Methods of fabricating pellicles using supporting layer

US2016195804A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016195804-A1
Application numberUS-201514972258-A
CountryUS
Kind codeA1
Filing dateDec 17, 2015
Priority dateJan 7, 2015
Publication dateJul 7, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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The method includes forming a graphite layer on a substrate, forming a supporting layer on the graphite layer to form a stack of the graphite layer and the supporting layer, removing the substrate to separate the stack from the substrate, transferring the stack of the graphite layer and the supporting layer onto a frame, and removing the supporting layer from the frame.

First claim

Opening claim text (preview).

What is claimed is: 1 . A method of fabricating a pellicle, the method comprising: forming a graphite layer on a substrate; forming a supporting layer on the graphite layer to form a stack of the graphite layer and the supporting layer; removing the substrate from the stack of the graphite layer and the supporting layer; transferring the stack of the graphite layer and the supporting layer onto a frame; and removing the supporting layer from the frame. 2 . The method of claim 1 , wherein the supporting layer comprises an organic polymer. 3 . The method of claim 2 , wherein the organic polymer comprises PMMA (polymethyl methacryl ate). 4 . The method of claim l, wherein the forming a supporting layer comprises performing a spin coating process. 5 . The method of claim 1 , wherein the removing the supporting layer comprises using oxygen plasma. 6 . The method of claim 1 , wherein the forming a graphite layer comprises: loading the substrate on a stage in a chamber; and performing a chemical vapor deposition (CVD) process to form the graphite layer on the substrate. 7 . The method of claim 6 , wherein the CVD process comprises: using a precursor having at least one of methane (CH 4 ) or ethane (C 2 H 6 ); and heating the substrate and the precursor to raise a temperature of the substrate and the precursor from room temperature to about 1,000° C. in about 2 minutes using a heating lamp. 8 . The method of claim 1 , wherein the substrate comprises at least one of copper (Cu), chrome (Cr), nickel (Ni), ruthenium (Ru), titanium (Ti), tantalum (Ta), aluminum (Al), titanium nitride (TiN), tantalum nitride (TaN), silicon wafer, or glass. 9 . The method of claim 1 , wherein the removing the substrate comprises: dipping the substrate having the stack of the graphite layer and the supporting layer formed therein in a metal etchant containing at least one of FeCl 3 or ceric ammonium nitrate (CAN), and water. 10 . The method of claim 1 , wherein the transferring comprises: suspending the stack on a solution containing water; and raising the frame from inside of the solution to a surface of the solution perpendicular to the stack. 11 . The method of claim 1 , wherein the graphite layer and the frame are directly adhered with each other. 12 . A method of fabricating a pellicle, the method comprising: forming a first supporting layer on a first substrate; forming a graphite layer on a second substrate; removing the first substrate and the second substrate to separate the first supporting layer and the graphite layer from the first substrate and the second substrate, respectively; transferring the first supporting layer onto a frame; transferring the graphite layer onto the first supporting layer transferred onto the frame; and removing an exposed portion of the first supporting aye in an opening of the frame. 13 . The method of claim 12 , wherein the first supporting layer and the frame are directly adhered with each other, and a portion of the first supporting layer adhered to the frame is not removed. 14 . The method of claim 12 , further comprising: forming a second supporting layer on the graphite layer on the second substrate; and removing the second supporting layer, wherein the removing an exposed portion of the first supporting layer and the removing the second supporting layer are independently performed. 15 . The method of claim 12 , wherein the transferring the first supporting layer onto the frame comprises suspending the first supporting layer on a surface of a solution, and raising the frame from inside of the solution to the surface of the solution perpendicular to the surface of the solution, and the transferring the graphite layer onto the first supporting layer on the frame comprises suspending the graphite layer on the surface of the solution, and raising the frame having the first supporting layer transferred thereon from the inside of the solution to the surface of the solution perpendicular to the surface of the solution. 16 . A method of fabricating a pellicle, the method comprising: forming a first supporting layer on a first substrate; forming a graphite layer on a second substrate; forming a second supporting layer on the graphite layer formed on the second substrate to form a stack of the graphite layer and the second supporting layer; separating the first supporting layer from the first substrate; separating the stack of the graphite layer and the second supporting layer from the second substrate; transferring the first supporting layer onto a frame; transferring the stack of the graphite layer and the second supporting layer onto the first supporting layer transferred on the frame; and removing a portion of the first supporting layer and the second supporting layer. 17 . The method of claim 16 , further comprising: rinsing the separated first supporting layer and the stack of the graphite layer and the second supporting layer using a rinsing solution containing water. 18 . The method of claim 16 , further comprising: drying the separated first supporting layer and the stack of the graphite layer and the second supporting layer transferred on the frame using nitrogen (N 2 ). 19 . The method of claim 16 , wherein the first supporting layer and the graphite layer are directly adhered with each other. 20 . The method of claim 16 , wherein removing the portion of the first supporting layer and the second supporting layer comprises a first removing process to remove the portion of the first supporting layer and a second removing process to remove the second supporting layer.

Assignees

Inventors

Classifications

  • G03F1/64Primary

    characterised by the frames, e.g. structure or material, including bonding means therefor · CPC title

  • characterised by the method of coating (C23C16/04 takes precedence) · CPC title

  • Deposition of carbon only · CPC title

  • G03F1/62Primary

    Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof · CPC title

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What does patent US2016195804A1 cover?
The method includes forming a graphite layer on a substrate, forming a supporting layer on the graphite layer to form a stack of the graphite layer and the supporting layer, removing the substrate to separate the stack from the substrate, transferring the stack of the graphite layer and the supporting layer onto a frame, and removing the supporting layer from the frame.
Who is the assignee on this patent?
Samsung Electronics Co Ltd, Univ Sungkyunkwan Res & Bus
What technology area does this patent fall under?
Primary CPC classification G03F1/64. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Jul 07 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).