the multilayered metal oxide film contains different metals in at least two adjacent layers.

23 . A continuous process for producing a multilayered TiO 2 film on an indium tin oxide (ITO) surface, the process comprising:
providing a titanium precursor solution comprising a titanyl nitrate, glycine, water, and isopropyl alcohol; depositing the titanium precursor solution on the indium tin oxide surface to form a coating; drying the coating to form a gel film; heating the gel film to form the TiO 2 film on the indium tin oxide surface; and repeating the depositing, coating, drying, and heating steps multiple times in succession until the desired multilayered TiO 2 film is obtained.

Assignees

• Battelle Memorial Institute

Inventors

• Monzyk Bruce F
• Heiss Derik R

Classifications

• C23C18/1254 Primary

  Sol or sol-gel processing · CPC title

• B01J35/004

  Operations & Transport · mapped topic

• B01J21/063

  Titanium; Oxides or hydroxides thereof · CPC title

• B01J37/0219

  the coating containing organic compounds · CPC title

• C23C18/1216 Primary

  Metal oxides (C23C18/1212 takes precedence) · CPC title