Method for manufacturing antifogging porous silica thin film

Patent metadata

Field	Value
Publication number	US-2016185658-A1
Application number	US-201514878914-A
Country	US
Kind code	A1
Filing date	Oct 8, 2015
Priority date	Dec 30, 2014
Publication date	Jun 30, 2016
Grant date	—

Abstract

A method for manufacturing an antifogging porous silica thin film includes preparing a silicon block copolymer micelle solution, forming a coating layer by applying the solution on a substrate using a compressed air spraying method, forming a porous silica thin film by subjecting the coating layer to an oxygen plasma treatment, and solvent-annealing the porous silica thin film.

First claim

What is claimed is:

1 . A method for manufacturing an antifogging porous silica thin film, the method comprising:
preparing a silicon block copolymer micelle solution; forming a coating layer by applying the solution on a substrate using a compressed air spraying method; forming a porous silica thin film by subjecting the coating layer to an oxygen plasma treatment; and solvent-annealing the porous silica thin film.

2 . The method of claim 1 , wherein in the step of preparing a silicon block copolymer micelle solution, the silicon block copolymer micelle is selected from the group consisting of polystyrene-b-polydimethylsiloxane, polyacrylonitrile-b-polydimethylsiloxane, poly(4-vinylpyridine)-b-polydimethylsiloxane, polyethyleneoxide-b-polydimethylsiloxane, poly(2-vinylpyridine)-b-polydimethylsiloxane, polymethylmethacrylate-b-polydimethylsiloxane, polybutadiene-b-polydimethylsiloxane, polyisobutylene-b-polydimethylsiloxane, polydimethylsiloxane-b-polybutylacrylate, polydimethylsiloxane-b-polyacrylic acid, and mixtures thereof.

3 . The method of claim 2 , wherein at least one of a core part and a shell part of the silicon block copolymer micelle is composed of an inorganic polymer including silicon.

4 . The method of claim 2 , wherein the silicon block copolymer micelle includes 1 to 20% by weight of silicon.

5 . The method of claim 1 , wherein in the silicon block copolymer micelle solution, an average particle size of micelle is 10 nm to 20 nm.

6 . The method of claim 1 , wherein the substrate is a glass or transparent plastic.

7 . The method of claim 1 , wherein in the step of solvent-annealing, an annealing solvent is selected from the group consisting of toluene, heptane, tetrahydrofuran (THF), and mixtures thereof.

8 . The method of claim 1 , wherein in the step of solvent-annealing, an annealing time is 20 minutes to 2 hours.

9 . The method of claim 1 , wherein a thickness of the porous silica thin film is 10 to 200 nm.

10 . The method of claim 1 , wherein an average pore size of the porous silica thin film is 10 to 200 nm.

11 . The method of claim 1 , wherein porosity of the porous silica thin film is 30 to 90%.

12 . The method of claim 1 , wherein the porous silica thin film is a super-hydrophilic thin film having a contact angle of 0 to 10°.

13 . The method of claim 1 , wherein the step of preparing the silicon block copolymer micelle solution comprises mixing a silicon block copolymer with an organic solvent to form a mixture and heating the mixture at a temperature of 60° C. for 1 hour.

14 . The method of claim 6 , wherein the substrate is treated with UV or ozone so as to have a hydrophilic property.

Assignees

• Hyundai Motor Co Ltd
• Korea Advanced Inst Sci & Tech

Inventors

• Park Sung June
• Shim Jin Yong
• Kim Jong Min
• Sim Dong Min
• Choi Jae Suk
• Jung Yeon Sik

Classifications

• C03C2218/112

  by spraying · CPC title

• C03C2218/322

  Oxidation · CPC title

• C03C2217/425

  consisting of a porous layer · CPC title

• C03C2217/213

  SiO2 · CPC title

• C09D5/1675

  Polyorganosiloxane-containing compositions · CPC title