Method and system for providing depth mapping using patterned light

US2016196657A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016196657-A1
Application numberUS-201614988411-A
CountryUS
Kind codeA1
Filing dateJan 5, 2016
Priority dateJan 6, 2015
Publication dateJul 7, 2016
Grant date

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Abstract

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A method and system for estimating edge data in patterned light analysis are provided herein. The method may include: obtaining an original depth map of an object generated based on structured light analysis of a pattern comprising stripes; determining portions of the original depth map in which z-axis value is inaccurate given an edge of the object; detecting geometric feature of the object associated with the determined portion, based on neighboring portions of the depth map; and estimating the missing z-axis data along the edge of the object, based on the detecting geometric feature of the object.

First claim

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1 . A method comprising: obtaining a depth map of an object generated based on structured light analysis of a pattern comprising stripes; determining portions of the depth map in which z-axis value is inaccurate or in complete given an edge of the object; detecting geometric feature of the object associated with the determined portion, based on edges of the depth map; and estimating the z-axis data along the edge of the object, based on the detected geometric feature of the object. 2 . The method according to claim 1 , further comprising: selecting a template function based on the detected geometric feature; and applying constraints to the selected template based on local geometrical features of the corresponding depth map portion. 3 . The method according to claim 2 , further comprising detecting x-y plane edges of the corresponding portion based on intensity reflected from off-pattern areas. 4 . The method according to claim 3 , further comprising applying curve fitting function based on the selected template with it corresponding constraints and the detected edges. 5 . The method according to claim 4 , further comprising applying z-axis data to the fitted curve, based on extrapolation from the data map portion. 6 . The method according to claim 5 , further comprising completing the depth map based on the derived z-axis data of the edges.

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What does patent US2016196657A1 cover?
A method and system for estimating edge data in patterned light analysis are provided herein. The method may include: obtaining an original depth map of an object generated based on structured light analysis of a pattern comprising stripes; determining portions of the original depth map in which z-axis value is inaccurate given an edge of the object; detecting geometric feature of the object as…
Who is the assignee on this patent?
Oculus Vr Llc
What technology area does this patent fall under?
Primary CPC classification G06T7/0057. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Jul 07 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).