Method for producing cylindrical nanoimprinting mold and method for producing nanoimprinting reproduction mold

Patent metadata

Field	Value
Publication number	US-2016200006-A1
Application number	US-201414910956-A
Country	US
Kind code	A1
Filing date	Aug 11, 2014
Priority date	Aug 14, 2013
Publication date	Jul 14, 2016
Grant date	—

Abstract

Provided is a method for producing a cylindrical nanoimprinting mold such that the outer peripheral surface of a cylindrical aluminum substrate is uniformly polished, and it is possible to effectively take advantage of the outer peripheral surface. The method forms an oxide film at the outer peripheral surface ( 14 ) of an aluminum substrate ( 10 ) after polishing the entire outer peripheral surface ( 14 ) of the cylindrical aluminum substrate ( 10 ) by means of a polishing body ( 26 ), wherein the polishing body ( 26 ) is moved in the axial direction to polish in a manner such that at least a portion of the polishing body ( 26 ) is protruding beyond the first end ( 10 a ) side and second end ( 10 b ) side of the aluminum substrate ( 10 ), and the portion of the polishing body ( 26 ) protruding beyond the aluminum substrate ( 10 ) is disposed on and supported by a cylindrical first support member ( 18 ); and second support member ( 20 ).

First claim

1 . A method for producing a cylindrical nanoimprinting mold in which an oxide film having a plurality of fine pores is formed on an outer peripheral surface of a cylindrical aluminum substrate, the method comprising:
a step (I) of polishing the whole outer peripheral surface of the aluminum substrate by rubbing the outer peripheral surface of the aluminum substrate with a polishing body, which has a length along an axis direction of the aluminum substrate shorter than a length of the aluminum substrate in the axis direction, while relatively moving the polishing body and the aluminum substrate rotating around a central axis; and a step (II) of forming the oxide film on the outer peripheral surface of the aluminum substrate by anodization after the step (I), wherein in the step (I), support members are disposed at both ends of the aluminum substrate in the central axis direction and polishing is performed by relatively moving the polishing body in the axis direction with respect to the outer peripheral surface of the aluminum substrate rotating around the axis such that at least a part of the polishing body protrudes beyond the end of the aluminum substrate in the axis direction, at least the part, which protrudes beyond the aluminum substrate, of the polishing body is disposed on the support member, and the shape obtained by cutting the surface of the portion, in which the polishing body is disposed, of the support member in a direction perpendicular to the axis direction of the aluminum substrate is an arc shape configuring at least a part of circumference having a diameter substantially equal to or less than the outer diameter of the aluminum substrate.

2 . The method for producing a cylindrical nanoimprinting mold according to claim 1 , wherein the outer shape of a portion, in which the polishing body is disposed, of the support member is a shape configuring at least a part of a cylindrical shape having an outer diameter 0.97 or more times but 1 or less times the outer diameter of the aluminum substrate.

3 . The method for producing a cylindrical nanoimprinting mold according to claim 2 , wherein the outer shape of the support member is cylindrical.

4 . The method for producing a cylindrical nanoimprinting mold according to claim 1 , wherein the portion, in which the polishing body is disposed, of the support member is made of the same material as that of the aluminum substrate.

5 . The method for producing a cylindrical nanoimprinting mold according to claim 1 , further comprising a step (I′) of performing polishing by relatively moving the polishing body in the axis direction such that the polishing body does not protrude beyond the aluminum substrate, between the step (I) and the step (II).

6 . The method for producing a cylindrical nanoimprinting mold according to claim 1 , wherein in the step (I), polishing is performed by the polishing body while supplying an abrasive grain to the outer peripheral surface of the aluminum substrate, and the residual abrasive grain remaining on the surface of the support member is removed.

7 . The method for producing a cylindrical nanoimprinting mold according to claim 1 , wherein in the step (I), a polishing solution for chemical mechanical polishing is supplied to a contact portion with the polishing body in the outer peripheral surface of the aluminum substrate, and the outer peripheral surface of the aluminum substrate is washed at the rear side of the polishing body moving in the axis direction to remove the polishing solution.

8 . The method for producing a cylindrical nanoimprinting mold according to claim 7 , wherein the polishing body is moved to one direction from a first end to a second end of the aluminum substrate in the axis direction.

9 . The method for producing a cylindrical nanoimprinting mold according to claim 7 , wherein the outer peripheral surface of the aluminum substrate is further washed also at the front side of the polishing body moving in the axis direction to remove the polishing solution.

10 . The method for producing a cylindrical nanoimprinting mold according to claim 7 , wherein a gas is blown at both sides of the polishing body in the axis direction to the outer peripheral surface of the aluminum substrate.

11 . A method for producing a cylindrical nanoimprinting mold in which an oxide film having a plurality of fine pores is formed on an outer peripheral surface of a cylindrical aluminum substrate, the method comprising:
a step (I) of polishing the whole outer peripheral surface of the aluminum substrate by rubbing the outer peripheral surface of the aluminum substrate with a polishing body, which has a length along an axis direction of the aluminum substrate shorter than a length of the aluminum substrate in the axis direction, while relatively moving the polishing body and the aluminum substrate rotating around an axis; and a step (II) of forming the oxide film on the outer peripheral surface of the aluminum substrate by anodization after the step (I), wherein in the step (I), a polishing solution for chemical mechanical polishing is supplied to a contact portion with the polishing body in the outer peripheral surface of the aluminum substrate, and the outer peripheral surface of the aluminum substrate is washed at the rear side of the polishing body moving in the axis direction to remove the polishing solution.

12 . The method for producing a cylindrical nanoimprinting mold according to claim 11 , wherein the polishing body is moved to one direction from a first end to a second end of the aluminum substrate in the axis direction.

13 . The method for producing a cylindrical nanoimprinting mold according to claim 11 , wherein the outer peripheral surface of the aluminum substrate is further washed also at the front side of the polishing body moving in the axis direction to remove the polishing solution.

14 . The method for producing a cylindrical nanoimprinting mold according to claim 11 , wherein a gas is blown at both sides of the polishing body in the axis direction to the outer peripheral surface of the aluminum substrate.

15 . A method for producing a nanoimprinting reproduction mold, the method comprising:
a polishing step of polishing a surface of a nanoimprinting mold in which an oxide film having a plurality of fine pores is formed on a surface of an aluminum substrate; and an oxide film forming step of forming again an oxide film, which has a plurality of fine pores on a surface of an aluminum substrate, by anodizing the polished surface.

16 . The method for producing a nanoimprinting reproduction mold according to claim 15 , wherein the polishing step includes a treatment of chemically removing the oxide film having a plurality of fine pores on the surface of the nanoimprinting mold.

17 . The method for producing a nanoimprinting reproduction mold according to claim 16 , wherein the oxide film is chemically removed using a mixed solution of chromic acid and phosphoric acid.

18 . The method for producing a nanoimprinting reproduction mold according to claim 16 , further comprising a resin removing step of removing a resin attached to the surface of the nanoimprinting mold having a plurality of fine pores on the surface thereof, before the polishing step.

19 . The method for producing a nanoimprinting reproduction mold according to claim 16 , wherein the aluminum substrate is subjected to chemical mechanical polishing after the oxide film is chemically removed in the polishing step.

20 . The method for producing

Assignees

• Mitsubishi Rayon Co

Inventors

• Shakagoori Shinya
• Ookawa Makoto
• Takanashi Kazuya
• Hara Katsumi

Classifications

• B29K2905/02

  Aluminium · CPC title

• B29C2059/023

  Microembossing · CPC title

• B29C59/022

  characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor · CPC title

• B05D5/00

  Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures · CPC title

• B05D3/12

  by mechanical means · CPC title