Semiconductor light device and manufacturing method for the same

US2016181761A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016181761-A1
Application numberUS-201615059304-A
CountryUS
Kind codeA1
Filing dateMar 3, 2016
Priority dateApr 5, 2011
Publication dateJun 23, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided is a semiconductor light device comprising a semiconductor substrate having a first conduction type; a first cladding layer having the first conduction type deposited above the semiconductor substrate; an active layer; a second cladding layer having a second conduction type; and a contact layer. The active layer includes a window portion that is disordered via diffusion of vacancies and a non-window portion having less disordering than the window portion, and the contact layer includes a first region and a second region that is below the first region and has greater affinity for hydrogen than the first region.

First claim

Opening claim text (preview).

What is claimed is: 1 . A semiconductor laser device, comprising: a semiconductor substrate having a first conduction type; a first cladding layer having the first conduction type and deposited above the semiconductor substrate; an active layer deposited above the first cladding layer; a second cladding layer having a second conduction type and deposited above the active layer; and a contact layer deposited on the second cladding layer, wherein the active layer includes a window portion that is disordered via diffusion of vacancies, and a non-window portion having less disordering than the window portion, the contact layer has a first hydrogen concentration in a region corresponding to the non-window portion, and a second hydrogen concentration in a region corresponding to the window portion, the first hydrogen concentration is higher than the second hydrogen concentration, and the first hydrogen concentration in the region corresponding to the non-window portion is greater than 8.0E+16 atoms/cm 3 . 2 . The semiconductor laser device according to claim 1 , wherein the contact layer includes a p-type GaAs layer doped with a p-type dopant. 3 . The semiconductor laser device according to claim 2 , wherein the p-type dopant includes Zn, Mg, Be or carbon. 4 . The semiconductor laser device according to claim 2 , wherein the total doping amount of the p-type dopant in the contact layer is no greater than 1.0E+15 atoms/cm 2 .

Assignees

Inventors

Classifications

  • with a well layer having only As as V-compound, e.g. AlGaAs, InGaAs · CPC title

  • using Mg · CPC title

  • characterised by the dopants · CPC title

  • Manufacture or treatment · CPC title

  • Nanooptics, e.g. quantum optics or photonic crystals · CPC title

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What does patent US2016181761A1 cover?
Provided is a semiconductor light device comprising a semiconductor substrate having a first conduction type; a first cladding layer having the first conduction type deposited above the semiconductor substrate; an active layer; a second cladding layer having a second conduction type; and a contact layer. The active layer includes a window portion that is disordered via diffusion of vacancies an…
Who is the assignee on this patent?
Furukawa Electric Co Ltd
What technology area does this patent fall under?
Primary CPC classification H01S5/0421. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Jun 23 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).